JPH11106288A5 - - Google Patents
Info
- Publication number
- JPH11106288A5 JPH11106288A5 JP1997269085A JP26908597A JPH11106288A5 JP H11106288 A5 JPH11106288 A5 JP H11106288A5 JP 1997269085 A JP1997269085 A JP 1997269085A JP 26908597 A JP26908597 A JP 26908597A JP H11106288 A5 JPH11106288 A5 JP H11106288A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate surface
- thin film
- producing
- crystal thin
- species
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26908597A JP4014700B2 (ja) | 1997-10-01 | 1997-10-01 | 結晶薄膜製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26908597A JP4014700B2 (ja) | 1997-10-01 | 1997-10-01 | 結晶薄膜製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11106288A JPH11106288A (ja) | 1999-04-20 |
| JPH11106288A5 true JPH11106288A5 (2) | 2005-05-19 |
| JP4014700B2 JP4014700B2 (ja) | 2007-11-28 |
Family
ID=17467470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26908597A Expired - Fee Related JP4014700B2 (ja) | 1997-10-01 | 1997-10-01 | 結晶薄膜製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4014700B2 (2) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7297641B2 (en) * | 2002-07-19 | 2007-11-20 | Asm America, Inc. | Method to form ultra high quality silicon-containing compound layers |
-
1997
- 1997-10-01 JP JP26908597A patent/JP4014700B2/ja not_active Expired - Fee Related
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