JPS5299067A - Semiconductor crystal multilayer continuous growing method - Google Patents
Semiconductor crystal multilayer continuous growing methodInfo
- Publication number
- JPS5299067A JPS5299067A JP1672976A JP1672976A JPS5299067A JP S5299067 A JPS5299067 A JP S5299067A JP 1672976 A JP1672976 A JP 1672976A JP 1672976 A JP1672976 A JP 1672976A JP S5299067 A JPS5299067 A JP S5299067A
- Authority
- JP
- Japan
- Prior art keywords
- growing method
- semiconductor crystal
- crystal multilayer
- multilayer continuous
- continuous growing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 125000005842 heteroatom Chemical group 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
PURPOSE: To improve the crystallinity of grown layers and make the crystal composition distribution and impurity distribution of each layer even, in a crystal growing method for double hetero type semiconductor lasers.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1672976A JPS5299067A (en) | 1976-02-17 | 1976-02-17 | Semiconductor crystal multilayer continuous growing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1672976A JPS5299067A (en) | 1976-02-17 | 1976-02-17 | Semiconductor crystal multilayer continuous growing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5299067A true JPS5299067A (en) | 1977-08-19 |
Family
ID=11924341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1672976A Pending JPS5299067A (en) | 1976-02-17 | 1976-02-17 | Semiconductor crystal multilayer continuous growing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5299067A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61268023A (en) * | 1985-05-13 | 1986-11-27 | Stanley Electric Co Ltd | Manufacture of semiconductor element |
| JPS61268024A (en) * | 1985-05-13 | 1986-11-27 | Stanley Electric Co Ltd | Manufacture of semiconductor element |
-
1976
- 1976-02-17 JP JP1672976A patent/JPS5299067A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61268023A (en) * | 1985-05-13 | 1986-11-27 | Stanley Electric Co Ltd | Manufacture of semiconductor element |
| JPS61268024A (en) * | 1985-05-13 | 1986-11-27 | Stanley Electric Co Ltd | Manufacture of semiconductor element |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5347765A (en) | Semiconductor crystal growth method | |
| JPS5317066A (en) | Vapor phase epitaxial growth method | |
| JPS5434756A (en) | Vapor-phase growth method for semiconductor | |
| JPS5296865A (en) | Crystal grown unit for chemical compound semiconductor | |
| JPS535569A (en) | Liquid-phase epitaxial growth method | |
| JPS52143761A (en) | Crystal growth method | |
| JPS53104162A (en) | Forming method for epitaxial layer on semiconductor wafer | |
| JPS52117062A (en) | Liquid phase epitaxial growth process | |
| JPS5286058A (en) | Liquid phase epitaxial growth | |
| JPS52120764A (en) | Manufacture of semiconductor device on insulator substrate | |
| JPS53112080A (en) | Semiconductor laser | |
| JPS5429560A (en) | Gas phase growth method for semiconductor | |
| JPS5211860A (en) | Liquid phase epitaxial device | |
| JPS5436192A (en) | Manufacture for semiconductor | |
| JPS52155189A (en) | Multiple layer crystal growth | |
| JPS53143163A (en) | Epitaxial growth method | |
| JPS5333569A (en) | Method of reducing lattice defects of single crystal | |
| JPS5286775A (en) | Bebeling method for semiconductor substrate | |
| JPS5361595A (en) | Liquid phase epitaxial growing method for gaas-algaas | |
| JPS5322382A (en) | Production of dielectric isolating substrate | |
| JPS52115171A (en) | Liquid phase epitaxial growing method | |
| JPS5229186A (en) | Photosemiconductor device | |
| JPS52111386A (en) | Production of semi-conductor | |
| JPS53100770A (en) | Production of epitaxial growth layer | |
| JPS5366163A (en) | Selective growth method of semiconductor buried layer |