JPS5984356A - 光デイスク原盤の作成方法 - Google Patents
光デイスク原盤の作成方法Info
- Publication number
- JPS5984356A JPS5984356A JP57193439A JP19343982A JPS5984356A JP S5984356 A JPS5984356 A JP S5984356A JP 57193439 A JP57193439 A JP 57193439A JP 19343982 A JP19343982 A JP 19343982A JP S5984356 A JPS5984356 A JP S5984356A
- Authority
- JP
- Japan
- Prior art keywords
- dye
- master
- create
- optical disc
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
め要約のデータは記録されません。
Description
【発明の詳細な説明】
技術分野
本発明は原盤をつくるマスクリング工程において記録層
として色素薄膜を使用する光デイスク原盤の作成方法に
関する。
として色素薄膜を使用する光デイスク原盤の作成方法に
関する。
従来技術
従来、光デイスク原盤は、ガラス基盤上にフォトレジス
トを塗布し、これにアルゴンレーザtたはヘリウムカド
ミウムレーザなどの短波長光のレーザ光を変調して、照
射し、現像り/スすることによって作成されている。こ
の方法は、大きなレーザパワーが必要であることHeC
d、Arレーザの安定性が悪くドロップアウトが生じや
すいこと、現像リンスなどの工程が長く、コストが旨く
なるなどの欠点がある。
トを塗布し、これにアルゴンレーザtたはヘリウムカド
ミウムレーザなどの短波長光のレーザ光を変調して、照
射し、現像り/スすることによって作成されている。こ
の方法は、大きなレーザパワーが必要であることHeC
d、Arレーザの安定性が悪くドロップアウトが生じや
すいこと、現像リンスなどの工程が長く、コストが旨く
なるなどの欠点がある。
また別の方法としてはカルコゲン化合物を基板上に蒸着
しこれをレーザ書き込みして穴をあけ原盤として用いる
ものがある。これは書き込まれた穴の周囲の盛シ上がシ
やピット形状がきれいでないためにS/Nが良くないと
いう欠点がある。
しこれをレーザ書き込みして穴をあけ原盤として用いる
ものがある。これは書き込まれた穴の周囲の盛シ上がシ
やピット形状がきれいでないためにS/Nが良くないと
いう欠点がある。
目 的
本発明は従来技術の上記欠点に鑑みてなされたものであ
って、その目的は小型のHeNθレーザ等を使用し且つ
工程が少い(現像処理が不要)安価な方法でしかもドロ
ップアウトの少い、S/)Jの良好な光デイスク原盤を
作成する方法を提供することにある。
って、その目的は小型のHeNθレーザ等を使用し且つ
工程が少い(現像処理が不要)安価な方法でしかもドロ
ップアウトの少い、S/)Jの良好な光デイスク原盤を
作成する方法を提供することにある。
概要
上記目的を達成するために、本発明は光デイスク原盤の
記録層として色素薄膜を使用する。
記録層として色素薄膜を使用する。
このため、本発明によれば記録層の形成が塗布工程のみ
でできその上書き込みながら読み出しができるのでモニ
ターしながら原盤の記録を行うことができるという従来
技術にない利点が得られる。
でできその上書き込みながら読み出しができるのでモニ
ターしながら原盤の記録を行うことができるという従来
技術にない利点が得られる。
本発明における色素薄膜に適した色素としては、光情報
記録媒体の記録層に一般に用いられている有機色素を任
意に使用できるが、色素薄膜だけでモニター可能な反射
l時性を有する色素が最も望ましくこのような色素とし
てはシアニン系色素をあげることができる。シアニン系
色素の例としてチアシアニン、キノシアニン、インドシ
アニン、オキソシアニン、メロシアニンあるいはこれら
のカルボシアニ/、ジカルボシアニン、トリ力ルポシア
ニンヤ〉の誘導体がある。
記録媒体の記録層に一般に用いられている有機色素を任
意に使用できるが、色素薄膜だけでモニター可能な反射
l時性を有する色素が最も望ましくこのような色素とし
てはシアニン系色素をあげることができる。シアニン系
色素の例としてチアシアニン、キノシアニン、インドシ
アニン、オキソシアニン、メロシアニンあるいはこれら
のカルボシアニ/、ジカルボシアニン、トリ力ルポシア
ニンヤ〉の誘導体がある。
基板としてはガラス、金属、プラスチックなどの一般に
用いられる固体基材を使用できる。基板には熱伝p、1
1.イく2下げたシ、平fR性を向上すZ)ために樹脂
や酸化物などの下引層を形成してもよい。
用いられる固体基材を使用できる。基板には熱伝p、1
1.イく2下げたシ、平fR性を向上すZ)ために樹脂
や酸化物などの下引層を形成してもよい。
本発明における色素薄膜は、有機色素例えばシアニン系
(g素を有機溶媒に溶解した溶液を基板上に塗布するこ
