JPH0330299B2 - - Google Patents

Info

Publication number
JPH0330299B2
JPH0330299B2 JP57110637A JP11063782A JPH0330299B2 JP H0330299 B2 JPH0330299 B2 JP H0330299B2 JP 57110637 A JP57110637 A JP 57110637A JP 11063782 A JP11063782 A JP 11063782A JP H0330299 B2 JPH0330299 B2 JP H0330299B2
Authority
JP
Japan
Prior art keywords
wafer
transfer base
support
base
wafer support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57110637A
Other languages
English (en)
Japanese (ja)
Other versions
JPS593944A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57110637A priority Critical patent/JPS593944A/ja
Publication of JPS593944A publication Critical patent/JPS593944A/ja
Publication of JPH0330299B2 publication Critical patent/JPH0330299B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
JP57110637A 1982-06-29 1982-06-29 ウエハ−搬送装置 Granted JPS593944A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57110637A JPS593944A (ja) 1982-06-29 1982-06-29 ウエハ−搬送装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57110637A JPS593944A (ja) 1982-06-29 1982-06-29 ウエハ−搬送装置

Publications (2)

Publication Number Publication Date
JPS593944A JPS593944A (ja) 1984-01-10
JPH0330299B2 true JPH0330299B2 (cs) 1991-04-26

Family

ID=14540771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57110637A Granted JPS593944A (ja) 1982-06-29 1982-06-29 ウエハ−搬送装置

Country Status (1)

Country Link
JP (1) JPS593944A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60264338A (ja) * 1984-06-11 1985-12-27 Furukawa Electric Co Ltd:The 光フアイバ母材の製造方法
JP2728766B2 (ja) * 1990-07-18 1998-03-18 株式会社東芝 半導体の処理方法およびその装置
JP2754297B2 (ja) * 1991-09-30 1998-05-20 株式会社フジクラ レーザ治療用光ファイバ

Also Published As

Publication number Publication date
JPS593944A (ja) 1984-01-10

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