JPS6361122U - - Google Patents
Info
- Publication number
- JPS6361122U JPS6361122U JP15588186U JP15588186U JPS6361122U JP S6361122 U JPS6361122 U JP S6361122U JP 15588186 U JP15588186 U JP 15588186U JP 15588186 U JP15588186 U JP 15588186U JP S6361122 U JPS6361122 U JP S6361122U
- Authority
- JP
- Japan
- Prior art keywords
- diffusion furnace
- semiconductor manufacturing
- inert gas
- cover
- loading mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 claims description 8
- 239000011261 inert gas Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Description
第１図は本考案の一実施例を示す図であり第２
図は従来の半導体製造用拡散炉システムを示す図
である。
図において、６はボートパドル、７はウエハ、
１０は拡散炉、１１はカバー、１２は不活性ガス
供給手段である。
FIG. 1 is a diagram showing an embodiment of the present invention, and FIG.
The figure shows a conventional diffusion furnace system for semiconductor manufacturing. In the figure, 6 is a boat paddle, 7 is a wafer,
10 is a diffusion furnace, 11 is a cover, and 12 is an inert gas supply means.
Claims (1)
ローデイング機構により拡散炉内に入れ、拡散炉
内でこのウエハの酸化または拡散を行なう半導体
製造用拡散炉システムにおいて、 前記拡散炉の入口と前記ボートローデイング機
構とを覆うカバーと、 前記カバー内に不活性ガスを供給する不活性ガ
ス供給手段と、 を備えたことを特徴とする半導体製造用拡散炉シ
ステム。 (2) 前記不活性ガスがＮ２ガスである実用新案
登録請求の範囲第１項記載の半導体製造用拡散炉
システム。[Scope of Claim for Utility Model Registration] (1) In a diffusion furnace system for semiconductor manufacturing in which a wafer placed on a boat paddle is loaded into a diffusion furnace by a boat loading mechanism, and the wafer is oxidized or diffused in the diffusion furnace, A diffusion furnace system for semiconductor manufacturing, comprising: a cover that covers an inlet of the diffusion furnace and the boat loading mechanism; and an inert gas supply means that supplies inert gas into the cover. (2) The diffusion furnace system for semiconductor manufacturing according to claim 1, wherein the inert gas is N2 gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15588186U JPS6361122U (en) | 1986-10-09 | 1986-10-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15588186U JPS6361122U (en) | 1986-10-09 | 1986-10-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6361122U true JPS6361122U (en) | 1988-04-22 |
Family
ID=31076983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15588186U Pending JPS6361122U (en) | 1986-10-09 | 1986-10-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6361122U (en) |
-
1986
- 1986-10-09 JP JP15588186U patent/JPS6361122U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6361122U (en) | ||
| JPS58160857U (en) | belt winding device | |
| JPH02146425U (en) | ||
| JPS6343424U (en) | ||
| JPS6468921A (en) | Heat treatment of semiconductor wafer | |
| JPH0363937U (en) | ||
| JPS59169040U (en) | Diffusion furnace for semiconductor manufacturing | |
| JPS6447036U (en) | ||
| JPS5981029U (en) | hearth tube | |
| JPS62179239U (en) | ||
| JPS6351445U (en) | ||
| JPS6186924U (en) | ||
| JPH01137526U (en) | ||
| JPS6294637U (en) | ||
| JPS58138334U (en) | Wafer automatic material feeding mechanism | |
| JPS61173140U (en) | ||
| JPS6132077U (en) | Tray for transporting semiconductor wafers | |
| JPS61140655U (en) | ||
| JPS642442U (en) | ||
| JPS62203272U (en) | ||
| JPS6150091U (en) | ||
| JPH0252433U (en) | ||
| JPS57102436A (en) | Conveyance of rod-shaped body in loaded state | |
| JPS631324U (en) | ||
| JPS6441130U (en) |