JPS6057632A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6057632A
JPS6057632A JP58165557A JP16555783A JPS6057632A JP S6057632 A JPS6057632 A JP S6057632A JP 58165557 A JP58165557 A JP 58165557A JP 16555783 A JP16555783 A JP 16555783A JP S6057632 A JPS6057632 A JP S6057632A
Authority
JP
Japan
Prior art keywords
film
photoresist film
photosensitized
photo
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58165557A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0410738B2 (2
Inventor
Masahiro Ihara
井原　正弘
Hideaki Nagura
名倉　英明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP58165557A priority Critical patent/JPS6057632A/ja
Publication of JPS6057632A publication Critical patent/JPS6057632A/ja
Publication of JPH0410738B2 publication Critical patent/JPH0410738B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Weting (AREA)
JP58165557A 1983-09-08 1983-09-08 半導体装置の製造方法 Granted JPS6057632A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58165557A JPS6057632A (ja) 1983-09-08 1983-09-08 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58165557A JPS6057632A (ja) 1983-09-08 1983-09-08 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6057632A true JPS6057632A (ja) 1985-04-03
JPH0410738B2 JPH0410738B2 (2) 1992-02-26

Family

ID=15814621

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58165557A Granted JPS6057632A (ja) 1983-09-08 1983-09-08 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6057632A (2)

Also Published As

Publication number Publication date
JPH0410738B2 (2) 1992-02-26

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