JPS60131973A - 有機金属の気化方法 - Google Patents

有機金属の気化方法

Info

Publication number
JPS60131973A
JPS60131973A JP58239238A JP23923883A JPS60131973A JP S60131973 A JPS60131973 A JP S60131973A JP 58239238 A JP58239238 A JP 58239238A JP 23923883 A JP23923883 A JP 23923883A JP S60131973 A JPS60131973 A JP S60131973A
Authority
JP
Japan
Prior art keywords
gas
guide
holes
organic metal
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58239238A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0379436B2 (de
Inventor
Mototsugu Ogura
基次 小倉
Nobuyasu Hase
長谷　亘康
Yuzaburo Ban
雄三郎 伴
Motoji Morizaki
森崎　元司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58239238A priority Critical patent/JPS60131973A/ja
Publication of JPS60131973A publication Critical patent/JPS60131973A/ja
Publication of JPH0379436B2 publication Critical patent/JPH0379436B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B01J4/002—Nozzle-type elements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP58239238A 1983-12-19 1983-12-19 有機金属の気化方法 Granted JPS60131973A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58239238A JPS60131973A (ja) 1983-12-19 1983-12-19 有機金属の気化方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58239238A JPS60131973A (ja) 1983-12-19 1983-12-19 有機金属の気化方法

Publications (2)

Publication Number Publication Date
JPS60131973A true JPS60131973A (ja) 1985-07-13
JPH0379436B2 JPH0379436B2 (de) 1991-12-18

Family

ID=17041794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58239238A Granted JPS60131973A (ja) 1983-12-19 1983-12-19 有機金属の気化方法

Country Status (1)

Country Link
JP (1) JPS60131973A (de)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283400A (ja) * 1985-10-02 1987-04-16 Toyo Sutoufuaa Chem:Kk 有機金属気相成長用シリンダ−の改良法
US5476547A (en) * 1989-09-26 1995-12-19 Canon Kabushiki Kaisha Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation
WO2001042539A1 (en) * 1999-12-11 2001-06-14 Epichem Limited Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites
EP1329540A3 (de) * 2000-07-03 2003-11-05 Epichem Limited Vorrichtung zur Zuführung von Gas-Vorläufern zu mehreren Epitaxiereaktoren
WO2007121202A1 (en) * 2006-04-11 2007-10-25 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
JP2015007286A (ja) * 2009-03-11 2015-01-15 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード 安定した先駆物質供給のための泡供給システム
US9297071B2 (en) 2009-11-02 2016-03-29 Sigma-Aldrich Co. Llc Solid precursor delivery assemblies and related methods

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5519146U (de) * 1978-07-21 1980-02-06

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5519146U (de) * 1978-07-21 1980-02-06

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283400A (ja) * 1985-10-02 1987-04-16 Toyo Sutoufuaa Chem:Kk 有機金属気相成長用シリンダ−の改良法
US5476547A (en) * 1989-09-26 1995-12-19 Canon Kabushiki Kaisha Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation
WO2001042539A1 (en) * 1999-12-11 2001-06-14 Epichem Limited Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites
US6698728B1 (en) 1999-12-11 2004-03-02 Epichem Limited Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites
EP1329540A3 (de) * 2000-07-03 2003-11-05 Epichem Limited Vorrichtung zur Zuführung von Gas-Vorläufern zu mehreren Epitaxiereaktoren
WO2007121202A1 (en) * 2006-04-11 2007-10-25 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
JP2009533556A (ja) * 2006-04-11 2009-09-17 アプライド マテリアルズ インコーポレイテッド 化学気相堆積のための装置及び方法
US7967911B2 (en) 2006-04-11 2011-06-28 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
US8313804B2 (en) 2006-04-11 2012-11-20 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
JP2013040410A (ja) * 2006-04-11 2013-02-28 Applied Materials Inc 化学気相堆積のための装置及び方法
JP2015007286A (ja) * 2009-03-11 2015-01-15 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード 安定した先駆物質供給のための泡供給システム
US9297071B2 (en) 2009-11-02 2016-03-29 Sigma-Aldrich Co. Llc Solid precursor delivery assemblies and related methods

Also Published As

Publication number Publication date
JPH0379436B2 (de) 1991-12-18

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