JPS644664B2 - - Google Patents

Info

Publication number
JPS644664B2
JPS644664B2 JP56134925A JP13492581A JPS644664B2 JP S644664 B2 JPS644664 B2 JP S644664B2 JP 56134925 A JP56134925 A JP 56134925A JP 13492581 A JP13492581 A JP 13492581A JP S644664 B2 JPS644664 B2 JP S644664B2
Authority
JP
Japan
Prior art keywords
semiconductor substrate
insulating
layer
semiconductor device
layered body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56134925A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5835925A (ja
Inventor
Tadahiro Nagayama
Akira Tomono
Kazuo Hagimura
Norio Totsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Oki Electric Industry Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56134925A priority Critical patent/JPS5835925A/ja
Publication of JPS5835925A publication Critical patent/JPS5835925A/ja
Publication of JPS644664B2 publication Critical patent/JPS644664B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials

Landscapes

  • Formation Of Insulating Films (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Local Oxidation Of Silicon (AREA)
JP56134925A 1981-08-28 1981-08-28 半導体装置 Granted JPS5835925A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56134925A JPS5835925A (ja) 1981-08-28 1981-08-28 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56134925A JPS5835925A (ja) 1981-08-28 1981-08-28 半導体装置

Publications (2)

Publication Number Publication Date
JPS5835925A JPS5835925A (ja) 1983-03-02
JPS644664B2 true JPS644664B2 (2) 1989-01-26

Family

ID=15139742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56134925A Granted JPS5835925A (ja) 1981-08-28 1981-08-28 半導体装置

Country Status (1)

Country Link
JP (1) JPS5835925A (2)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03169667A (ja) * 1989-11-30 1991-07-23 Mita Ind Co Ltd インクリボンの巻取制御装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49107177A (2) * 1973-02-13 1974-10-11
JPS55133556A (en) * 1979-04-03 1980-10-17 Matsushita Electronics Corp Planar semiconductor device and method of fabricating the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03169667A (ja) * 1989-11-30 1991-07-23 Mita Ind Co Ltd インクリボンの巻取制御装置

Also Published As

Publication number Publication date
JPS5835925A (ja) 1983-03-02

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