JPH048430U - - Google Patents

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Publication number
JPH048430U
JPH048430U JP1990048498U JP4849890U JPH048430U JP H048430 U JPH048430 U JP H048430U JP 1990048498 U JP1990048498 U JP 1990048498U JP 4849890 U JP4849890 U JP 4849890U JP H048430 U JPH048430 U JP H048430U
Authority
JP
Japan
Prior art keywords
liquid phase
phase growth
growth apparatus
component element
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1990048498U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990048498U priority Critical patent/JPH048430U/ja
Publication of JPH048430U publication Critical patent/JPH048430U/ja
Pending legal-status Critical Current

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  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの考案の一実施例である半導体液相
成長装置を示す説明断面図、第2図はこの考案の
他の実施例を示す説明断面図、第3図は従来の半
導体液相成長装置を示す説明断面図、第4図は従
来の半導体液相成長装置を使用して薄膜を成長し
た場合の成長順簿膜番号とλcの関係を示した図
である。図中、1は電気炉、2は反応管、3はス
ライドボート、4は基板、5はメルト、6はHg
Te、7はリザーバを示す。なお、図中、同一符
号は同一、又は相当部分を示す。
Fig. 1 is an explanatory sectional view showing a semiconductor liquid phase growth apparatus which is an embodiment of this invention, Fig. 2 is an explanatory sectional view showing another embodiment of this invention, and Fig. 3 is an explanatory sectional view showing a semiconductor liquid phase growth apparatus which is an embodiment of this invention. FIG. 4, an explanatory cross-sectional view showing the apparatus, is a diagram showing the relationship between the growth order film number and λc when a thin film is grown using a conventional semiconductor liquid phase growth apparatus. In the figure, 1 is an electric furnace, 2 is a reaction tube, 3 is a slide boat, 4 is a substrate, 5 is a melt, and 6 is Hg
Te, 7 indicates a reservoir. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 易蒸発性成分元素を含む化合物半導体の薄膜を
エピタキシヤル成長させる液相成長装置において
、前記液相成長装置を使用に供する前に、予め前
記易蒸発性成分元素又はその化合物を前記液相成
長装置の反応管内に備えたことを特徴とする半導
体液相成長装置。
In a liquid phase growth apparatus for epitaxially growing a thin film of a compound semiconductor containing an easily vaporizable component element, before the liquid phase growth apparatus is put into use, the easily vaporizable component element or its compound is added to the liquid phase growth apparatus in advance. A semiconductor liquid phase growth apparatus characterized in that it is provided in a reaction tube.
JP1990048498U 1990-05-08 1990-05-08 Pending JPH048430U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990048498U JPH048430U (en) 1990-05-08 1990-05-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990048498U JPH048430U (en) 1990-05-08 1990-05-08

Publications (1)

Publication Number Publication Date
JPH048430U true JPH048430U (en) 1992-01-27

Family

ID=31565358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990048498U Pending JPH048430U (en) 1990-05-08 1990-05-08

Country Status (1)

Country Link
JP (1) JPH048430U (en)

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