JPS5474728A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS5474728A
JPS5474728A JP14247377A JP14247377A JPS5474728A JP S5474728 A JPS5474728 A JP S5474728A JP 14247377 A JP14247377 A JP 14247377A JP 14247377 A JP14247377 A JP 14247377A JP S5474728 A JPS5474728 A JP S5474728A
Authority
JP
Japan
Prior art keywords
composition
aryl
resist
photo
forming type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14247377A
Other languages
English (en)
Other versions
JPS576096B2 (ja
Inventor
Masayuki Iwasaki
Shigeru Sato
Hiroo Inoue
Akira Nagashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP14247377A priority Critical patent/JPS5474728A/ja
Priority to US05/961,164 priority patent/US4232106A/en
Priority to US05/962,851 priority patent/US4212970A/en
Priority to GB7845705A priority patent/GB2009437B/en
Priority to GB7845706A priority patent/GB2010259B/en
Priority to FR7833186A priority patent/FR2410301A1/fr
Priority to FR7833187A priority patent/FR2409992A1/fr
Priority to DE2851471A priority patent/DE2851471C2/de
Priority to DE2851472A priority patent/DE2851472C2/de
Publication of JPS5474728A publication Critical patent/JPS5474728A/ja
Publication of JPS576096B2 publication Critical patent/JPS576096B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D271/00—Heterocyclic compounds containing five-membered rings having two nitrogen atoms and one oxygen atom as the only ring hetero atoms
    • C07D271/02—Heterocyclic compounds containing five-membered rings having two nitrogen atoms and one oxygen atom as the only ring hetero atoms not condensed with other rings
    • C07D271/10—1,3,4-Oxadiazoles; Hydrogenated 1,3,4-oxadiazoles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Materials For Photolithography (AREA)
JP14247377A 1977-11-28 1977-11-28 Photosensitive composition Granted JPS5474728A (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP14247377A JPS5474728A (en) 1977-11-28 1977-11-28 Photosensitive composition
US05/961,164 US4232106A (en) 1977-11-28 1978-11-16 Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors
US05/962,851 US4212970A (en) 1977-11-28 1978-11-22 2-Halomethyl-5-vinyl-1,3,4-oxadiazole compounds
GB7845705A GB2009437B (en) 1977-11-28 1978-11-23 Photosensitive compositions containing aromatic vinyl compounds which generate free radicals
GB7845706A GB2010259B (en) 1977-11-28 1978-11-23 2-halomethyl-5-vinyl-1,3,4-oxadiazole
FR7833186A FR2410301A1 (fr) 1977-11-28 1978-11-24 Composition photosensible
FR7833187A FR2409992A1 (fr) 1977-11-28 1978-11-24 Nouveaux 2-halomethyl-5-vinyl-1,3,4-oxadiazoles
DE2851471A DE2851471C2 (de) 1977-11-28 1978-11-28 2-Trihalogenmethyl-5-vinyl-1,3,4-oxadiazol-Verbindungen
DE2851472A DE2851472C2 (de) 1977-11-28 1978-11-28 Lichtempfindliches Gemisch

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14247377A JPS5474728A (en) 1977-11-28 1977-11-28 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS5474728A true JPS5474728A (en) 1979-06-15
JPS576096B2 JPS576096B2 (ja) 1982-02-03

Family

ID=15316130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14247377A Granted JPS5474728A (en) 1977-11-28 1977-11-28 Photosensitive composition

Country Status (5)

Country Link
US (1) US4232106A (ja)
JP (1) JPS5474728A (ja)
DE (1) DE2851472C2 (ja)
FR (1) FR2410301A1 (ja)
GB (1) GB2009437B (ja)

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088942A (ja) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPS61107352A (ja) * 1984-10-31 1986-05-26 Konishiroku Photo Ind Co Ltd ポジ型平版印刷版材料
JPS6271905A (ja) * 1985-09-26 1987-04-02 Fuji Photo Film Co Ltd 配向膜の作成方法
JPS63311247A (ja) * 1987-06-12 1988-12-20 Konica Corp 感光性組成物
JPH0248664A (ja) * 1988-08-11 1990-02-19 Fuji Photo Film Co Ltd ドライフイルムレジスト用光重合性組成物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
JPH0446344A (ja) * 1990-06-14 1992-02-17 Mitsubishi Kasei Corp ネガ型感光性組成物
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP1627732A1 (en) 2004-08-18 2006-02-22 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1640173A1 (en) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1690685A2 (en) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1705004A1 (en) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
WO2007136005A1 (ja) 2006-05-18 2007-11-29 Fujifilm Corporation 被乾燥物の乾燥方法及び装置
EP1872943A2 (en) 1999-05-21 2008-01-02 FUJIFILM Corporation Photosensitive composition and planographic printing plate base using same
EP1925447A1 (en) 2002-09-17 2008-05-28 FUJIFILM Corporation Image forming material
EP2036721A1 (en) 2000-11-30 2009-03-18 FUJIFILM Corporation Planographic printing plate precursor
EP2042305A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
EP2042308A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042306A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor and method of producing a copolymer used therein
EP2042310A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
EP2106907A2 (en) 2008-04-02 2009-10-07 FUJIFILM Corporation Planographic printing plate precursor
EP2161129A2 (en) 2008-09-09 2010-03-10 Fujifilm Corporation Photosensitive lithographic printing plate precursor for infrared laser
DE112008000778T5 (de) 2007-03-23 2010-04-08 Mitsubishi Paper Mills Limited Wasserentwickelbares photoempfindliches Lithographiedruckplattenmaterial
EP2236293A2 (en) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithographic printing plate precursor
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
EP2354854A1 (en) 2002-09-20 2011-08-10 FUJIFILM Corporation Method of making lithographic printing plate
EP2357530A2 (en) 2010-02-17 2011-08-17 Fujifilm Corporation Method for producing a planographic printing plate
WO2011102485A1 (ja) 2010-02-19 2011-08-25 富士フイルム株式会社 平版印刷版の作製方法
WO2011125913A1 (ja) 2010-03-31 2011-10-13 富士フイルム株式会社 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
DE112011101165T5 (de) 2010-03-29 2013-03-28 Mitsubishi Paper Mills Limited Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial
EP2641738A2 (en) 2012-03-23 2013-09-25 Fujifilm Corporation Method of producing planographic printing plate and planographic printing plate
EP2644379A1 (en) 2012-03-30 2013-10-02 FUJIFILM Corporation Method of producing a planographic printing plate

Families Citing this family (93)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2952697A1 (de) * 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes strahlungsempfindliches kopiermaterial
JPS5720734A (en) * 1980-07-15 1982-02-03 Fuji Photo Film Co Ltd Heat developing photosensitive material
JPS59148784A (ja) * 1983-02-10 1984-08-25 Konishiroku Photo Ind Co Ltd ５―置換―２―ハロメチル―１，３，４―オキサジアゾール化合物及び該化合物を含有する光反応開始剤
JPS6063532A (ja) * 1983-08-16 1985-04-11 Fuji Photo Film Co Ltd 光重合性組成物
DE3333450A1 (de) * 1983-09-16 1985-04-11 Hoechst Ag, 6230 Frankfurt Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
JPS60177340A (ja) * 1984-02-24 1985-09-11 Fuji Photo Film Co Ltd 感光性組成物
DE3613632A1 (de) * 1986-04-23 1987-10-29 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
DE3716848A1 (de) * 1987-05-20 1988-12-01 Hoechst Ag Verfahren zur bebilderung lichtempfindlichen materials
DE3725949A1 (de) * 1987-08-05 1989-02-16 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien
EP0325863A3 (en) * 1987-12-28 1990-07-11 Mark S. Depalma Multi-color ultraviolet radiation measurement device
DE3807381A1 (de) * 1988-03-07 1989-09-21 Hoechst Ag 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen enthaltende heterocyclische verbindungen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindung enthaelt
US5216158A (en) * 1988-03-07 1993-06-01 Hoechst Aktiengesellschaft Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation
EP0362778B1 (en) * 1988-10-03 1999-01-13 Mitsubishi Chemical Corporation Photosensitive composition
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
WO1991005290A1 (en) * 1989-09-28 1991-04-18 Polychrome Corporation Improved persistent photoconductive coating composition
DE4006190A1 (de) * 1990-02-28 1991-08-29 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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JP5159123B2 (ja) * 2007-02-27 2013-03-06 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
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Also Published As

Publication number Publication date
US4232106A (en) 1980-11-04
JPS576096B2 (ja) 1982-02-03
DE2851472C2 (de) 1982-09-02
GB2009437A (en) 1979-06-13
FR2410301B1 (ja) 1983-10-07
GB2009437B (en) 1982-09-02
DE2851472A1 (de) 1979-05-31
FR2410301A1 (fr) 1979-06-22

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