JPS5587437A - Method of detecting completion of dry etching - Google Patents
Method of detecting completion of dry etchingInfo
- Publication number
- JPS5587437A JPS5587437A JP16317178A JP16317178A JPS5587437A JP S5587437 A JPS5587437 A JP S5587437A JP 16317178 A JP16317178 A JP 16317178A JP 16317178 A JP16317178 A JP 16317178A JP S5587437 A JPS5587437 A JP S5587437A
- Authority
- JP
- Japan
- Prior art keywords
- conductors
- plate
- block
- quartz
- dry etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To certainly detect the completion of dry etching process by determining the resistance between terminals by means of detection probes contacting a masking layer which is provided on the outer surface of a conductive film on a semiconductor substrate in accordance with a monitor pattern consisting of two terminal regions.
CONSTITUTION: A circular block 8 is formed on the central portion of the upper surface of a quartz bottom plate 7, and three guide pins 9 are planted around the block 8. A silicone substrate 10 to be treated is placed on the block 8 fixedly held by the guide pins 9. Two ring type conductors 3 are provided on a peripheral portion of an annular quartz plate 1, which has an opening 2 at which the plate 1 is fitted around the block 8, the conductors 3 having detection needles 5 extended into the opening 2. The conductors 3 are fixed on the quartz plate 1 with a quartz glass material 4, and a flexible lead wire 6 is connected to the conductors 3. The annular plate 1 and bottom plate 7 and then combined together and inserted into a vacuum container so as to be subjected to dry etching. A resistance value appearing between the detection needles 5 contacting a conductive film 11 provided on the substrate 10 is low in an early stage of an etching operation and extremely high at the end thereof. Accordingly, the completion of an etching operation can be detected cartainly.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16317178A JPS5587437A (en) | 1978-12-26 | 1978-12-26 | Method of detecting completion of dry etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16317178A JPS5587437A (en) | 1978-12-26 | 1978-12-26 | Method of detecting completion of dry etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5587437A true JPS5587437A (en) | 1980-07-02 |
Family
ID=15768582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16317178A Pending JPS5587437A (en) | 1978-12-26 | 1978-12-26 | Method of detecting completion of dry etching |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5587437A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6022323A (en) * | 1983-07-18 | 1985-02-04 | Rohm Co Ltd | Detection of passivation dry etching termination point |
| JPS6066475A (en) * | 1983-09-21 | 1985-04-16 | Fujitsu Ltd | Manufacture of semiconductor device |
| US6127237A (en) * | 1998-03-04 | 2000-10-03 | Kabushiki Kaisha Toshiba | Etching end point detecting method based on junction current measurement and etching apparatus |
-
1978
- 1978-12-26 JP JP16317178A patent/JPS5587437A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6022323A (en) * | 1983-07-18 | 1985-02-04 | Rohm Co Ltd | Detection of passivation dry etching termination point |
| JPS6066475A (en) * | 1983-09-21 | 1985-04-16 | Fujitsu Ltd | Manufacture of semiconductor device |
| US6127237A (en) * | 1998-03-04 | 2000-10-03 | Kabushiki Kaisha Toshiba | Etching end point detecting method based on junction current measurement and etching apparatus |
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