JPS64731A - Forming device for deposited film - Google Patents

Forming device for deposited film

Info

Publication number: JPS64731A
Authority: JP; Japan
Prior art keywords: heating element; gas; halogen; base; onto
Prior art date: 1987-03-06
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP63038728A

Other languages

English (en)

Other versions

JPH01731A (ja

Inventor

Masahiro Kanai

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-03-06

Filing date

1988-02-23

Publication date

1989-01-05

1988-02-23 Application filed by Canon Inc filed Critical Canon Inc

1988-02-23 Priority to JP63038728A priority Critical patent/JPS64731A/ja

1989-01-05 Publication of JPH01731A publication Critical patent/JPH01731A/ja

1989-01-05 Publication of JPS64731A publication Critical patent/JPS64731A/ja

Status Pending legal-status Critical Current

Links

238000010438 heat treatment Methods 0.000 abstract 7
239000007789 gas Substances 0.000 abstract 5
229910052736 halogen Inorganic materials 0.000 abstract 3
150000002367 halogens Chemical class 0.000 abstract 3
CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 abstract 3
230000015572 biosynthetic process Effects 0.000 abstract 2
150000001875 compounds Chemical class 0.000 abstract 2
150000002431 hydrogen Chemical class 0.000 abstract 2
229910052739 hydrogen Inorganic materials 0.000 abstract 2
239000001257 hydrogen Substances 0.000 abstract 2
230000007246 mechanism Effects 0.000 abstract 2
239000002243 precursor Substances 0.000 abstract 2
229910052710 silicon Inorganic materials 0.000 abstract 2
239000010703 silicon Substances 0.000 abstract 2
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract 2
229910052721 tungsten Inorganic materials 0.000 abstract 2
239000010937 tungsten Substances 0.000 abstract 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
229910004016 SiF2 Inorganic materials 0.000 abstract 1
230000003197 catalytic effect Effects 0.000 abstract 1
MGNHOGAVECORPT-UHFFFAOYSA-N difluorosilicon Chemical compound F[Si]F MGNHOGAVECORPT-UHFFFAOYSA-N 0.000 abstract 1
238000010494 dissociation reaction Methods 0.000 abstract 1
208000018459 dissociative disease Diseases 0.000 abstract 1
238000004519 manufacturing process Methods 0.000 abstract 1
239000002994 raw material Substances 0.000 abstract 1
238000007493 shaping process Methods 0.000 abstract 1
238000004804 winding Methods 0.000 abstract 1

Landscapes

Light Receiving Elements (AREA)

JP63038728A 1987-03-06 1988-02-23 Forming device for deposited film Pending JPS64731A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP63038728A JPS64731A (en)	1987-03-06	1988-02-23	Forming device for deposited film

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP62-50343		1987-03-06
JP5034387		1987-03-06
JP63038728A JPS64731A (en)	1987-03-06	1988-02-23	Forming device for deposited film

Publications (2)

Publication Number	Publication Date
JPH01731A JPH01731A (ja)	1989-01-05
JPS64731A true JPS64731A (en)	1989-01-05

Family

ID=26378016

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP63038728A Pending JPS64731A (en)	1987-03-06	1988-02-23	Forming device for deposited film

Country Status (1)

Country	Link
JP (1)	JPS64731A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6410454B1 (en)	1997-06-10	2002-06-25	Mitsubishi Denki Kabushiki	Method and apparatus for removing contaminants from the surface of a semiconductor wafer

1988
- 1988-02-23 JP JP63038728A patent/JPS64731A/ja active Pending

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6410454B1 (en)	1997-06-10	2002-06-25	Mitsubishi Denki Kabushiki	Method and apparatus for removing contaminants from the surface of a semiconductor wafer

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