JPS6049334A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS6049334A
JPS6049334A JP15745483A JP15745483A JPS6049334A JP S6049334 A JPS6049334 A JP S6049334A JP 15745483 A JP15745483 A JP 15745483A JP 15745483 A JP15745483 A JP 15745483A JP S6049334 A JPS6049334 A JP S6049334A
Authority
JP
Japan
Prior art keywords
photosensitive
polymer
aromatic halonium
molecular structure
microfabrication
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15745483A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0332779B2 (mo
Inventor
Shoji Watanabe
渡辺　庄司
Shohei Kosakai
正平 小堺
Masao Kato
加藤　政雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP15745483A priority Critical patent/JPS6049334A/ja
Publication of JPS6049334A publication Critical patent/JPS6049334A/ja
Publication of JPH0332779B2 publication Critical patent/JPH0332779B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP15745483A 1983-08-29 1983-08-29 感光性組成物 Granted JPS6049334A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15745483A JPS6049334A (ja) 1983-08-29 1983-08-29 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15745483A JPS6049334A (ja) 1983-08-29 1983-08-29 感光性組成物

Publications (2)

Publication Number Publication Date
JPS6049334A true JPS6049334A (ja) 1985-03-18
JPH0332779B2 JPH0332779B2 (mo) 1991-05-14

Family

ID=15650007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15745483A Granted JPS6049334A (ja) 1983-08-29 1983-08-29 感光性組成物

Country Status (1)

Country Link
JP (1) JPS6049334A (mo)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04330445A (ja) * 1991-02-08 1992-11-18 Fuji Photo Film Co Ltd 光重合性組成物
JPH075687A (ja) * 1993-06-18 1995-01-10 Mitsui Toatsu Chem Inc 液状エッチングレジスト及びエッチングレジスト被膜を形成した銅張り積層板

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04330445A (ja) * 1991-02-08 1992-11-18 Fuji Photo Film Co Ltd 光重合性組成物
JPH075687A (ja) * 1993-06-18 1995-01-10 Mitsui Toatsu Chem Inc 液状エッチングレジスト及びエッチングレジスト被膜を形成した銅張り積層板

Also Published As

Publication number Publication date
JPH0332779B2 (mo) 1991-05-14

Similar Documents

Publication Publication Date Title
JP3414197B2 (ja) フォトレジスト組成物
JPH05249683A (ja) 感放射線性組成物
JP2001226430A (ja) 再溶解性酸架橋型高分子及び該高分子と光酸発生剤とを組み合わせた感光性樹脂組成物
JP2002072489A (ja) 反射防止組成物
JP2759079B2 (ja) 高エネルギー照射線硬化可能な組成物及び高エネルギー照射線記録法
JP3228193B2 (ja) ネガ型フォトレジスト組成物及びそれを用いたパターン形成方法
Crivello Possibilities for photoimaging using onium salts
JP2812927B2 (ja) アセタール基を含有するアルコキシ−スチレン重合体とその製造方法及びアルコキシ−スチレン重合体を主要成分とする化学増幅型フォトレジスト材料
US5776657A (en) Wet-chemical developable, etch-stable photoresist for UV radiation with a wavelength below 200 NM
JPH0262544A (ja) フォトレジスト組成物
JP3022412B2 (ja) ネガ型フォトレジスト材料、およびそれを用いたパターン形成方法
CN1828414B (zh) 用于形成抗反射涂层的聚合物
JPH03282550A (ja) フォトレジスト組成物
CA2066086A1 (en) Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
JPS6071657A (ja) 感光性樹脂組成物
JPS61167941A (ja) 高感度ポリアミドエステルホトレジスト組成物
JPH03192260A (ja) マレイミド含有陰画処理型深ｕｖフォトレジスト
JP2825543B2 (ja) ネガ型放射線感応性樹脂組成物
Xu et al. Novel polymeric nonionic photoacid generators and corresponding polymer Langmuir–Blodgett (LB) films for photopatterning
CN1827659B (zh) 用于形成抗反射涂层的聚合物
CN1828415B (zh) 用于形成抗反射涂层的聚合物
JPH0332779B2 (mo)
JP2004176035A (ja) ラジカル発生剤及び感光性樹脂組成物
WO2002014953A1 (fr) Composition de resine sensible aux rayons d'energie actinique, et procede de formation d'un modele de polymere a partir de ladite composition de resine
JP3200824B2 (ja) 感放射線性組成物