JPS6156413A - 原版自動交換装置 - Google Patents

原版自動交換装置

Info

Publication number
JPS6156413A
JPS6156413A JP59177607A JP17760784A JPS6156413A JP S6156413 A JPS6156413 A JP S6156413A JP 59177607 A JP59177607 A JP 59177607A JP 17760784 A JP17760784 A JP 17760784A JP S6156413 A JPS6156413 A JP S6156413A
Authority
JP
Japan
Prior art keywords
reticle
cassette
original plate
original
carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59177607A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0525166B2 (2
Inventor
Shunzo Imai
今井　俊三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59177607A priority Critical patent/JPS6156413A/ja
Publication of JPS6156413A publication Critical patent/JPS6156413A/ja
Publication of JPH0525166B2 publication Critical patent/JPH0525166B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59177607A 1984-08-28 1984-08-28 原版自動交換装置 Granted JPS6156413A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59177607A JPS6156413A (ja) 1984-08-28 1984-08-28 原版自動交換装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59177607A JPS6156413A (ja) 1984-08-28 1984-08-28 原版自動交換装置

Publications (2)

Publication Number Publication Date
JPS6156413A true JPS6156413A (ja) 1986-03-22
JPH0525166B2 JPH0525166B2 (2) 1993-04-12

Family

ID=16033954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59177607A Granted JPS6156413A (ja) 1984-08-28 1984-08-28 原版自動交換装置

Country Status (1)

Country Link
JP (1) JPS6156413A (2)

Also Published As

Publication number Publication date
JPH0525166B2 (2) 1993-04-12

Similar Documents

Publication Publication Date Title
US4999671A (en) Reticle conveying device
CA1208956A (en) Automatic x-ray film cassette unloader and reloader
EP0209660A2 (en) Apparatus and method for automated cassette handling
JP2000150400A (ja) 縦型熱処理装置およびボート搬送方法
US5348441A (en) Parts tray conveying system
US4547066A (en) Exposure apparatus
JPS6156413A (ja) 原版自動交換装置
JP3647330B2 (ja) 半導体製造装置およびデバイス製造方法
US4575235A (en) Photographic printing apparatus and methods
JPH04346247A (ja) 半導体製造装置及びウェハ搬送アーム及びウェハ載置台
JPS62102524A (ja) マスクチエンジヤ−
JPS6318632A (ja) 基板搬送装置
JP2962236B2 (ja) ペリクル収納容器、ペリクル収納容器の搬送装置及び搬送方法
JPH10242241A (ja) 半導体製造装置
JPH04118913A (ja) 半導体製造装置
JPH0197961A (ja) 露光用原板作成装置及び方法
JP2004018134A (ja) 薄板の移載搬送装置、それに用いられるカセット及び薄板の移載搬送方法
JPS6227248A (ja) 給送装置
JPS62255327A (ja) プリンタ−装置
JP2024039299A (ja) 基板処理方法及びその装置
JPS6112524A (ja) 容器の搬送装置
JPS61225832A (ja) ウエハ移替装置
JPS6322448A (ja) 基板搬送装置
JP2514633B2 (ja) 一括式ウェ−ハ立替方法
JPH0354843A (ja) 半導体製造装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term