JPH09311278A5 - - Google Patents

Info

Publication number
JPH09311278A5
JPH09311278A5 JP1996149903A JP14990396A JPH09311278A5 JP H09311278 A5 JPH09311278 A5 JP H09311278A5 JP 1996149903 A JP1996149903 A JP 1996149903A JP 14990396 A JP14990396 A JP 14990396A JP H09311278 A5 JPH09311278 A5 JP H09311278A5
Authority
JP
Japan
Prior art keywords
optical system
catadioptric
imaging
imaging optical
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996149903A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09311278A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8149903A priority Critical patent/JPH09311278A/ja
Priority claimed from JP8149903A external-priority patent/JPH09311278A/ja
Priority to US08/858,560 priority patent/US5805334A/en
Publication of JPH09311278A publication Critical patent/JPH09311278A/ja
Priority to US09/659,375 priority patent/USRE39296E1/en
Publication of JPH09311278A5 publication Critical patent/JPH09311278A5/ja
Pending legal-status Critical Current

Links

JP8149903A 1993-03-12 1996-05-20 反射屈折光学系 Pending JPH09311278A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8149903A JPH09311278A (ja) 1996-05-20 1996-05-20 反射屈折光学系
US08/858,560 US5805334A (en) 1996-05-20 1997-05-19 Catadioptric projection systems
US09/659,375 USRE39296E1 (en) 1993-03-12 2000-09-08 Catadioptric projection systems

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8149903A JPH09311278A (ja) 1996-05-20 1996-05-20 反射屈折光学系

Publications (2)

Publication Number Publication Date
JPH09311278A JPH09311278A (ja) 1997-12-02
JPH09311278A5 true JPH09311278A5 (2) 2004-08-12

Family

ID=15485129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8149903A Pending JPH09311278A (ja) 1993-03-12 1996-05-20 反射屈折光学系

Country Status (2)

Country Link
US (2) US5805334A (2)
JP (1) JPH09311278A (2)

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JP3823436B2 (ja) * 1997-04-03 2006-09-20 株式会社ニコン 投影光学系
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EP0964307A3 (en) 1998-06-08 2001-09-05 Nikon Corporation Projection exposure apparatus and method
DE69933973T2 (de) * 1998-07-29 2007-06-28 Carl Zeiss Smt Ag Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung
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US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
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US6842298B1 (en) 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
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US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
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US7639419B2 (en) * 2003-02-21 2009-12-29 Kla-Tencor Technologies, Inc. Inspection system using small catadioptric objective
US7672043B2 (en) * 2003-02-21 2010-03-02 Kla-Tencor Technologies Corporation Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth
US7180658B2 (en) * 2003-02-21 2007-02-20 Kla-Tencor Technologies Corporation High performance catadioptric imaging system
US7869121B2 (en) 2003-02-21 2011-01-11 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective using aspheric surfaces
US7884998B2 (en) 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
SG139733A1 (en) 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
KR101476087B1 (ko) 2003-06-19 2014-12-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US20060026431A1 (en) * 2004-07-30 2006-02-02 Hitachi Global Storage Technologies B.V. Cryptographic letterheads
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
CN100504506C (zh) * 2005-06-07 2009-06-24 佳世达科技股份有限公司 投影机的光学系统
US8665536B2 (en) 2007-06-19 2014-03-04 Kla-Tencor Corporation External beam delivery system for laser dark-field illumination in a catadioptric optical system

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JP3396935B2 (ja) 1993-11-15 2003-04-14 株式会社ニコン 投影光学系及び投影露光装置
JP3360387B2 (ja) 1993-11-15 2002-12-24 株式会社ニコン 投影光学系及び投影露光装置
JP3395801B2 (ja) 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
DE4417489A1 (de) 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
JPH08179204A (ja) 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3500745B2 (ja) 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
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JPH1010431A (ja) 1996-06-20 1998-01-16 Nikon Corp 反射屈折光学系

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