KR20090054917A - 패턴 검사 장치 - Google Patents
패턴 검사 장치 Download PDFInfo
- Publication number
- KR20090054917A KR20090054917A KR1020080117908A KR20080117908A KR20090054917A KR 20090054917 A KR20090054917 A KR 20090054917A KR 1020080117908 A KR1020080117908 A KR 1020080117908A KR 20080117908 A KR20080117908 A KR 20080117908A KR 20090054917 A KR20090054917 A KR 20090054917A
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- tape
- illumination
- image
- fall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Quality & Reliability (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Theoretical Computer Science (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Wire Bonding (AREA)
Abstract
Description
Claims (3)
- 필름 형상의 띠 형상 워크에 형성된 패턴을 촬상하여, 상기 패턴의 외관을 검사하는 패턴 검사 장치에 있어서,상기 띠 형상 워크의 한쪽의 면측에 배치되어, 상기 띠 형상 워크를 촬상하는 제1 촬상 수단과,상기 띠 형상 워크의 다른 쪽의 면측에 배치되어, 상기 띠 형상 워크를 촬상하는 제2 촬상 수단과,상기 띠 형상 워크의 한쪽의 면측으로부터 조사하는 조명 수단을 구비한 것을 특징으로 하는 패턴 검사 장치.
- 제1항에 있어서, 상기 조명 수단은 상기 제1 촬상 수단의 광입사 개구와 상기 띠 형상 워크 사이에 배치되어, 상기 띠 형상 워크에서 반사된 광을 통과시키는 관측 윈도우를 구비하고,상기 제1 촬상 수단은 상기 관측 윈도우를 통해 상기 띠 형상 워크를 촬상하는 것을 특징으로 하는 패턴 검사 장치.
- 제1항 또는 제2항에 있어서, 상기 조명 수단은 상기 제1 촬상 수단을 위한 조명과 상기 제2 촬상 수단을 위한 조명을 동시에 행하는 것을 특징으로 하는 패턴 검사 장치.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2007-305323 | 2007-11-27 | ||
| JP2007305323A JP2009128268A (ja) | 2007-11-27 | 2007-11-27 | パターン検査装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20090054917A true KR20090054917A (ko) | 2009-06-01 |
Family
ID=40819335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020080117908A Ceased KR20090054917A (ko) | 2007-11-27 | 2008-11-26 | 패턴 검사 장치 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2009128268A (ko) |
| KR (1) | KR20090054917A (ko) |
| TW (1) | TW200931008A (ko) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105004721B (zh) * | 2014-04-24 | 2018-04-13 | 奥蒂玛光学科技(深圳)有限公司 | 电路板双面检测设备 |
| CN105021619B (zh) * | 2014-04-24 | 2018-08-07 | 奥蒂玛光学科技(深圳)有限公司 | 电路板检测设备及其距离调节机构 |
| CN105352461A (zh) * | 2015-12-15 | 2016-02-24 | 重庆志成机械有限公司 | 一种用于摩托车配件外观合格检测的图像获取装置 |
| KR101865338B1 (ko) * | 2016-09-08 | 2018-06-08 | 에스엔유 프리시젼 주식회사 | 선폭 측정장치 및 이를 이용한 선폭 측정방법 |
| CN117147586A (zh) * | 2023-10-26 | 2023-12-01 | 江苏纳沛斯半导体有限公司 | 一种cof树脂区异物检测方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH058458U (ja) * | 1991-07-12 | 1993-02-05 | 旭光学工業株式会社 | 欠陥検査用の照明装置 |
| JPH0992692A (ja) * | 1995-07-13 | 1997-04-04 | Toray Ind Inc | Tabテープの検査装置および検査方法ならびに実装tabテープの製造方法および製造装置 |
| JP3679471B2 (ja) * | 1995-09-18 | 2005-08-03 | ジェネシス・テクノロジー株式会社 | 光学的欠陥検査装置 |
| JPH10221041A (ja) * | 1997-02-10 | 1998-08-21 | Toppan Printing Co Ltd | 欠陥検査方法 |
| KR19990039797A (ko) * | 1997-11-14 | 1999-06-05 | 윤종용 | 테이프 케리어 패키지 부품의 외관 검사방법 및 장치 |
| JPH11296657A (ja) * | 1998-04-09 | 1999-10-29 | Nippon Avionics Co Ltd | 画像処理装置の撮像光学系 |
| JP3875600B2 (ja) * | 2002-07-15 | 2007-01-31 | 三井金属鉱業株式会社 | 画像作製方法 |
| JP2004151622A (ja) * | 2002-11-01 | 2004-05-27 | Sony Corp | マスク欠陥検査装置及びマスク欠陥検査方法 |
| JP4403777B2 (ja) * | 2003-11-07 | 2010-01-27 | ウシオ電機株式会社 | 配線パターン検査装置及び方法 |
| KR100578560B1 (ko) * | 2005-01-10 | 2006-05-12 | 아주하이텍(주) | 자동 광학 검사 장치 |
-
2007
- 2007-11-27 JP JP2007305323A patent/JP2009128268A/ja active Pending
-
2008
- 2008-10-23 TW TW097140607A patent/TW200931008A/zh unknown
- 2008-11-26 KR KR1020080117908A patent/KR20090054917A/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| TW200931008A (en) | 2009-07-16 |
| JP2009128268A (ja) | 2009-06-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20081126 |
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| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20100929 Patent event code: PE09021S01D |
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| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20101217 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20100929 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |