JPH0519975B2 - - Google Patents

Info

Publication number
JPH0519975B2
JPH0519975B2 JP61265788A JP26578886A JPH0519975B2 JP H0519975 B2 JPH0519975 B2 JP H0519975B2 JP 61265788 A JP61265788 A JP 61265788A JP 26578886 A JP26578886 A JP 26578886A JP H0519975 B2 JPH0519975 B2 JP H0519975B2
Authority
JP
Japan
Prior art keywords
ray
film
mask
heavy metal
stress
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61265788A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63252428A (ja
Inventor
Masahiko Urai
Katsuji Iguchi
Chako Shiga
Masayoshi Koba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP61265788A priority Critical patent/JPS63252428A/ja
Publication of JPS63252428A publication Critical patent/JPS63252428A/ja
Publication of JPH0519975B2 publication Critical patent/JPH0519975B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61265788A 1986-11-07 1986-11-07 X線マスクの形成方法 Granted JPS63252428A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61265788A JPS63252428A (ja) 1986-11-07 1986-11-07 X線マスクの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61265788A JPS63252428A (ja) 1986-11-07 1986-11-07 X線マスクの形成方法

Publications (2)

Publication Number Publication Date
JPS63252428A JPS63252428A (ja) 1988-10-19
JPH0519975B2 true JPH0519975B2 (de) 1993-03-18

Family

ID=17422052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61265788A Granted JPS63252428A (ja) 1986-11-07 1986-11-07 X線マスクの形成方法

Country Status (1)

Country Link
JP (1) JPS63252428A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH065191B2 (ja) * 1988-10-05 1994-01-19 アイエムブイ株式会社 振動制御装置
US5464711A (en) * 1994-08-01 1995-11-07 Motorola Inc. Process for fabricating an X-ray absorbing mask

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172725U (de) * 1986-04-21 1987-11-02

Also Published As

Publication number Publication date
JPS63252428A (ja) 1988-10-19

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