とにj:って形成することができる。有機溶媒としては
例えばメタノール、メチレンジク【1ライド、エチレン
ジクロライド、1.2−ジクロロエタンなどを使用でき
る。塗布はスゾレー、ローラーコーティング、ディッピ
ングおよびスピンニングなどの慣用のコーティング法に
よって行なわれる。
(g素を有機溶媒に溶解した溶液を基板上に塗布するこ
とにj:って形成することができる。有機溶媒としては
例えばメタノール、メチレンジク【1ライド、エチレン
ジクロライド、1.2−ジクロロエタンなどを使用でき
る。塗布はスゾレー、ローラーコーティング、ディッピ
ングおよびスピンニングなどの慣用のコーティング法に
よって行なわれる。
本発明の方法に用いられるし・−ザ)′t、は色素の吸
収波長に応じて選択する必要がある。従って、それぞれ
の色素に応じてN2、He−Cd%Ar、 He−Ne
。
収波長に応じて選択する必要がある。従って、それぞれ
の色素に応じてN2、He−Cd%Ar、 He−Ne
。
ルビー、色素、半導体レーザなどが選択される。
実施例
次に、一実施例をあげて本発明を具体的に説明するがこ
れに限定するものではない。
れに限定するものではない。
色素例えば2,2′−インド−6,7,6,7’−ジベ
ンゾトリカルボシアニン をエチレンジクロライドに溶かし1.25 %の溶液を
調製する。この溶液を光学研磨したガラスディスクに紛
厚約1000Xでスピナーで塗布する。
ンゾトリカルボシアニン をエチレンジクロライドに溶かし1.25 %の溶液を
調製する。この溶液を光学研磨したガラスディスクに紛
厚約1000Xでスピナーで塗布する。
スピナーの回転速度は1000 rpmである。これに
変調されたHeNeレーザ(照射面エネルギー7mW、
ビーム径1.6μm)を照射する。ディスクの線速は2
m/seaである。
変調されたHeNeレーザ(照射面エネルギー7mW、
ビーム径1.6μm)を照射する。ディスクの線速は2
m/seaである。
このように記録された記録体の表面には、レーザ光のエ
ネルギーによって発生]7た分解生成物の破片が堆積し
ている。これを取シ除くためにトルエンでこの記録体表
面を洗浄する。上記の記録物質はトルエンに不溶であシ
、分解生成物はトルエンに可溶であるため、ビットの形
状を全く乱さずに分解生成物が除去される。
ネルギーによって発生]7た分解生成物の破片が堆積し
ている。これを取シ除くためにトルエンでこの記録体表
面を洗浄する。上記の記録物質はトルエンに不溶であシ
、分解生成物はトルエンに可溶であるため、ビットの形
状を全く乱さずに分解生成物が除去される。
この記録体に銀をスパッタリングした後N1電鋳、裏打
を行いマスターとして用いることができる。少量の複製
を作成する場合はこれをそのままマスターとして用いる
のが良いが、さらに大量の複製を作成する場合F;i9
1℃鋳を繰シ返しマスターを複製して大量の複製全作製
すればよい。
を行いマスターとして用いることができる。少量の複製
を作成する場合はこれをそのままマスターとして用いる
のが良いが、さらに大量の複製を作成する場合F;i9
1℃鋳を繰シ返しマスターを複製して大量の複製全作製
すればよい。
また上記の色素はHeNeレーザの与でなく半導体レー
ザでも充分書込可能である。
ザでも充分書込可能である。
効果
上述した本発明の方法によれば、ドロップアウトが少な
く且つS/Nの゛良好な光デイスク原盤を作成できる。
く且つS/Nの゛良好な光デイスク原盤を作成できる。
Claims (1)
- 基板上に色素薄膜を形成し、この色素薄膜に変調された
レーザビームを照射してビットを形成した後洗浄するこ
とを特徴とする、光デイスク原盤の作成方法。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57193439A JPS5984356A (ja) | 1982-11-05 | 1982-11-05 | 光デイスク原盤の作成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57193439A JPS5984356A (ja) | 1982-11-05 | 1982-11-05 | 光デイスク原盤の作成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5984356A true JPS5984356A (ja) | 1984-05-16 |
Family
ID=16308001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57193439A Pending JPS5984356A (ja) | 1982-11-05 | 1982-11-05 | 光デイスク原盤の作成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5984356A (ja) |
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