JPH044750U - - Google Patents

Info

Publication number
JPH044750U
JPH044750U JP4489690U JP4489690U JPH044750U JP H044750 U JPH044750 U JP H044750U JP 4489690 U JP4489690 U JP 4489690U JP 4489690 U JP4489690 U JP 4489690U JP H044750 U JPH044750 U JP H044750U
Authority
JP
Japan
Prior art keywords
hole
insulating film
electrode
semiconductor device
type semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4489690U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4489690U priority Critical patent/JPH044750U/ja
Publication of JPH044750U publication Critical patent/JPH044750U/ja
Pending legal-status Critical Current

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  • Wire Bonding (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の第1の具体例を示すTAB型
半導体装置の半導体ペレツトにおけるコーテイン
グ剤の被膜形成を示す断面図である。第2図は本
考案の第2の具体例を示すTAB型半導体装置の
半導体ペレツトにおけるコーテイング剤の被膜形
成を示す断面図である。第3図は本考案の第3の
具体例を示すTAB型半導体装置の中間構体の断
面図である。第4図は従来のTAB型半導体装置
の中間構体の要部断面図である。 2……インナーリード、3……透孔、4……半
導体ペレツト、5……バンプ電極、6……絶縁被
膜(コーテイング剤)。
FIG. 1 is a sectional view showing the formation of a film of a coating agent on a semiconductor pellet of a TAB type semiconductor device showing a first embodiment of the present invention. FIG. 2 is a sectional view showing the formation of a film of coating agent on a semiconductor pellet of a TAB type semiconductor device showing a second specific example of the present invention. FIG. 3 is a sectional view of an intermediate structure of a TAB type semiconductor device showing a third specific example of the present invention. FIG. 4 is a sectional view of a main part of an intermediate structure of a conventional TAB type semiconductor device. 2... Inner lead, 3... Through hole, 4... Semiconductor pellet, 5... Bump electrode, 6... Insulating coating (coating agent).

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 透孔を有する絶縁フイルムに積層した導電パタ
ーンを透孔内に延在させて形成したインナリード
と、電極部分を除く表面を絶縁膜に被覆して半導
体ペレツトの電極とを圧着したことを特徴とする
TAB型半導体装置。
An inner lead formed by laminating a conductive pattern laminated on an insulating film having a through hole and extending into the through hole, and an electrode of a semiconductor pellet whose surface except the electrode portion is covered with an insulating film are bonded together. TAB type semiconductor device.
JP4489690U 1990-04-25 1990-04-25 Pending JPH044750U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4489690U JPH044750U (en) 1990-04-25 1990-04-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4489690U JPH044750U (en) 1990-04-25 1990-04-25

Publications (1)

Publication Number Publication Date
JPH044750U true JPH044750U (en) 1992-01-16

Family

ID=31558603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4489690U Pending JPH044750U (en) 1990-04-25 1990-04-25

Country Status (1)

Country Link
JP (1) JPH044750U (en)

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