JPS5587437A - Method of detecting completion of dry etching - Google Patents
Method of detecting completion of dry etchingInfo
- Publication number
- JPS5587437A JPS5587437A JP16317178A JP16317178A JPS5587437A JP S5587437 A JPS5587437 A JP S5587437A JP 16317178 A JP16317178 A JP 16317178A JP 16317178 A JP16317178 A JP 16317178A JP S5587437 A JPS5587437 A JP S5587437A
- Authority
- JP
- Japan
- Prior art keywords
- conductors
- plate
- block
- quartz
- dry etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16317178A JPS5587437A (en) | 1978-12-26 | 1978-12-26 | Method of detecting completion of dry etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16317178A JPS5587437A (en) | 1978-12-26 | 1978-12-26 | Method of detecting completion of dry etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5587437A true JPS5587437A (en) | 1980-07-02 |
Family
ID=15768582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16317178A Pending JPS5587437A (en) | 1978-12-26 | 1978-12-26 | Method of detecting completion of dry etching |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5587437A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6022323A (ja) * | 1983-07-18 | 1985-02-04 | Rohm Co Ltd | 絶縁層ドライエツチの終点検出方法 |
| JPS6066475A (ja) * | 1983-09-21 | 1985-04-16 | Fujitsu Ltd | 半導体装置の製造方法 |
| US6127237A (en) * | 1998-03-04 | 2000-10-03 | Kabushiki Kaisha Toshiba | Etching end point detecting method based on junction current measurement and etching apparatus |
-
1978
- 1978-12-26 JP JP16317178A patent/JPS5587437A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6022323A (ja) * | 1983-07-18 | 1985-02-04 | Rohm Co Ltd | 絶縁層ドライエツチの終点検出方法 |
| JPS6066475A (ja) * | 1983-09-21 | 1985-04-16 | Fujitsu Ltd | 半導体装置の製造方法 |
| US6127237A (en) * | 1998-03-04 | 2000-10-03 | Kabushiki Kaisha Toshiba | Etching end point detecting method based on junction current measurement and etching apparatus |
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