JPH0363571U - - Google Patents
Info
- Publication number
- JPH0363571U JPH0363571U JP12500289U JP12500289U JPH0363571U JP H0363571 U JPH0363571 U JP H0363571U JP 12500289 U JP12500289 U JP 12500289U JP 12500289 U JP12500289 U JP 12500289U JP H0363571 U JPH0363571 U JP H0363571U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- reaction tube
- gas supply
- supply pipe
- susceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- 238000001947 vapour-phase growth Methods 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 5
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000011144 upstream manufacturing Methods 0.000 claims 2
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案に係る酸化物超伝導薄膜の気相
成長装置を示す全体構成説明図、第２図は従来の
同上気相成長装置を示した要部の構成略示説明図
である。 １……反応管、２……酸素ガスの供給パイプ、
３……原料ガスの供給パイプ、５……吸気パイプ
、６……サセプタ、８……赤外線ランプ、１３…
…吹出口、Ｐ……基板。
成長装置を示す全体構成説明図、第２図は従来の
同上気相成長装置を示した要部の構成略示説明図
である。 １……反応管、２……酸素ガスの供給パイプ、
３……原料ガスの供給パイプ、５……吸気パイプ
、６……サセプタ、８……赤外線ランプ、１３…
…吹出口、Ｐ……基板。
Claims (1)
- 反応管の上流側に酸素ガスの供給パイプと、原
料ガスの供給用パイプが連結されると共に、上記
反応管の下流側に排ガス用の吸気パイプを連結し
、当該反応管内には基板を載置自在としたサセプ
タが配設され、同上反応管外には上記基板を加熱
するための赤外線ランプが隣接されたものにおい
て、前記酸素ガスの供給パイプを当該反応管に貫
設し、その吹出口を前記サセプタ上の基板近傍に
あつて、その上流側で、上記基板側へ向け開口し
てなる酸化物超伝導薄膜の気相成長装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989125002U JP2526852Y2 (ja) | 1989-10-25 | 1989-10-25 | 酸化物超伝導薄膜の気相成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989125002U JP2526852Y2 (ja) | 1989-10-25 | 1989-10-25 | 酸化物超伝導薄膜の気相成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0363571U true JPH0363571U (ja) | 1991-06-20 |
| JP2526852Y2 JP2526852Y2 (ja) | 1997-02-26 |
Family
ID=31672891
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989125002U Expired - Fee Related JP2526852Y2 (ja) | 1989-10-25 | 1989-10-25 | 酸化物超伝導薄膜の気相成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2526852Y2 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101231205B1 (ko) * | 2011-08-01 | 2013-02-07 | (주)용진일렉콤 | 광케이블용 컨넥터 어셈블리 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63307277A (ja) * | 1987-06-05 | 1988-12-14 | Kawasaki Steel Corp | 金属酸化物薄膜作製用の光ｍｏｃｖｄ装置 |
| JPH01201482A (ja) * | 1987-10-01 | 1989-08-14 | Nippon Aneruba Kk | 減圧気相成長装置 |
-
1989
- 1989-10-25 JP JP1989125002U patent/JP2526852Y2/ja not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63307277A (ja) * | 1987-06-05 | 1988-12-14 | Kawasaki Steel Corp | 金属酸化物薄膜作製用の光ｍｏｃｖｄ装置 |
| JPH01201482A (ja) * | 1987-10-01 | 1989-08-14 | Nippon Aneruba Kk | 減圧気相成長装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101231205B1 (ko) * | 2011-08-01 | 2013-02-07 | (주)용진일렉콤 | 광케이블용 컨넥터 어셈블리 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2526852Y2 (ja) | 1997-02-26 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |