JPS556829A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS556829A
JPS556829A JP7892878A JP7892878A JPS556829A JP S556829 A JPS556829 A JP S556829A JP 7892878 A JP7892878 A JP 7892878A JP 7892878 A JP7892878 A JP 7892878A JP S556829 A JPS556829 A JP S556829A
Authority
JP
Japan
Prior art keywords
electron beam
slit
converter
passing
results
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7892878A
Other languages
English (en)
Inventor
Toshihiko Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7892878A priority Critical patent/JPS556829A/ja
Publication of JPS556829A publication Critical patent/JPS556829A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP7892878A 1978-06-29 1978-06-29 Electron beam exposure method Pending JPS556829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7892878A JPS556829A (en) 1978-06-29 1978-06-29 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7892878A JPS556829A (en) 1978-06-29 1978-06-29 Electron beam exposure method

Publications (1)

Publication Number Publication Date
JPS556829A true JPS556829A (en) 1980-01-18

Family

ID=13675522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7892878A Pending JPS556829A (en) 1978-06-29 1978-06-29 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS556829A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133825A (en) * 1980-03-21 1981-10-20 Toshiba Corp Electron beam device
JPS57207339A (en) * 1981-06-16 1982-12-20 Fujitsu Ltd Electron beam exposure device
JPS5856418A (ja) * 1981-09-30 1983-04-04 Fujitsu Ltd 電子ビ−ム露光装置
JPS6354581A (ja) * 1986-08-21 1988-03-08 金子農機株式会社 穀物乾燥方法
JP2009010078A (ja) * 2007-06-27 2009-01-15 Nuflare Technology Inc 電子ビーム描画装置及び電子ビームの電流密度調整方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133825A (en) * 1980-03-21 1981-10-20 Toshiba Corp Electron beam device
JPS57207339A (en) * 1981-06-16 1982-12-20 Fujitsu Ltd Electron beam exposure device
JPS5856418A (ja) * 1981-09-30 1983-04-04 Fujitsu Ltd 電子ビ−ム露光装置
JPS6354581A (ja) * 1986-08-21 1988-03-08 金子農機株式会社 穀物乾燥方法
JP2009010078A (ja) * 2007-06-27 2009-01-15 Nuflare Technology Inc 電子ビーム描画装置及び電子ビームの電流密度調整方法

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