JPS5243360A - Process for production of silicon wafer - Google Patents
Process for production of silicon waferInfo
- Publication number
- JPS5243360A JPS5243360A JP11770675A JP11770675A JPS5243360A JP S5243360 A JPS5243360 A JP S5243360A JP 11770675 A JP11770675 A JP 11770675A JP 11770675 A JP11770675 A JP 11770675A JP S5243360 A JPS5243360 A JP S5243360A
- Authority
- JP
- Japan
- Prior art keywords
- production
- silicon wafer
- agregate
- occurs
- surface polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
PURPOSE: To prevent stacking fault before it occurs, by removing minute impurity agregate after surface polishing.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11770675A JPS6019144B2 (en) | 1975-10-01 | 1975-10-01 | Silicon wafer manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11770675A JPS6019144B2 (en) | 1975-10-01 | 1975-10-01 | Silicon wafer manufacturing method |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58124711A Division JPS5925231A (en) | 1983-07-11 | 1983-07-11 | Silicon wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5243360A true JPS5243360A (en) | 1977-04-05 |
| JPS6019144B2 JPS6019144B2 (en) | 1985-05-14 |
Family
ID=14718283
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11770675A Expired JPS6019144B2 (en) | 1975-10-01 | 1975-10-01 | Silicon wafer manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6019144B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5413257A (en) * | 1977-07-01 | 1979-01-31 | Toshiba Corp | Manufacture for plate shape semiconductor mono crystal |
| JPS5580881A (en) * | 1978-12-12 | 1980-06-18 | Nec Corp | Polishing method for single-crystal substrate |
| JPS56173527U (en) * | 1980-05-23 | 1981-12-22 | ||
| JPS5885534A (en) * | 1981-11-18 | 1983-05-21 | Komatsu Denshi Kinzoku Kk | Manufacture of semiconductor silicon |
| JPS58116740A (en) * | 1981-12-29 | 1983-07-12 | Fujitsu Ltd | Treating method for semiconductor crystal |
| JPS6184075A (en) * | 1984-09-18 | 1986-04-28 | イギリス国 | photovoltaic solar cells |
| JPH01244621A (en) * | 1988-03-25 | 1989-09-29 | Shin Etsu Handotai Co Ltd | Method of cleaning surface of silicon single crystal substrate |
| JP2003124220A (en) * | 2001-10-10 | 2003-04-25 | Sumitomo Mitsubishi Silicon Corp | Method for manufacturing silicon wafer and silicon wafer |
-
1975
- 1975-10-01 JP JP11770675A patent/JPS6019144B2/en not_active Expired
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5413257A (en) * | 1977-07-01 | 1979-01-31 | Toshiba Corp | Manufacture for plate shape semiconductor mono crystal |
| JPS5580881A (en) * | 1978-12-12 | 1980-06-18 | Nec Corp | Polishing method for single-crystal substrate |
| JPS56173527U (en) * | 1980-05-23 | 1981-12-22 | ||
| JPS5885534A (en) * | 1981-11-18 | 1983-05-21 | Komatsu Denshi Kinzoku Kk | Manufacture of semiconductor silicon |
| JPS58116740A (en) * | 1981-12-29 | 1983-07-12 | Fujitsu Ltd | Treating method for semiconductor crystal |
| JPS6184075A (en) * | 1984-09-18 | 1986-04-28 | イギリス国 | photovoltaic solar cells |
| JPH01244621A (en) * | 1988-03-25 | 1989-09-29 | Shin Etsu Handotai Co Ltd | Method of cleaning surface of silicon single crystal substrate |
| JP2003124220A (en) * | 2001-10-10 | 2003-04-25 | Sumitomo Mitsubishi Silicon Corp | Method for manufacturing silicon wafer and silicon wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6019144B2 (en) | 1985-05-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5224478A (en) | Semiconductor device manufacturing process | |
| JPS5243360A (en) | Process for production of silicon wafer | |
| JPS5246784A (en) | Process for production of semiconductor device | |
| JPS51146758A (en) | Process for treating a drain water containing polyvinyl alcohol | |
| JPS51121254A (en) | Method of removing impurities from silicon wafer | |
| JPS5235980A (en) | Manufacturing method of semiconductor device | |
| JPS5250997A (en) | Proces for successive production of uranium tetrfluoride | |
| JPS5279654A (en) | Production of semiconductor device | |
| JPS525700A (en) | The process for production of silicon nitride | |
| JPS51151072A (en) | Manufacturing method of a silicon semiconductor | |
| JPS5224462A (en) | Surface treatment of silicone wafer | |
| JPS51140470A (en) | Method of cutting semiconductor crystal | |
| JPS5261956A (en) | Production of semiconductor device | |
| JPS51140484A (en) | Method of etching wafer | |
| JPS5248469A (en) | Process for production of semiconductor device | |
| JPS5219087A (en) | Production method of semiconductor device | |
| JPS5276872A (en) | Cutting method of semiconductor wafer | |
| JPS5422759A (en) | Handling method for semiconductor wafer | |
| JPS5242367A (en) | Method of preventing occurence of crystal defects of silicon wafers | |
| JPS5214378A (en) | Method for production of semiconductor device | |
| JPS5245884A (en) | Process for production of semiconductor device | |
| JPS5379372A (en) | Production of silicon semoconductor device | |
| JPS51146064A (en) | Apparatus for separating cloth from stack of cloth | |
| JPS5240495A (en) | Process for recovering aluminium sulfate | |
| JPS53111277A (en) | Semiconductor wafer and its fabricating method |