JPS62128529A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS62128529A
JPS62128529A JP60269138A JP26913885A JPS62128529A JP S62128529 A JPS62128529 A JP S62128529A JP 60269138 A JP60269138 A JP 60269138A JP 26913885 A JP26913885 A JP 26913885A JP S62128529 A JPS62128529 A JP S62128529A
Authority
JP
Japan
Prior art keywords
etching
nozzle
solution
etching solution
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60269138A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0416012B2 (2
Inventor
Shigeru Hayashi
茂 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP60269138A priority Critical patent/JPS62128529A/ja
Publication of JPS62128529A publication Critical patent/JPS62128529A/ja
Publication of JPH0416012B2 publication Critical patent/JPH0416012B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP60269138A 1985-11-29 1985-11-29 パタ−ン形成方法 Granted JPS62128529A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60269138A JPS62128529A (ja) 1985-11-29 1985-11-29 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60269138A JPS62128529A (ja) 1985-11-29 1985-11-29 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS62128529A true JPS62128529A (ja) 1987-06-10
JPH0416012B2 JPH0416012B2 (2) 1992-03-19

Family

ID=17468217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60269138A Granted JPS62128529A (ja) 1985-11-29 1985-11-29 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS62128529A (2)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04310705A (ja) * 1991-04-10 1992-11-02 Masao Moriyama プラスチックペレットの製造装置
JP2001209166A (ja) * 2000-01-26 2001-08-03 Dainippon Printing Co Ltd フォトマスク製造用スピン処理装置
JP2018205355A (ja) * 2017-05-30 2018-12-27 株式会社エスケーエレクトロニクス フォトマスクのウェットエッチング方法及びウェットエッチング装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04310705A (ja) * 1991-04-10 1992-11-02 Masao Moriyama プラスチックペレットの製造装置
JP2001209166A (ja) * 2000-01-26 2001-08-03 Dainippon Printing Co Ltd フォトマスク製造用スピン処理装置
JP2018205355A (ja) * 2017-05-30 2018-12-27 株式会社エスケーエレクトロニクス フォトマスクのウェットエッチング方法及びウェットエッチング装置

Also Published As

Publication number Publication date
JPH0416012B2 (2) 1992-03-19

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