JPS55761A - Production of silicone block polymer - Google Patents

Production of silicone block polymer

Info

Publication number
JPS55761A
JPS55761A JP2822279A JP2822279A JPS55761A JP S55761 A JPS55761 A JP S55761A JP 2822279 A JP2822279 A JP 2822279A JP 2822279 A JP2822279 A JP 2822279A JP S55761 A JPS55761 A JP S55761A
Authority
JP
Japan
Prior art keywords
block polymer
amine
silicone block
production
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2822279A
Other languages
Japanese (ja)
Other versions
JPS6017335B2 (en
Inventor
Taro Suminoe
Yoshio Matsumura
Nagahiko Tomomitsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP2822279A priority Critical patent/JPS6017335B2/en
Publication of JPS55761A publication Critical patent/JPS55761A/en
Publication of JPS6017335B2 publication Critical patent/JPS6017335B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Silicon Polymers (AREA)

Abstract

PURPOSE: Methylpolysiloxane is made to react with a specific organochlorosilane to produce a heat-curable silicone block polymer with high heat resistance and good flexibility.
CONSTITUTION: Methyltrichlorosiloxane (CH3SiCl3) is dissolved in a solvent mix of a ketone and ether and hydrolyzed in the presence of an amine and then condensed by heating to form methylpolysiloxane (A) with a number-average molecular weight of 9000W10000 of formula I, which is made to react with a compound B of formula II (m is 0W100) in the presence of an amine as pyridine or triethylamine in an organic solvent as tetrahydrofuran to produce the block polymer. In the reaction, the amount of the maine is 0.1W1 part per 1 part of (A) when pyridine is used as the amine, the amount of the solvent is preferably 3W10 parts, when tetrahydrofuran is used, and (B) is 0.1W1.5 when m equals to 20.
COPYRIGHT: (C)1980,JPO&Japio
JP2822279A 1979-03-13 1979-03-13 Manufacturing method of silicone block polymer Expired JPS6017335B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2822279A JPS6017335B2 (en) 1979-03-13 1979-03-13 Manufacturing method of silicone block polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2822279A JPS6017335B2 (en) 1979-03-13 1979-03-13 Manufacturing method of silicone block polymer

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP52150604A Division JPS5950182B2 (en) 1977-12-16 1977-12-16 silicone resin composition

Publications (2)

Publication Number Publication Date
JPS55761A true JPS55761A (en) 1980-01-07
JPS6017335B2 JPS6017335B2 (en) 1985-05-02

Family

ID=12242581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2822279A Expired JPS6017335B2 (en) 1979-03-13 1979-03-13 Manufacturing method of silicone block polymer

Country Status (1)

Country Link
JP (1) JPS6017335B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
WO2026105767A1 (en) * 2024-11-13 2026-05-21 信越化学工業株式会社 Resin-linear structure-containing organopolysiloxane, composition comprising same, and method for producing same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
WO2026105767A1 (en) * 2024-11-13 2026-05-21 信越化学工業株式会社 Resin-linear structure-containing organopolysiloxane, composition comprising same, and method for producing same

Also Published As

Publication number Publication date
JPS6017335B2 (en) 1985-05-02

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