JPH0525166B2 - - Google Patents

Info

Publication number
JPH0525166B2
JPH0525166B2 JP59177607A JP17760784A JPH0525166B2 JP H0525166 B2 JPH0525166 B2 JP H0525166B2 JP 59177607 A JP59177607 A JP 59177607A JP 17760784 A JP17760784 A JP 17760784A JP H0525166 B2 JPH0525166 B2 JP H0525166B2
Authority
JP
Japan
Prior art keywords
cassette
reticle
original
carrier
taken out
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59177607A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6156413A (ja
Inventor
Shunzo Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59177607A priority Critical patent/JPS6156413A/ja
Publication of JPS6156413A publication Critical patent/JPS6156413A/ja
Publication of JPH0525166B2 publication Critical patent/JPH0525166B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59177607A 1984-08-28 1984-08-28 原版自動交換装置 Granted JPS6156413A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59177607A JPS6156413A (ja) 1984-08-28 1984-08-28 原版自動交換装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59177607A JPS6156413A (ja) 1984-08-28 1984-08-28 原版自動交換装置

Publications (2)

Publication Number Publication Date
JPS6156413A JPS6156413A (ja) 1986-03-22
JPH0525166B2 true JPH0525166B2 (2) 1993-04-12

Family

ID=16033954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59177607A Granted JPS6156413A (ja) 1984-08-28 1984-08-28 原版自動交換装置

Country Status (1)

Country Link
JP (1) JPS6156413A (2)

Also Published As

Publication number Publication date
JPS6156413A (ja) 1986-03-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term