JPS6141076B2 - - Google Patents
Info
- Publication number
- JPS6141076B2 JPS6141076B2 JP3444179A JP3444179A JPS6141076B2 JP S6141076 B2 JPS6141076 B2 JP S6141076B2 JP 3444179 A JP3444179 A JP 3444179A JP 3444179 A JP3444179 A JP 3444179A JP S6141076 B2 JPS6141076 B2 JP S6141076B2
- Authority
- JP
- Japan
- Prior art keywords
- transistor
- voltage
- field effect
- memory
- effect transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000015654 memory Effects 0.000 claims description 54
- 230000005669 field effect Effects 0.000 claims description 12
- 238000003860 storage Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 230000006870 function Effects 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 239000012212 insulator Substances 0.000 claims 4
- 239000007772 electrode material Substances 0.000 claims 2
- 230000003071 parasitic effect Effects 0.000 description 12
- 239000000872 buffer Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000002784 hot electron Substances 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0466—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3444179A JPS55129995A (en) | 1979-03-26 | 1979-03-26 | Insulating gate field effect transistor memory |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3444179A JPS55129995A (en) | 1979-03-26 | 1979-03-26 | Insulating gate field effect transistor memory |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62177006A Division JPS6323298A (ja) | 1987-07-17 | 1987-07-17 | 絶縁ゲ−ト電界効果トランジスタ・メモリ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55129995A JPS55129995A (en) | 1980-10-08 |
| JPS6141076B2 true JPS6141076B2 (de) | 1986-09-12 |
Family
ID=12414312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3444179A Granted JPS55129995A (en) | 1979-03-26 | 1979-03-26 | Insulating gate field effect transistor memory |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55129995A (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58165800U (ja) * | 1982-04-28 | 1983-11-04 | 日本電気株式会社 | Eprom書込み回路 |
-
1979
- 1979-03-26 JP JP3444179A patent/JPS55129995A/ja active Granted
Non-Patent Citations (1)
| Title |
|---|
| THE TRANSACTIONS OF IECE OF JAPAN=1979 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55129995A (en) | 1980-10-08 |
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