JPS5997514A - 太陽電池の製造法 - Google Patents

太陽電池の製造法

Info

Publication number
JPS5997514A
JPS5997514A JP57204923A JP20492382A JPS5997514A JP S5997514 A JPS5997514 A JP S5997514A JP 57204923 A JP57204923 A JP 57204923A JP 20492382 A JP20492382 A JP 20492382A JP S5997514 A JPS5997514 A JP S5997514A
Authority
JP
Japan
Prior art keywords
film
type
substrate
amorphous silicon
silicon film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57204923A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0445991B2 (cs
Inventor
Kazunobu Tanaka
田中　一宣
Akihisa Matsuda
彰久 松田
Hajime Ichiyanagi
一柳　肇
Nobuhiko Fujita
藤田　順彦
Hiroshi Kawai
弘 川合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Sumitomo Electric Industries Ltd
Original Assignee
Agency of Industrial Science and Technology
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Sumitomo Electric Industries Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP57204923A priority Critical patent/JPS5997514A/ja
Publication of JPS5997514A publication Critical patent/JPS5997514A/ja
Publication of JPH0445991B2 publication Critical patent/JPH0445991B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/548—Amorphous silicon PV cells

Landscapes

  • Photovoltaic Devices (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP57204923A 1982-11-22 1982-11-22 太陽電池の製造法 Granted JPS5997514A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57204923A JPS5997514A (ja) 1982-11-22 1982-11-22 太陽電池の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57204923A JPS5997514A (ja) 1982-11-22 1982-11-22 太陽電池の製造法

Publications (2)

Publication Number Publication Date
JPS5997514A true JPS5997514A (ja) 1984-06-05
JPH0445991B2 JPH0445991B2 (cs) 1992-07-28

Family

ID=16498601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57204923A Granted JPS5997514A (ja) 1982-11-22 1982-11-22 太陽電池の製造法

Country Status (1)

Country Link
JP (1) JPS5997514A (cs)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6113673A (ja) * 1984-06-25 1986-01-21 エナージー・コンバーシヨン・デバイセス・インコーポレーテツド 光起電力デバイス
JPH0195770U (cs) * 1987-12-17 1989-06-26
JPH02122575A (ja) * 1988-10-31 1990-05-10 Kyocera Corp 光電変換装置
US7534628B2 (en) 2006-10-12 2009-05-19 Canon Kabushiki Kaisha Method for forming semiconductor device and method for forming photovoltaic device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56130466A (en) * 1980-03-17 1981-10-13 Canon Inc Film forming method
JPS56130465A (en) * 1980-03-14 1981-10-13 Canon Inc Film forming method
JPS5855328U (ja) * 1981-10-09 1983-04-14 三洋電機株式会社 切換装置
JPS58144470A (ja) * 1981-12-16 1983-08-27 エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド 光応答性無定形合金の化学相沈着製造方法
JPS5913617A (ja) * 1982-07-16 1984-01-24 Agency Of Ind Science & Technol 微結晶シリコンを含むシリコン薄膜の製造法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56130465A (en) * 1980-03-14 1981-10-13 Canon Inc Film forming method
JPS56130466A (en) * 1980-03-17 1981-10-13 Canon Inc Film forming method
JPS5855328U (ja) * 1981-10-09 1983-04-14 三洋電機株式会社 切換装置
JPS58144470A (ja) * 1981-12-16 1983-08-27 エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド 光応答性無定形合金の化学相沈着製造方法
JPS5913617A (ja) * 1982-07-16 1984-01-24 Agency Of Ind Science & Technol 微結晶シリコンを含むシリコン薄膜の製造法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6113673A (ja) * 1984-06-25 1986-01-21 エナージー・コンバーシヨン・デバイセス・インコーポレーテツド 光起電力デバイス
JPH0195770U (cs) * 1987-12-17 1989-06-26
JPH02122575A (ja) * 1988-10-31 1990-05-10 Kyocera Corp 光電変換装置
US7534628B2 (en) 2006-10-12 2009-05-19 Canon Kabushiki Kaisha Method for forming semiconductor device and method for forming photovoltaic device

Also Published As

Publication number Publication date
JPH0445991B2 (cs) 1992-07-28

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