JPS5818982A - 蒸着薄膜形成方法 - Google Patents

蒸着薄膜形成方法

Info

Publication number
JPS5818982A
JPS5818982A JP56117341A JP11734181A JPS5818982A JP S5818982 A JPS5818982 A JP S5818982A JP 56117341 A JP56117341 A JP 56117341A JP 11734181 A JP11734181 A JP 11734181A JP S5818982 A JPS5818982 A JP S5818982A
Authority
JP
Japan
Prior art keywords
layer
stencil
thin film
substrate
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56117341A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0363231B2 (2
Inventor
Hiroyuki Abe
浩之 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56117341A priority Critical patent/JPS5818982A/ja
Publication of JPS5818982A publication Critical patent/JPS5818982A/ja
Publication of JPH0363231B2 publication Critical patent/JPH0363231B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0912—Manufacture or treatment of Josephson-effect devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
JP56117341A 1981-07-27 1981-07-27 蒸着薄膜形成方法 Granted JPS5818982A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56117341A JPS5818982A (ja) 1981-07-27 1981-07-27 蒸着薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56117341A JPS5818982A (ja) 1981-07-27 1981-07-27 蒸着薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS5818982A true JPS5818982A (ja) 1983-02-03
JPH0363231B2 JPH0363231B2 (2) 1991-09-30

Family

ID=14709303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56117341A Granted JPS5818982A (ja) 1981-07-27 1981-07-27 蒸着薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS5818982A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60224286A (ja) * 1984-04-21 1985-11-08 Nippon Telegr & Teleph Corp <Ntt> トンネル接合型ジヨセフソン素子の製法
JPH04110099U (ja) * 1990-11-30 1992-09-24 タツタ電線株式会社 音声変換素子用コイル

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55146927A (en) * 1979-05-07 1980-11-15 Citizen Watch Co Ltd Film forming device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55146927A (en) * 1979-05-07 1980-11-15 Citizen Watch Co Ltd Film forming device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60224286A (ja) * 1984-04-21 1985-11-08 Nippon Telegr & Teleph Corp <Ntt> トンネル接合型ジヨセフソン素子の製法
JPH04110099U (ja) * 1990-11-30 1992-09-24 タツタ電線株式会社 音声変換素子用コイル

Also Published As

Publication number Publication date
JPH0363231B2 (2) 1991-09-30

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