JPS51117885A - Semiconductor device manufacturing method - Google Patents

Semiconductor device manufacturing method

Info

Publication number
JPS51117885A
JPS51117885A JP4276575A JP4276575A JPS51117885A JP S51117885 A JPS51117885 A JP S51117885A JP 4276575 A JP4276575 A JP 4276575A JP 4276575 A JP4276575 A JP 4276575A JP S51117885 A JPS51117885 A JP S51117885A
Authority
JP
Japan
Prior art keywords
semiconductor device
device manufacturing
etching
lalyer
faded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4276575A
Other languages
Japanese (ja)
Inventor
Toshihiko Ono
Kenichi Imai
Kuniaki Makabe
Makoto Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4276575A priority Critical patent/JPS51117885A/en
Publication of JPS51117885A publication Critical patent/JPS51117885A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE: Reliable electrical connection is obtained by making thru-holes of a predetermined depth by gradually removing an insulation lalyer by an etching process and stopping the etching at a point in time the adjacent tantalum film color is faded.
COPYRIGHT: (C)1976,JPO&Japio
JP4276575A 1975-04-10 1975-04-10 Semiconductor device manufacturing method Pending JPS51117885A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4276575A JPS51117885A (en) 1975-04-10 1975-04-10 Semiconductor device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4276575A JPS51117885A (en) 1975-04-10 1975-04-10 Semiconductor device manufacturing method

Publications (1)

Publication Number Publication Date
JPS51117885A true JPS51117885A (en) 1976-10-16

Family

ID=12645064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4276575A Pending JPS51117885A (en) 1975-04-10 1975-04-10 Semiconductor device manufacturing method

Country Status (1)

Country Link
JP (1) JPS51117885A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5895843A (en) * 1981-12-02 1983-06-07 Mitsubishi Electric Corp Manufacture of semiconductor device
JPS58175829A (en) * 1982-04-08 1983-10-15 Mitsubishi Electric Corp Semicoductor device and manufacture thereof
JPS58216444A (en) * 1982-06-10 1983-12-16 Nec Corp Manufacture of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5895843A (en) * 1981-12-02 1983-06-07 Mitsubishi Electric Corp Manufacture of semiconductor device
JPS58175829A (en) * 1982-04-08 1983-10-15 Mitsubishi Electric Corp Semicoductor device and manufacture thereof
JPS58216444A (en) * 1982-06-10 1983-12-16 Nec Corp Manufacture of semiconductor device

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