JPS564236A - Manufacture of photoresist film pattern - Google Patents

Manufacture of photoresist film pattern

Info

Publication number
JPS564236A
JPS564236A JP7983379A JP7983379A JPS564236A JP S564236 A JPS564236 A JP S564236A JP 7983379 A JP7983379 A JP 7983379A JP 7983379 A JP7983379 A JP 7983379A JP S564236 A JPS564236 A JP S564236A
Authority
JP
Japan
Prior art keywords
film
resist
photoresist
mask
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7983379A
Other languages
Japanese (ja)
Inventor
Masaaki Inada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7983379A priority Critical patent/JPS564236A/en
Publication of JPS564236A publication Critical patent/JPS564236A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To make a proper pattern of a negative resist on a substrate or on a coating of a substrate having a remarkable stationary wave phenomenon, by providing a thick film on a thin film of a negative resist resist, making a mask of the thick film and applying plasma to change each exposed part of the thin film into ash. CONSTITUTION:A negative photoresist 9 is provided at a very small thickness on a coated film 2 on a semiconductor substrate 1 and baked. The entire surface of the baked photoresist is exposed to light 5. Another photoresist 10 is provided at a large thickness on the former photoresist and baked. A mask 4 is fitted. The photoresist 10 is exposed to light 5 and developed to make a proper pattern 11-13 with no wrinkles and exfoliations. After that, baking is effected. Gas plasma is applied to the thin resist film 9 through the mask 11-13 to change the film into ash to make another proper pattern 14-16 of the resist films 10, 9. The resulting mask 14-16 is used to selectively etch the film 2 and then removed. As a result, a desired pattern 17-19 is produced. The resist pattern of proper shape can thus be made by using the negative photoresists twice, without suffering from the influence of stationary waves or the like.
JP7983379A 1979-06-25 1979-06-25 Manufacture of photoresist film pattern Pending JPS564236A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7983379A JPS564236A (en) 1979-06-25 1979-06-25 Manufacture of photoresist film pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7983379A JPS564236A (en) 1979-06-25 1979-06-25 Manufacture of photoresist film pattern

Publications (1)

Publication Number Publication Date
JPS564236A true JPS564236A (en) 1981-01-17

Family

ID=13701203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7983379A Pending JPS564236A (en) 1979-06-25 1979-06-25 Manufacture of photoresist film pattern

Country Status (1)

Country Link
JP (1) JPS564236A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100428A (en) * 1981-12-10 1983-06-15 Matsushita Electronics Corp Formation of pattern
JPS5951527A (en) * 1982-09-17 1984-03-26 Matsushita Electric Ind Co Ltd Pattern formation
JPS6091639A (en) * 1983-10-26 1985-05-23 Alps Electric Co Ltd Formation of photo resist pattern
JPS60121416A (en) * 1983-10-24 1985-06-28 ボ−シユ　アンド　ロ−ム　インコ−ポレイテイド Sterilization of contact lens by oxygen cleaning
US5275945A (en) * 1991-10-08 1994-01-04 Vista Chemical Company Alkaline proteases stable in heavy-duty detergent liquids

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5080834A (en) * 1973-11-16 1975-07-01
JPS50113171A (en) * 1974-02-13 1975-09-05
JPS5158072A (en) * 1974-11-18 1976-05-21 Matsushita Electric Industrial Co Ltd Handotaisochinoseizohoho
JPS5389673A (en) * 1977-01-19 1978-08-07 Oki Electric Ind Co Ltd Fine pattern forming method of semiconductor device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5080834A (en) * 1973-11-16 1975-07-01
JPS50113171A (en) * 1974-02-13 1975-09-05
JPS5158072A (en) * 1974-11-18 1976-05-21 Matsushita Electric Industrial Co Ltd Handotaisochinoseizohoho
JPS5389673A (en) * 1977-01-19 1978-08-07 Oki Electric Ind Co Ltd Fine pattern forming method of semiconductor device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100428A (en) * 1981-12-10 1983-06-15 Matsushita Electronics Corp Formation of pattern
JPS5951527A (en) * 1982-09-17 1984-03-26 Matsushita Electric Ind Co Ltd Pattern formation
JPS60121416A (en) * 1983-10-24 1985-06-28 ボ−シユ　アンド　ロ−ム　インコ−ポレイテイド Sterilization of contact lens by oxygen cleaning
JPS6091639A (en) * 1983-10-26 1985-05-23 Alps Electric Co Ltd Formation of photo resist pattern
US5275945A (en) * 1991-10-08 1994-01-04 Vista Chemical Company Alkaline proteases stable in heavy-duty detergent liquids

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