JPH0528754Y2 - - Google Patents
Info
- Publication number
- JPH0528754Y2 JPH0528754Y2 JP1987186256U JP18625687U JPH0528754Y2 JP H0528754 Y2 JPH0528754 Y2 JP H0528754Y2 JP 1987186256 U JP1987186256 U JP 1987186256U JP 18625687 U JP18625687 U JP 18625687U JP H0528754 Y2 JPH0528754 Y2 JP H0528754Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- spinner device
- center
- spindle
- resist film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987186256U JPH0528754Y2 (it) | 1987-12-07 | 1987-12-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987186256U JPH0528754Y2 (it) | 1987-12-07 | 1987-12-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0189735U JPH0189735U (it) | 1989-06-13 |
| JPH0528754Y2 true JPH0528754Y2 (it) | 1993-07-23 |
Family
ID=31477489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987186256U Expired - Lifetime JPH0528754Y2 (it) | 1987-12-07 | 1987-12-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0528754Y2 (it) |
-
1987
- 1987-12-07 JP JP1987186256U patent/JPH0528754Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0189735U (it) | 1989-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5985363A (en) | Method of providing uniform photoresist coatings for tight control of image dimensions | |
| US4822639A (en) | Spin coating method and device | |
| US4068019A (en) | Spin coating process for prevention of edge buildup | |
| JPS61214520A (ja) | 塗布装置 | |
| US6207357B1 (en) | Methods of forming photoresist and apparatus for forming photoresist | |
| JP2675766B2 (ja) | フォトレジスト塗布方法及びその装置 | |
| JPS60198818A (ja) | フオトレジストの現像装置 | |
| JP2001319851A (ja) | フォトレジスト塗布方法 | |
| JPH0632673Y2 (ja) | レジスト塗布装置 | |
| JPS6245378A (ja) | 塗布装置 | |
| JPS60161767A (ja) | 自動回転塗布機 | |
| JPH0338835Y2 (it) | ||
| JPH0632674Y2 (ja) | フォトレジスト塗布装置 | |
| JPS6342526Y2 (it) | ||
| JPS593430A (ja) | ホトレジスト膜形成方法 | |
| JP2526071Y2 (ja) | 回転塗布装置の回転吸着ヘッド | |
| JPH05259051A (ja) | 半導体基板のスピンコーティング装置 | |
| JPH02260415A (ja) | 搬送装置 | |
| JPH0254518A (ja) | 回転塗布装置 | |
| JPH0716531A (ja) | 真空吸着式スピナー、これを用いた塗布液の塗布方法および塗膜の現像方法 | |
| JPS60226124A (ja) | レジスト塗布装置 | |
| JPS6323705Y2 (it) | ||
| JPS62285421A (ja) | レジスト塗布装置 | |
| JPS62195121A (ja) | スピンコ−タ− | |
| JPH05259056A (ja) | 半導体基板のスピンコーティング装置 |