JPH0463533B2 - - Google Patents

Info

Publication number
JPH0463533B2
JPH0463533B2 JP58087542A JP8754283A JPH0463533B2 JP H0463533 B2 JPH0463533 B2 JP H0463533B2 JP 58087542 A JP58087542 A JP 58087542A JP 8754283 A JP8754283 A JP 8754283A JP H0463533 B2 JPH0463533 B2 JP H0463533B2
Authority
JP
Japan
Prior art keywords
alignment mark
film
alignment
forming
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58087542A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59224123A (ja
Inventor
Hiroshi Ootsuka
Sunao Nishimuro
Yoshio Ito
Hisamitsu Mitsutomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58087542A priority Critical patent/JPS59224123A/ja
Priority to DE8484303326T priority patent/DE3483063D1/de
Priority to EP84303326A priority patent/EP0126621B1/en
Priority to US06/612,023 priority patent/US4824254A/en
Publication of JPS59224123A publication Critical patent/JPS59224123A/ja
Publication of JPH0463533B2 publication Critical patent/JPH0463533B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58087542A 1983-05-20 1983-05-20 ウエハアライメントマ−ク Granted JPS59224123A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58087542A JPS59224123A (ja) 1983-05-20 1983-05-20 ウエハアライメントマ−ク
DE8484303326T DE3483063D1 (de) 1983-05-20 1984-05-16 Ausrichtungsmarkierungen auf halbleiterscheiben und verfahren zum herstellen der markierungen.
EP84303326A EP0126621B1 (en) 1983-05-20 1984-05-16 Alignment marks on semiconductor wafers and method of manufacturing the marks
US06/612,023 US4824254A (en) 1983-05-20 1984-05-18 Alignment marks on semiconductor wafers and method of manufacturing the marks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58087542A JPS59224123A (ja) 1983-05-20 1983-05-20 ウエハアライメントマ−ク

Publications (2)

Publication Number Publication Date
JPS59224123A JPS59224123A (ja) 1984-12-17
JPH0463533B2 true JPH0463533B2 (2) 1992-10-12

Family

ID=13917864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58087542A Granted JPS59224123A (ja) 1983-05-20 1983-05-20 ウエハアライメントマ−ク

Country Status (4)

