JPS635338A - 感光性写真要素 - Google Patents
感光性写真要素Info
- Publication number
- JPS635338A JPS635338A JP15103787A JP15103787A JPS635338A JP S635338 A JPS635338 A JP S635338A JP 15103787 A JP15103787 A JP 15103787A JP 15103787 A JP15103787 A JP 15103787A JP S635338 A JPS635338 A JP S635338A
- Authority
- JP
- Japan
- Prior art keywords
- particles
- photographic element
- coating
- oxide particles
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims description 67
- 239000000839 emulsion Substances 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 32
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 21
- 239000011230 binding agent Substances 0.000 claims description 12
- 229910052809 inorganic oxide Inorganic materials 0.000 claims description 10
- 229920000728 polyester Polymers 0.000 claims description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000010954 inorganic particle Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
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- 239000000047 product Substances 0.000 description 3
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- 229910001928 zirconium oxide Inorganic materials 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
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- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
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- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
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- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
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- 238000010438 heat treatment Methods 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
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- 238000004519 manufacturing process Methods 0.000 description 2
- 239000006224 matting agent Substances 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
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- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
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- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical compound SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- YZEUHQHUFTYLPH-UHFFFAOYSA-N 2-nitroimidazole Chemical compound [O-][N+](=O)C1=NC=CN1 YZEUHQHUFTYLPH-UHFFFAOYSA-N 0.000 description 1
- NYYSPVRERVXMLJ-UHFFFAOYSA-N 4,4-difluorocyclohexan-1-one Chemical compound FC1(F)CCC(=O)CC1 NYYSPVRERVXMLJ-UHFFFAOYSA-N 0.000 description 1
- LLLVZDVNHNWSDS-UHFFFAOYSA-N 4-methylidene-3,5-dioxabicyclo[5.2.2]undeca-1(9),7,10-triene-2,6-dione Chemical compound C1(C2=CC=C(C(=O)OC(=C)O1)C=C2)=O LLLVZDVNHNWSDS-UHFFFAOYSA-N 0.000 description 1
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- 230000003287 optical effect Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 239000011122 softwood Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- PGWMQVQLSMAHHO-UHFFFAOYSA-N sulfanylidenesilver Chemical compound [Ag]=S PGWMQVQLSMAHHO-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical compound SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000012463 white pigment Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Laminated Bodies (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87722186A | 1986-06-18 | 1986-06-18 | |
| US877221 | 1986-06-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS635338A true JPS635338A (ja) | 1988-01-11 |
Family
ID=25369501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15103787A Pending JPS635338A (ja) | 1986-06-18 | 1987-06-17 | 感光性写真要素 |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP0250154A3 (de) |
| JP (1) | JPS635338A (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6449040A (en) * | 1987-07-30 | 1989-02-23 | Minnesota Mining & Mfg | Radiation photosensitive photographic element |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5221555A (en) * | 1991-12-12 | 1993-06-22 | Felix Schoeller, Jr. Gmbh & Co. Kg | Reverse side coating of photographic support materials |
| DE4101475A1 (de) * | 1991-01-19 | 1992-07-23 | Schoeller F Jun Gmbh Co Kg | Beschichtungsmasse fuer die rueckseite fotografischer traegermaterialien und verfahren zu ihrer herstellung |
