JP2009128268A - パターン検査装置 - Google Patents

パターン検査装置 Download PDF

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Publication number
JP2009128268A
JP2009128268A JP2007305323A JP2007305323A JP2009128268A JP 2009128268 A JP2009128268 A JP 2009128268A JP 2007305323 A JP2007305323 A JP 2007305323A JP 2007305323 A JP2007305323 A JP 2007305323A JP 2009128268 A JP2009128268 A JP 2009128268A
Authority
JP
Japan
Prior art keywords
illumination
pattern
tape
epi
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007305323A
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English (en)
Japanese (ja)
Inventor
Shinichi Hattori
新一 服部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Avionics Co Ltd
Original Assignee
Nippon Avionics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Avionics Co Ltd filed Critical Nippon Avionics Co Ltd
Priority to JP2007305323A priority Critical patent/JP2009128268A/ja
Priority to TW097140607A priority patent/TW200931008A/zh
Priority to KR1020080117908A priority patent/KR20090054917A/ko
Publication of JP2009128268A publication Critical patent/JP2009128268A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Wire Bonding (AREA)
JP2007305323A 2007-11-27 2007-11-27 パターン検査装置 Pending JP2009128268A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007305323A JP2009128268A (ja) 2007-11-27 2007-11-27 パターン検査装置
TW097140607A TW200931008A (en) 2007-11-27 2008-10-23 Pattern inspection device
KR1020080117908A KR20090054917A (ko) 2007-11-27 2008-11-26 패턴 검사 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007305323A JP2009128268A (ja) 2007-11-27 2007-11-27 パターン検査装置

Publications (1)

Publication Number Publication Date
JP2009128268A true JP2009128268A (ja) 2009-06-11

Family

ID=40819335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007305323A Pending JP2009128268A (ja) 2007-11-27 2007-11-27 パターン検査装置

Country Status (3)

Country Link
JP (1) JP2009128268A (ko)
KR (1) KR20090054917A (ko)
TW (1) TW200931008A (ko)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105004721A (zh) * 2014-04-24 2015-10-28 奥蒂玛光学科技（深圳）有限公司 电路板双面检测设备
CN105021619A (zh) * 2014-04-24 2015-11-04 奥蒂玛光学科技（深圳）有限公司 电路板检测设备及其距离调节机构
CN105352461A (zh) * 2015-12-15 2016-02-24 重庆志成机械有限公司 一种用于摩托车配件外观合格检测的图像获取装置
KR101865338B1 (ko) * 2016-09-08 2018-06-08 에스엔유 프리시젼 주식회사 선폭 측정장치 및 이를 이용한 선폭 측정방법
CN117147586A (zh) * 2023-10-26 2023-12-01 江苏纳沛斯半导体有限公司 一种cof树脂区异物检测方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH058458U (ja) * 1991-07-12 1993-02-05 旭光学工業株式会社 欠陥検査用の照明装置
JPH0979995A (ja) * 1995-09-18 1997-03-28 Jieneshisu Technol Kk 光学的欠陥検査装置
JPH0992692A (ja) * 1995-07-13 1997-04-04 Toray Ind Inc Ｔａｂテープの検査装置および検査方法ならびに実装ｔａｂテープの製造方法および製造装置
JPH10221041A (ja) * 1997-02-10 1998-08-21 Toppan Printing Co Ltd 欠陥検査方法
JPH11251362A (ja) * 1997-11-14 1999-09-17 Samsung Electronics Co Ltd テープキャリアパッケージの外観検査装置
JPH11296657A (ja) * 1998-04-09 1999-10-29 Nippon Avionics Co Ltd 画像処理装置の撮像光学系
JP2004047879A (ja) * 2002-07-15 2004-02-12 Mitsui Mining & Smelting Co Ltd 画像作製方法
JP2004151622A (ja) * 2002-11-01 2004-05-27 Sony Corp マスク欠陥検査装置及びマスク欠陥検査方法
JP2005140663A (ja) * 2003-11-07 2005-06-02 Ushio Inc 配線パターン検査装置及び方法
JP2006194872A (ja) * 2005-01-10 2006-07-27 Ajuhitek Inc 自動光学検査装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH058458U (ja) * 1991-07-12 1993-02-05 旭光学工業株式会社 欠陥検査用の照明装置
JPH0992692A (ja) * 1995-07-13 1997-04-04 Toray Ind Inc Ｔａｂテープの検査装置および検査方法ならびに実装ｔａｂテープの製造方法および製造装置
JPH0979995A (ja) * 1995-09-18 1997-03-28 Jieneshisu Technol Kk 光学的欠陥検査装置
JPH10221041A (ja) * 1997-02-10 1998-08-21 Toppan Printing Co Ltd 欠陥検査方法
JPH11251362A (ja) * 1997-11-14 1999-09-17 Samsung Electronics Co Ltd テープキャリアパッケージの外観検査装置
JPH11296657A (ja) * 1998-04-09 1999-10-29 Nippon Avionics Co Ltd 画像処理装置の撮像光学系
JP2004047879A (ja) * 2002-07-15 2004-02-12 Mitsui Mining & Smelting Co Ltd 画像作製方法
JP2004151622A (ja) * 2002-11-01 2004-05-27 Sony Corp マスク欠陥検査装置及びマスク欠陥検査方法
JP2005140663A (ja) * 2003-11-07 2005-06-02 Ushio Inc 配線パターン検査装置及び方法
JP2006194872A (ja) * 2005-01-10 2006-07-27 Ajuhitek Inc 自動光学検査装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105004721A (zh) * 2014-04-24 2015-10-28 奥蒂玛光学科技（深圳）有限公司 电路板双面检测设备
CN105021619A (zh) * 2014-04-24 2015-11-04 奥蒂玛光学科技（深圳）有限公司 电路板检测设备及其距离调节机构
CN105352461A (zh) * 2015-12-15 2016-02-24 重庆志成机械有限公司 一种用于摩托车配件外观合格检测的图像获取装置
KR101865338B1 (ko) * 2016-09-08 2018-06-08 에스엔유 프리시젼 주식회사 선폭 측정장치 및 이를 이용한 선폭 측정방법
CN117147586A (zh) * 2023-10-26 2023-12-01 江苏纳沛斯半导体有限公司 一种cof树脂区异物检测方法

Also Published As

Publication number Publication date
KR20090054917A (ko) 2009-06-01
TW200931008A (en) 2009-07-16

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