JPS5698478A - Vacuum treating device - Google Patents

Vacuum treating device

Info

Publication number
JPS5698478A
JPS5698478A JP30580A JP30580A JPS5698478A JP S5698478 A JPS5698478 A JP S5698478A JP 30580 A JP30580 A JP 30580A JP 30580 A JP30580 A JP 30580A JP S5698478 A JPS5698478 A JP S5698478A
Authority
JP
Japan
Prior art keywords
wafer
lift
chamber
fork
truck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30580A
Other languages
Japanese (ja)
Other versions
JPS6247952B2 (en
Inventor
Yasuhiro Horiike
Hidetaka Jo
Tetsuo Kurisaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP30580A priority Critical patent/JPS5698478A/en
Publication of JPS5698478A publication Critical patent/JPS5698478A/en
Publication of JPS6247952B2 publication Critical patent/JPS6247952B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To convey wafers securely with a small-type device by a method wherein the wafers are conveyed from a treating chamber into a containing chamber and vice versa by a single truck. CONSTITUTION:After etching in the treating chamber 1 is completed, the wafer 6 on an electrode 3 is pushed upward by a lift 18 and simultaneously a fork 23 at the tip end of a double-pulley truck 21 in the containing chamber 9 is moved toward a place directly below the lifted wafer 6. When the fork 23 reaches the place directly below the wafer 6, the lift 8 is lowered so that the wafer 6 is placed on the fork 23. The fork 23 with the wafer 6 placed thereon is returned to the chamber 9 and stopped above a lift 20 near a communicating port. After the lift 20 pushes the wafer 6 on the fork 23 upwards, the truck 21 is retracted. When the wafer 6 is placed on the lift 20, the lift 20 is lowered to transfer the wafer 6 onto a belt 22 and then the wafer 6 is contained in a containing cassette 11. Similar operations are conducted when the wafer is conveyed from the chamber 9 to the chamber 4.
JP30580A 1980-01-08 1980-01-08 Vacuum treating device Granted JPS5698478A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30580A JPS5698478A (en) 1980-01-08 1980-01-08 Vacuum treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30580A JPS5698478A (en) 1980-01-08 1980-01-08 Vacuum treating device

Publications (2)

Publication Number Publication Date
JPS5698478A true JPS5698478A (en) 1981-08-07
JPS6247952B2 JPS6247952B2 (en) 1987-10-12

Family

ID=11470181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30580A Granted JPS5698478A (en) 1980-01-08 1980-01-08 Vacuum treating device

Country Status (1)

Country Link
JP (1) JPS5698478A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177367A (en) * 1983-03-25 1984-10-08 Matsushita Electric Ind Co Ltd Vacuum deposition equipment with sample transport mechanism
JPS6010625A (en) * 1983-06-29 1985-01-19 Tokyo Denshi Kagaku Kabushiki Multistage plasma processor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6440047U (en) * 1987-09-07 1989-03-09

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177367A (en) * 1983-03-25 1984-10-08 Matsushita Electric Ind Co Ltd Vacuum deposition equipment with sample transport mechanism
JPS6010625A (en) * 1983-06-29 1985-01-19 Tokyo Denshi Kagaku Kabushiki Multistage plasma processor

Also Published As

Publication number Publication date
JPS6247952B2 (en) 1987-10-12

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