JPH0311055U - - Google Patents

Info

Publication number
JPH0311055U
JPH0311055U JP6940989U JP6940989U JPH0311055U JP H0311055 U JPH0311055 U JP H0311055U JP 6940989 U JP6940989 U JP 6940989U JP 6940989 U JP6940989 U JP 6940989U JP H0311055 U JPH0311055 U JP H0311055U
Authority
JP
Japan
Prior art keywords
substrate
pressed
processing apparatus
back plate
cathode body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6940989U
Other languages
English (en)
Other versions
JPH069012Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6940989U priority Critical patent/JPH069012Y2/ja
Publication of JPH0311055U publication Critical patent/JPH0311055U/ja
Application granted granted Critical
Publication of JPH069012Y2 publication Critical patent/JPH069012Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】
第1図はこの考案の実施例を示す説明図である
。第2図は従来の装置を示す説明図である。 図中、1……真空槽、2……基板、2a……基
板の裏面、3……カソード本体、4……トレー、
5……背板、7……アース物体。なお、図中、同
一符号は同一または相当部分を示している。

Claims (1)

    【実用新案登録請求の範囲】
  1. 搬送自在のトレーによつて支持されている基板
    をその裏面より背板で押圧すると共に、基板と、
    カソード本体とを真空槽内で所定の間隔をおいて
    対向させ、基板とカソード本体との間の空間に発
    生するプラズマにより、基板の表面に薄膜を形成
    する真空処理装置において、上記基板の裏面を押
    圧する背板に離脱可能に当接する移動自在なアー
    ス電位のアース物体を配設したことを特徴とする
    真空処理装置。
JP6940989U 1989-06-14 1989-06-14 真空処理装置 Expired - Lifetime JPH069012Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6940989U JPH069012Y2 (ja) 1989-06-14 1989-06-14 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6940989U JPH069012Y2 (ja) 1989-06-14 1989-06-14 真空処理装置

Publications (2)

Publication Number Publication Date
JPH0311055U true JPH0311055U (ja) 1991-02-01
JPH069012Y2 JPH069012Y2 (ja) 1994-03-09

Family

ID=31604687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6940989U Expired - Lifetime JPH069012Y2 (ja) 1989-06-14 1989-06-14 真空処理装置

Country Status (1)

Country Link
JP (1) JPH069012Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011149094A (ja) * 2009-12-25 2011-08-04 Canon Anelva Corp 成膜装置及びクリーニング方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011149094A (ja) * 2009-12-25 2011-08-04 Canon Anelva Corp 成膜装置及びクリーニング方法

Also Published As

Publication number Publication date
JPH069012Y2 (ja) 1994-03-09

Similar Documents

Publication Publication Date Title
JPH0311055U (ja)
JPS6413119U (ja)
JPH01168551U (ja)
JPS6365220U (ja)
JPH0425298U (ja)
JPS63174445U (ja)
JPS6430354U (ja)
JPS586547Y2 (ja) 電磁フイ−ダ−
JPH0330258U (ja)
JPH0210675U (ja)
JPH0350049U (ja)
JPH0485731U (ja)
JPH03109046U (ja)
JPS60193964U (ja) マグネトロンスパツタ装置のタ−ゲツト
JPH0444138U (ja)
JPS63166380U (ja)
JPH0176033U (ja)
JPS6179326U (ja)
JPH0378055U (ja)
JPH01106564U (ja)
JPS63139638U (ja)
JPH0378054U (ja)
JPH0238463U (ja)
JPH0343244U (ja)
JPH0373454U (ja)