JPS61236552A - マスク処理法 - Google Patents

マスク処理法

Info

Publication number
JPS61236552A
JPS61236552A JP61051604A JP5160486A JPS61236552A JP S61236552 A JPS61236552 A JP S61236552A JP 61051604 A JP61051604 A JP 61051604A JP 5160486 A JP5160486 A JP 5160486A JP S61236552 A JPS61236552 A JP S61236552A
Authority
JP
Japan
Prior art keywords
resist
resist layer
layer
exposure
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61051604A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0154691B2 (it
Inventor
ポール・ウオルター・クリンコ
クリストフアー・フランシス・リオンズ
ウエイン・エム・マロー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS61236552A publication Critical patent/JPS61236552A/ja
Publication of JPH0154691B2 publication Critical patent/JPH0154691B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61051604A 1985-04-10 1986-03-11 マスク処理法 Granted JPS61236552A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US72162985A 1985-04-10 1985-04-10
US721629 1985-04-10
US791867 1991-11-13

Publications (2)

Publication Number Publication Date
JPS61236552A true JPS61236552A (ja) 1986-10-21
JPH0154691B2 JPH0154691B2 (it) 1989-11-20

Family

ID=24898682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61051604A Granted JPS61236552A (ja) 1985-04-10 1986-03-11 マスク処理法

Country Status (1)

Country Link
JP (1) JPS61236552A (it)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01185545A (ja) * 1988-01-18 1989-07-25 Matsushita Electron Corp レジストパターンの形成方法
JPH02183255A (ja) * 1989-01-10 1990-07-17 Oki Electric Ind Co Ltd パターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01185545A (ja) * 1988-01-18 1989-07-25 Matsushita Electron Corp レジストパターンの形成方法
JPH02183255A (ja) * 1989-01-10 1990-07-17 Oki Electric Ind Co Ltd パターン形成方法

Also Published As

Publication number Publication date
JPH0154691B2 (it) 1989-11-20

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