JPH0455132U - - Google Patents

Info

Publication number
JPH0455132U
JPH0455132U JP9778490U JP9778490U JPH0455132U JP H0455132 U JPH0455132 U JP H0455132U JP 9778490 U JP9778490 U JP 9778490U JP 9778490 U JP9778490 U JP 9778490U JP H0455132 U JPH0455132 U JP H0455132U
Authority
JP
Japan
Prior art keywords
susceptor
vapor phase
phase growth
growth apparatus
reaction tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9778490U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9778490U priority Critical patent/JPH0455132U/ja
Publication of JPH0455132U publication Critical patent/JPH0455132U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の実施例を示す気相成長装置の
縦断面図、第2図は従来の装置を示す縦断面図で
ある。 1……反応管、2……ウエーハ、3……サセプ
タ、4……回転軸、5……モータ、6……フラン
ジ、7……ガス導入口、8……加熱コイル、9…
…ガイド軸。
FIG. 1 is a longitudinal sectional view of a vapor phase growth apparatus showing an embodiment of the present invention, and FIG. 2 is a longitudinal sectional view of a conventional apparatus. DESCRIPTION OF SYMBOLS 1... Reaction tube, 2... Wafer, 3... Susceptor, 4... Rotating shaft, 5... Motor, 6... Flange, 7... Gas inlet, 8... Heating coil, 9...
...Guide shaft.

Claims (1)

【実用新案登録請求の範囲】 反応管内に置かれたサセプタ上に複数枚のウエ
ーハをのせ、ガスを流しながらサセプタを回転さ
せ、気相成長を行うバレル縦形の気相成長装置に
おいて、 ガス導入部にサセプタを回転軸方向に沿つて支
承するガイド軸を設けたことを特徴とする気相成
長装置。
[Scope of Claim for Utility Model Registration] A gas introduction section in a barrel vertical vapor phase growth apparatus that performs vapor phase growth by placing multiple wafers on a susceptor placed in a reaction tube and rotating the susceptor while flowing gas. 1. A vapor phase growth apparatus characterized in that a guide shaft for supporting a susceptor along a rotational axis direction is provided on the susceptor.
JP9778490U 1990-09-18 1990-09-18 Pending JPH0455132U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9778490U JPH0455132U (en) 1990-09-18 1990-09-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9778490U JPH0455132U (en) 1990-09-18 1990-09-18

Publications (1)

Publication Number Publication Date
JPH0455132U true JPH0455132U (en) 1992-05-12

Family

ID=31838458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9778490U Pending JPH0455132U (en) 1990-09-18 1990-09-18

Country Status (1)

Country Link
JP (1) JPH0455132U (en)

Similar Documents

Publication Publication Date Title
JPH0455132U (en)
JPS6445767U (en)
JPS6221081U (en)
JPH0410333U (en)
JPS6346836U (en)
JPH01153633U (en)
JPS6346837U (en)
JPS62180933U (en)
JPH01140816U (en)
JPH02149769U (en)
JPH0321844U (en)
JPS6268227U (en)
JPH0320434U (en)
JPS62136566U (en)
JPS63112331U (en)
JPH03110834U (en)
JPH0377435U (en)
JPH01153635U (en)
JPH0350331U (en)
JPS6390828U (en)
JPS6422025U (en)
JPH02101529U (en)
JPS5812941U (en) Susceptor for vapor phase growth equipment
JPH02116732U (en)
JPH0284321U (en)