JPS6443370A - Spin coating device and spin coating method - Google Patents
Spin coating device and spin coating methodInfo
- Publication number
- JPS6443370A JPS6443370A JP62196822A JP19682287A JPS6443370A JP S6443370 A JPS6443370 A JP S6443370A JP 62196822 A JP62196822 A JP 62196822A JP 19682287 A JP19682287 A JP 19682287A JP S6443370 A JPS6443370 A JP S6443370A
- Authority
- JP
- Japan
- Prior art keywords
- coated
- materials
- spin coating
- mounts
- recessed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62196822A JPS6443370A (en) | 1987-08-05 | 1987-08-05 | Spin coating device and spin coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62196822A JPS6443370A (en) | 1987-08-05 | 1987-08-05 | Spin coating device and spin coating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6443370A true JPS6443370A (en) | 1989-02-15 |
Family
ID=16364240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62196822A Pending JPS6443370A (en) | 1987-08-05 | 1987-08-05 | Spin coating device and spin coating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6443370A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007069313A1 (ja) * | 2005-12-14 | 2007-06-21 | Fujitsu Limited | レジスト塗布方法 |
| JP2007201048A (ja) * | 2006-01-25 | 2007-08-09 | Seiko Epson Corp | 半導体基板処理装置及び半導体装置の製造方法 |
| CN108212688A (zh) * | 2018-03-22 | 2018-06-29 | 王磊 | 一种表面涂覆液体装置 |
-
1987
- 1987-08-05 JP JP62196822A patent/JPS6443370A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007069313A1 (ja) * | 2005-12-14 | 2007-06-21 | Fujitsu Limited | レジスト塗布方法 |
| JP2007201048A (ja) * | 2006-01-25 | 2007-08-09 | Seiko Epson Corp | 半導体基板処理装置及び半導体装置の製造方法 |
| CN108212688A (zh) * | 2018-03-22 | 2018-06-29 | 王磊 | 一种表面涂覆液体装置 |
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