JPH0437984B2 - - Google Patents

Info

Publication number
JPH0437984B2
JPH0437984B2 JP57173929A JP17392982A JPH0437984B2 JP H0437984 B2 JPH0437984 B2 JP H0437984B2 JP 57173929 A JP57173929 A JP 57173929A JP 17392982 A JP17392982 A JP 17392982A JP H0437984 B2 JPH0437984 B2 JP H0437984B2
Authority
JP
Japan
Prior art keywords
meth
acrylate
group
bis
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57173929A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5964835A (ja
Inventor
Makoto Asano
Kunio Nishihara
Kyoharu Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP17392982A priority Critical patent/JPS5964835A/ja
Publication of JPS5964835A publication Critical patent/JPS5964835A/ja
Publication of JPH0437984B2 publication Critical patent/JPH0437984B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP17392982A 1982-10-05 1982-10-05 フオトレジスト組成物 Granted JPS5964835A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17392982A JPS5964835A (ja) 1982-10-05 1982-10-05 フオトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17392982A JPS5964835A (ja) 1982-10-05 1982-10-05 フオトレジスト組成物

Publications (2)

Publication Number Publication Date
JPS5964835A JPS5964835A (ja) 1984-04-12
JPH0437984B2 true JPH0437984B2 (de) 1992-06-23

Family

ID=15969684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17392982A Granted JPS5964835A (ja) 1982-10-05 1982-10-05 フオトレジスト組成物

Country Status (1)

Country Link
JP (1) JPS5964835A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0640221B2 (ja) * 1985-03-29 1994-05-25 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション ネガティブ・レジスト組成物を使用したリソグラフィ方法
CN111479880B (zh) * 2017-10-12 2021-10-15 美利肯公司 具有扩展共轭的隐色着色剂

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4065315A (en) * 1976-04-26 1977-12-27 Dynachem Corporation Phototropic dye system and photosensitive compositions containing the same
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
JPS57107882A (en) * 1980-12-26 1982-07-05 Mitsui Toatsu Chem Inc Pressure sensitive reproduction recording unit
JPS57135191A (en) * 1981-02-16 1982-08-20 Mitsui Toatsu Chem Inc Dye-containing microcapsule liquid for recording material

Also Published As

Publication number Publication date
JPS5964835A (ja) 1984-04-12

Similar Documents

Publication Publication Date Title
US4438190A (en) Photosensitive resin composition containing unsaturated monomers and unsaturated phosphates
JPH0683043A (ja) 調整可能な接着性の支持体を有する感光性エレメント
WO2000026726A1 (en) Method of forming pattern
WO2019221012A1 (ja) 感光性フィルム及び永久マスクレジストの形成方法
JP2003307845A (ja) 回路形成用感光性フィルム及びプリント配線板の製造方法
JPH0635190A (ja) 感光性樹脂組成物及びこれを用いた積層体
JPH0437984B2 (de)
JP2003050459A (ja) 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
JPH11337949A (ja) 着色樹脂スペーサ形成用感光性フィルム
JP4524844B2 (ja) 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2677916B2 (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JP3111708B2 (ja) 光重合性組成物及び光重合性エレメント
JPH0437985B2 (de)
JP2767174B2 (ja) 感光性樹脂組成物
JP2004020726A (ja) 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JPS592034A (ja) 感光性樹脂組成物
JPS5824035B2 (ja) 感光性エレメント
JP4406802B2 (ja) 感光性エレメント、これを用いたレジストパターンの製造法及びプリント配線板の製造法
JPS5948752A (ja) 感光性樹脂組成物
JPS5926729A (ja) 感光性樹脂組成物
JP2003098663A (ja) 感光性エレメント、及びこれを用いたレジストパターンの製造法
JPH1124260A (ja) レジストパターン形成方法
JPH02311846A (ja) 感光性樹脂組成物及びこれを用いた感光性積層体
JP4406801B2 (ja) 感光性エレメント、これを用いたレジストパターンの製造法及びプリント配線板の製造法
JP2005128300A (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント、レジストパターンの製造方法、プリント配線板、ディスプレイ板の製造方法