JPS5254897A - Plasma ion source for solid materials - Google Patents
Plasma ion source for solid materialsInfo
- Publication number
- JPS5254897A JPS5254897A JP50129218A JP12921875A JPS5254897A JP S5254897 A JPS5254897 A JP S5254897A JP 50129218 A JP50129218 A JP 50129218A JP 12921875 A JP12921875 A JP 12921875A JP S5254897 A JPS5254897 A JP S5254897A
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- solid materials
- plasma ion
- spark chamber
- path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50129218A JPS5254897A (en) | 1975-10-29 | 1975-10-29 | Plasma ion source for solid materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50129218A JPS5254897A (en) | 1975-10-29 | 1975-10-29 | Plasma ion source for solid materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5254897A true JPS5254897A (en) | 1977-05-04 |
| JPS5721829B2 JPS5721829B2 (ja) | 1982-05-10 |
Family
ID=15004049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50129218A Granted JPS5254897A (en) | 1975-10-29 | 1975-10-29 | Plasma ion source for solid materials |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5254897A (ja) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60100340A (ja) * | 1984-10-15 | 1985-06-04 | Hitachi Ltd | マイクロ波イオン源 |
| JPH01103156U (ja) * | 1987-12-26 | 1989-07-12 | ||
| JPH03112100A (ja) * | 1989-09-27 | 1991-05-13 | Ebara Corp | 高速原子線放射装置 |
| JPH06325710A (ja) * | 1993-05-14 | 1994-11-25 | Hitachi Ltd | マイクロ波イオン源及びイオン打ち込み装置 |
| US6225569B1 (en) | 1996-11-15 | 2001-05-01 | Ngk Spark Plug Co., Ltd. | Wiring substrate and method of manufacturing the same |
| US6927148B2 (en) | 2002-07-15 | 2005-08-09 | Applied Materials, Inc. | Ion implantation method and method for manufacturing SOI wafer |
| US7064049B2 (en) | 2002-07-31 | 2006-06-20 | Applied Materials, Inv. | Ion implantation method, SOI wafer manufacturing method and ion implantation system |
-
1975
- 1975-10-29 JP JP50129218A patent/JPS5254897A/ja active Granted
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60100340A (ja) * | 1984-10-15 | 1985-06-04 | Hitachi Ltd | マイクロ波イオン源 |
| JPH01103156U (ja) * | 1987-12-26 | 1989-07-12 | ||
| JPH03112100A (ja) * | 1989-09-27 | 1991-05-13 | Ebara Corp | 高速原子線放射装置 |
| JPH06325710A (ja) * | 1993-05-14 | 1994-11-25 | Hitachi Ltd | マイクロ波イオン源及びイオン打ち込み装置 |
| US6225569B1 (en) | 1996-11-15 | 2001-05-01 | Ngk Spark Plug Co., Ltd. | Wiring substrate and method of manufacturing the same |
| US6927148B2 (en) | 2002-07-15 | 2005-08-09 | Applied Materials, Inc. | Ion implantation method and method for manufacturing SOI wafer |
| US7064049B2 (en) | 2002-07-31 | 2006-06-20 | Applied Materials, Inv. | Ion implantation method, SOI wafer manufacturing method and ion implantation system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5721829B2 (ja) | 1982-05-10 |
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