| US5906679A (en) * | 1994-06-06 | 1999-05-25 | Nissan Chemical Industries, Ltd. | Coating compositions employing zinc antimonate anhydride particles |
| EP0741668B1 (de) * | 1994-10-31 | 2000-09-20 | Kodak-Pathe | Polymere, leitende alumo-silikat-zusammensetzung, element diese zusammensetzung enthaltend und verfahren zu seiner herstellung |
| US5484694A (en) | 1994-11-21 | 1996-01-16 | Eastman Kodak Company | Imaging element comprising an electrically-conductive layer containing antimony-doped tin oxide particles |
| US5529884A (en) | 1994-12-09 | 1996-06-25 | Eastman Kodak Company | Backing layer for laser ablative imaging |
| US5771764A (en) * | 1995-11-13 | 1998-06-30 | Eastman Kodak Company | Use of cutting tools for photographic manufacturing operations |
| US5576162A (en) | 1996-01-18 | 1996-11-19 | Eastman Kodak Company | Imaging element having an electrically-conductive layer |
| US5674654A (en) * | 1996-09-19 | 1997-10-07 | Eastman Kodak Company | Imaging element containing an electrically-conductive polymer blend |
| FR2767128B1 (fr) | 1997-08-08 | 1999-09-10 | Eastman Kodak Co | Nouveau polymere inorganique a base d'aluminium et de silicium |
| US5981126A (en) * | 1997-09-29 | 1999-11-09 | Eastman Kodak Company | Clay containing electrically-conductive layer for imaging elements |
| US5866287A (en) * | 1997-11-13 | 1999-02-02 | Eastman Kodak Company | Imaging element comprising and electrically-conductive layer containing metal antimonate and non-conductive metal-containing colloidal particles |
| US5827630A (en) * | 1997-11-13 | 1998-10-27 | Eastman Kodak Company | Imaging element comprising an electrically-conductive layer containing metal antimonate and non-conductive metal-containing colloidal particles and a transparent magnetic recording layer |
| US5976776A (en) * | 1997-12-01 | 1999-11-02 | Eastman Kodak Company | Antistatic compositions for imaging elements |
| US5869227A (en) * | 1997-12-18 | 1999-02-09 | Eastman Kodak Company | Antistatic layer with smectite clay and an interpolymer containing vinylidene halide |
| US6124083A (en) * | 1998-10-15 | 2000-09-26 | Eastman Kodak Company | Antistatic layer with electrically conducting polymer for imaging element |
| US6190846B1 (en) | 1998-10-15 | 2001-02-20 | Eastman Kodak Company | Abrasion resistant antistatic with electrically conducting polymer for imaging element |
| US6168911B1 (en) | 1998-12-18 | 2001-01-02 | Eastman Kodak Company | Formulations for preparing metal oxide-based pigment-binder transparent electrically conductive layers |
| US6025119A (en) * | 1998-12-18 | 2000-02-15 | Eastman Kodak Company | Antistatic layer for imaging element |
| US6077655A (en) * | 1999-03-25 | 2000-06-20 | Eastman Kodak Company | Antistatic layer for imaging element containing electrically conductive polymer and modified gelatin |
| KR101211293B1 (ko) * | 2005-12-29 | 2012-12-11 | 엘지디스플레이 주식회사 | 전계를 이용한 미세패턴이 형성된 인쇄판의 제조방법 |
| CN111356594A (zh) * | 2017-11-17 | 2020-06-30 | 3M创新有限公司 | 用于耐用标签的吸墨层 |
| CN112334552A (zh) | 2018-06-29 | 2021-02-05 | 3M创新有限公司 | 用于耐用标签的吸墨层 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US873009A (en) * | 1907-04-08 | 1907-12-10 | Frederic Baxter | Belt-fastener. |
| US3169865A (en) * | 1960-07-29 | 1965-02-16 | Eastman Kodak Co | Zirconia subbed photographic paper |
| GB1371095A (en) * | 1970-06-09 | 1974-10-23 | Agfa Gevaert | Surface treatment of polyester material |
| US3864132A (en) * | 1972-05-22 | 1975-02-04 | Eastman Kodak Co | Article having a hydrophilic colloid layer adhesively bonded to a hydrophobic polymer support |
| JPS56143430A (en) * | 1980-04-11 | 1981-11-09 | Fuji Photo Film Co Ltd | Photographic sensitive material with improved antistatic property |
| JPS57118242A (en) * | 1981-01-14 | 1982-07-23 | Fuji Photo Film Co Ltd | Photographic sensitive material |
-
1987
- 1987-06-10 EP EP87305132A patent/EP0250154A3/de not_active Withdrawn
- 1987-06-17 JP JP15103787A patent/JPS635338A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6449040A (en) * | 1987-07-30 | 1989-02-23 | Minnesota Mining & Mfg | Radiation photosensitive photographic element |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0250154A2 (de) | 1987-12-23 |
| EP0250154A3 (de) | 1989-07-12 |
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