JPS6063372A - 高硬度窒化ホウ素薄膜の製造方法 - Google Patents

高硬度窒化ホウ素薄膜の製造方法

Info

Publication number
JPS6063372A
JPS6063372A JP58171217A JP17121783A JPS6063372A JP S6063372 A JPS6063372 A JP S6063372A JP 58171217 A JP58171217 A JP 58171217A JP 17121783 A JP17121783 A JP 17121783A JP S6063372 A JPS6063372 A JP S6063372A
Authority
JP
Japan
Prior art keywords
boron
substrate
ions
ion
boron nitride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58171217A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0351787B2 (th
Inventor
Mamoru Sato
守 佐藤
Takeshi Sadahiro
貞廣　孟史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Tungaloy Corp
Original Assignee
Agency of Industrial Science and Technology
Toshiba Tungaloy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toshiba Tungaloy Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP58171217A priority Critical patent/JPS6063372A/ja
Publication of JPS6063372A publication Critical patent/JPS6063372A/ja
Publication of JPH0351787B2 publication Critical patent/JPH0351787B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP58171217A 1983-09-19 1983-09-19 高硬度窒化ホウ素薄膜の製造方法 Granted JPS6063372A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58171217A JPS6063372A (ja) 1983-09-19 1983-09-19 高硬度窒化ホウ素薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58171217A JPS6063372A (ja) 1983-09-19 1983-09-19 高硬度窒化ホウ素薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS6063372A true JPS6063372A (ja) 1985-04-11
JPH0351787B2 JPH0351787B2 (th) 1991-08-07

Family

ID=15919206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58171217A Granted JPS6063372A (ja) 1983-09-19 1983-09-19 高硬度窒化ホウ素薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS6063372A (th)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60152677A (ja) * 1984-01-20 1985-08-10 Sumitomo Electric Ind Ltd 立方晶窒化硼素被覆硬質体の製造方法
JPS61157674A (ja) * 1984-12-29 1986-07-17 Agency Of Ind Science & Technol 高硬度窒化ホウ素膜の製造方法
JPS6293366A (ja) * 1985-10-18 1987-04-28 Nissin Electric Co Ltd 窒化ホウ素膜の作製方法
JPS62164869A (ja) * 1986-01-16 1987-07-21 Nissin Electric Co Ltd 高硬度被覆材料とその製造方法
JPS6318050A (ja) * 1986-07-11 1988-01-25 Mitsubishi Heavy Ind Ltd Ｃｂｎ被覆法
JPS63134662A (ja) * 1986-11-22 1988-06-07 Sumitomo Electric Ind Ltd 高硬度窒化硼素の合成法
JPH01225767A (ja) * 1988-03-07 1989-09-08 Nissin Electric Co Ltd 窒化ケイ素膜の製造方法
JPH02155531A (ja) * 1988-12-07 1990-06-14 Agency Of Ind Science & Technol 鍛造用金型及びその製法
JPH02159362A (ja) * 1988-12-13 1990-06-19 Mitsubishi Heavy Ind Ltd 薄膜製造方法および装置
JPH02259059A (ja) * 1989-03-31 1990-10-19 Mitsubishi Heavy Ind Ltd 窒化ホウ素の形成方法
JPH04124258A (ja) * 1990-09-12 1992-04-24 Nissin Electric Co Ltd 窒化ホウ素薄膜の形成方法
JPH04124259A (ja) * 1990-09-12 1992-04-24 Nissin Electric Co Ltd 窒化ホウ素薄膜の形成方法
EP0429993B1 (en) * 1989-11-17 1995-08-02 Nissin Electric Company, Limited Method of forming thin film containing boron nitride, magnetic head and method of preparing said magnetic head

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5282699A (en) * 1975-12-29 1977-07-11 Youichi Murayama Hard boronnitride c0ating

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5282699A (en) * 1975-12-29 1977-07-11 Youichi Murayama Hard boronnitride c0ating

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60152677A (ja) * 1984-01-20 1985-08-10 Sumitomo Electric Ind Ltd 立方晶窒化硼素被覆硬質体の製造方法
JPS61157674A (ja) * 1984-12-29 1986-07-17 Agency Of Ind Science & Technol 高硬度窒化ホウ素膜の製造方法
JPS6293366A (ja) * 1985-10-18 1987-04-28 Nissin Electric Co Ltd 窒化ホウ素膜の作製方法
JPS62164869A (ja) * 1986-01-16 1987-07-21 Nissin Electric Co Ltd 高硬度被覆材料とその製造方法
JPS6318050A (ja) * 1986-07-11 1988-01-25 Mitsubishi Heavy Ind Ltd Ｃｂｎ被覆法
JPS63134662A (ja) * 1986-11-22 1988-06-07 Sumitomo Electric Ind Ltd 高硬度窒化硼素の合成法
JPH01225767A (ja) * 1988-03-07 1989-09-08 Nissin Electric Co Ltd 窒化ケイ素膜の製造方法
JPH02155531A (ja) * 1988-12-07 1990-06-14 Agency Of Ind Science & Technol 鍛造用金型及びその製法
JPH02159362A (ja) * 1988-12-13 1990-06-19 Mitsubishi Heavy Ind Ltd 薄膜製造方法および装置
JPH02259059A (ja) * 1989-03-31 1990-10-19 Mitsubishi Heavy Ind Ltd 窒化ホウ素の形成方法
EP0429993B1 (en) * 1989-11-17 1995-08-02 Nissin Electric Company, Limited Method of forming thin film containing boron nitride, magnetic head and method of preparing said magnetic head
JPH04124258A (ja) * 1990-09-12 1992-04-24 Nissin Electric Co Ltd 窒化ホウ素薄膜の形成方法
JPH04124259A (ja) * 1990-09-12 1992-04-24 Nissin Electric Co Ltd 窒化ホウ素薄膜の形成方法

Also Published As

Publication number Publication date
JPH0351787B2 (th) 1991-08-07

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