Country Link
US (1) US4824254A (2)
EP (1) EP0126621B1 (2)
JP (1) JPS59224123A (2)
DE (1) DE3483063D1 (2)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6292440A (ja) * 1985-10-18 1987-04-27 Mitsubishi Electric Corp アライメントマ−ク
GB8806232D0 (en) * 1988-03-16 1988-04-13 Plessey Co Plc Vernier structure for flip chip bonded devices
WO1989008926A1 (en) * 1988-03-16 1989-09-21 Plessey Overseas Limited Vernier structure for flip chip bonded devices
JPH02234085A (ja) * 1989-03-08 1990-09-17 Mitsubishi Electric Corp 半導体装置
IT1251393B (it) * 1991-09-04 1995-05-09 St Microelectronics Srl Procedimento per la realizzazione di strutture metrologiche particolarmente per l'analisi dell'accuratezza di strumenti di misura di allineamento su substrati processati.
CA2096551A1 (en) * 1992-05-22 1993-11-23 Masanori Nishiguchi Semiconductor device
US5294975A (en) * 1992-10-15 1994-03-15 Altera Corporation Laser alignment target for semiconductor integrated circuits
US5300786A (en) * 1992-10-28 1994-04-05 International Business Machines Corporation Optical focus phase shift test pattern, monitoring system and process
US5316984A (en) * 1993-03-25 1994-05-31 Vlsi Technology, Inc. Bright field wafer target
US5311061A (en) * 1993-05-19 1994-05-10 Motorola Inc. Alignment key for a semiconductor device having a seal against ionic contamination
US5469263A (en) * 1994-07-01 1995-11-21 Motorola, Inc. Method for alignment in photolithographic processes
US5876819A (en) * 1995-02-17 1999-03-02 Mitsubishi Denki Kabushiki Kaisha Crystal orientation detectable semiconductor substrate, and methods of manufacturing and using the same
KR0170909B1 (ko) * 1995-09-27 1999-03-30 김주용 반도체 소자의 오버레이 검사방법
DE19939825A1 (de) * 1999-08-21 2001-03-01 Bosch Gmbh Robert Bauelement mit einem optisch erkennbaren Marker
US6815838B2 (en) 2002-02-20 2004-11-09 International Business Machines Corporation Laser alignment target and method
TWI288428B (en) 2004-01-21 2007-10-11 Seiko Epson Corp Alignment method, method for manufacturing a semiconductor device, substrate for a semiconductor device, electronic equipment
US6989682B1 (en) * 2005-03-16 2006-01-24 United Microelectronics Corp. Test key on a wafer
TWI707038B (zh) 2013-08-05 2020-10-11 美商扭轉生物科技有限公司 重新合成之基因庫
CA2975855C (en) 2015-02-04 2025-09-23 Twist Bioscience Corporation SYNTHETIC GENE COMPOSITIONS AND ASSEMBLY METHODS
WO2016126882A1 (en) 2015-02-04 2016-08-11 Twist Bioscience Corporation Methods and devices for de novo oligonucleic acid assembly
US9981239B2 (en) 2015-04-21 2018-05-29 Twist Bioscience Corporation Devices and methods for oligonucleic acid library synthesis
KR20180050411A (ko) 2015-09-18 2018-05-14 트위스트 바이오사이언스 코포레이션 올리고핵산 변이체 라이브러리 및 그의 합성
KR102794025B1 (ko) 2015-09-22 2025-04-09 트위스트 바이오사이언스 코포레이션 핵산 합성을 위한 가요성 기판
CN115920796A (zh) 2015-12-01 2023-04-07 特韦斯特生物科学公司 功能化表面及其制备
JP6854340B2 (ja) 2016-08-22 2021-04-07 ツイスト バイオサイエンス コーポレーション デノボ合成された核酸ライブラリ
US10417457B2 (en) 2016-09-21 2019-09-17 Twist Bioscience Corporation Nucleic acid based data storage
KR102514213B1 (ko) 2016-12-16 2023-03-27 트위스트 바이오사이언스 코포레이션 면역 시냅스의 변이체 라이브러리 및 그의 합성
CN110892485B (zh) 2017-02-22 2024-03-22 特韦斯特生物科学公司 基于核酸的数据存储
WO2018170169A1 (en) 2017-03-15 2018-09-20 Twist Bioscience Corporation Variant libraries of the immunological synapse and synthesis thereof
WO2018231864A1 (en) 2017-06-12 2018-12-20 Twist Bioscience Corporation Methods for seamless nucleic acid assembly
US10696965B2 (en) 2017-06-12 2020-06-30 Twist Bioscience Corporation Methods for seamless nucleic acid assembly
CN111566125A (zh) 2017-09-11 2020-08-21 特韦斯特生物科学公司 Gpcr结合蛋白及其合成
CN111565834B (zh) 2017-10-20 2022-08-26 特韦斯特生物科学公司 用于多核苷酸合成的加热的纳米孔
KR102804057B1 (ko) 2018-01-04 2025-05-07 트위스트 바이오사이언스 코포레이션 Dna 기반 디지털 정보 저장
CA3100739A1 (en) 2018-05-18 2019-11-21 Twist Bioscience Corporation Polynucleotides, reagents, and methods for nucleic acid hybridization
US12357959B2 (en) 2018-12-26 2025-07-15 Twist Bioscience Corporation Highly accurate de novo polynucleotide synthesis
CN113766930B (zh) 2019-02-26 2025-07-22 特韦斯特生物科学公司 Glp1受体的变异核酸文库
CA3131691A1 (en) 2019-02-26 2020-09-03 Twist Bioscience Corporation Variant nucleic acid libraries for antibody optimization
AU2020298294A1 (en) 2019-06-21 2022-02-17 Twist Bioscience Corporation Barcode-based nucleic acid sequence assembly
JP2022548309A (ja) 2019-09-23 2022-11-17 ツイスト バイオサイエンス コーポレーション Ｃｒｔｈ２のバリアント核酸ライブラリー
WO2021061842A1 (en) 2019-09-23 2021-04-01 Twist Bioscience Corporation Variant nucleic acid libraries for single domain antibodies
IL293670A (en) 2019-12-09 2022-08-01 Twist Bioscience Corp Variable nucleic acid libraries for adenosine receptors
TWI736226B (zh) * 2020-04-21 2021-08-11 錼創顯示科技股份有限公司 對位結構
CN117492336B (zh) * 2024-01-02 2024-04-09 天府兴隆湖实验室 对准标记及图形对准方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3885877A (en) * 1973-10-11 1975-05-27 Ibm Electro-optical fine alignment process
GB1550867A (en) * 1975-08-04 1979-08-22 Hughes Aircraft Co Positioning method and apparatus for fabricating microcircuit devices
US4066485A (en) * 1977-01-21 1978-01-03 Rca Corporation Method of fabricating a semiconductor device
US4309813A (en) * 1979-12-26 1982-01-12 Harris Corporation Mask alignment scheme for laterally and totally dielectrically isolated integrated circuits
US4356223A (en) * 1980-02-28 1982-10-26 Nippon Electric Co., Ltd. Semiconductor device having a registration mark for use in an exposure technique for micro-fine working
US4419013A (en) * 1981-03-30 1983-12-06 Tre Semiconductor Equipment Corporation Phase contrast alignment system for a semiconductor manufacturing apparatus

Also Published As

Publication number Publication date
EP0126621B1 (en) 1990-08-29
EP0126621A3 (en) 1986-01-15
US4824254A (en) 1989-04-25
JPS59224123A (ja) 1984-12-17
EP0126621A2 (en) 1984-11-28
DE3483063D1 (de) 1990-10-04

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