NO124319B - - Google Patents
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- Publication number
- NO124319B NO124319B NO2602/69A NO260269A NO124319B NO 124319 B NO124319 B NO 124319B NO 2602/69 A NO2602/69 A NO 2602/69A NO 260269 A NO260269 A NO 260269A NO 124319 B NO124319 B NO 124319B
- Authority
- NO
- Norway
- Prior art keywords
- substrate
- chamber
- source
- temperature
- vapor
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims description 60
- 238000000576 coating method Methods 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 28
- 238000010894 electron beam technology Methods 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 description 26
- 238000004873 anchoring Methods 0.000 description 15
- 239000013078 crystal Substances 0.000 description 11
- 238000002425 crystallisation Methods 0.000 description 10
- 230000008025 crystallization Effects 0.000 description 10
- 238000009835 boiling Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000005684 electric field Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical class [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE60325 | 1968-06-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO124319B true NO124319B (de) | 1972-04-04 |
Family
ID=3841035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO2602/69A NO124319B (de) | 1968-06-28 | 1969-06-23 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3693583A (de) |
| AT (1) | AT289501B (de) |
| DE (1) | DE1916818A1 (de) |
| FR (1) | FR2011775A1 (de) |
| IL (1) | IL32069A0 (de) |
| LU (1) | LU58440A1 (de) |
| NO (1) | NO124319B (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3776181A (en) * | 1970-02-02 | 1973-12-04 | Ransburg Electro Coating Corp | Deposition apparatus for an organometallic material |
| US3928672A (en) * | 1970-05-18 | 1975-12-23 | Sperry Rand Corp | Process for providing a hard coating to magnetic transducing heads |
| DE19605335C1 (de) * | 1996-02-14 | 1997-04-03 | Fraunhofer Ges Forschung | Verfahren und Einrichtung zur Regelung eines Vakuumbedampfungsprozesses |
| FR3020381B1 (fr) * | 2014-04-24 | 2017-09-29 | Riber | Cellule d'evaporation |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2391595A (en) * | 1942-11-27 | 1945-12-25 | Vard Inc | Nonreflective lens coating |
| US2771568A (en) * | 1951-01-31 | 1956-11-20 | Zeiss Carl | Utilizing electron energy for physically and chemically changing members |
| US2932588A (en) * | 1955-07-06 | 1960-04-12 | English Electric Valve Co Ltd | Methods of manufacturing thin films of refractory dielectric materials |
| US3330251A (en) * | 1955-11-02 | 1967-07-11 | Siemens Ag | Apparatus for producing highest-purity silicon for electric semiconductor devices |
| US3243174A (en) * | 1960-03-08 | 1966-03-29 | Chilean Nitrate Sales Corp | Dissociation-deposition apparatus for the production of metals |
| US3192892A (en) * | 1961-11-24 | 1965-07-06 | Sperry Rand Corp | Ion bombardment cleaning and coating apparatus |
| US3347701A (en) * | 1963-02-05 | 1967-10-17 | Fujitsu Ltd | Method and apparatus for vapor deposition employing an electron beam |
| DE1244733B (de) * | 1963-11-05 | 1967-07-20 | Siemens Ag | Vorrichtung zum Aufwachsen einkristalliner Halbleitermaterialschichten auf einkristallinen Grundkoerpern |
| US3344054A (en) * | 1964-03-02 | 1967-09-26 | Schjeldahl Co G T | Art of controlling sputtering and metal evaporation by means of a plane acceptor |
| US3361591A (en) * | 1964-04-15 | 1968-01-02 | Hughes Aircraft Co | Production of thin films of cadmium sulfide, cadmium telluride or cadmium selenide |
| DE1521494B1 (de) * | 1966-02-25 | 1970-11-26 | Siemens Ag | Vorrichtung zum Eindiffundieren von Fremdstoffen in Halbleiterkoerper |
| US3437734A (en) * | 1966-06-21 | 1969-04-08 | Isofilm Intern | Apparatus and method for effecting the restructuring of materials |
| US3375804A (en) * | 1966-08-05 | 1968-04-02 | Fabri Tek Inc | Film deposition apparatus |
| US3552352A (en) * | 1968-02-13 | 1971-01-05 | Du Pont | Electron beam vaporization coating apparatus |
-
1969
- 1969-03-28 DE DE19691916818 patent/DE1916818A1/de active Pending
- 1969-04-17 LU LU58440D patent/LU58440A1/xx unknown
- 1969-04-22 US US818270A patent/US3693583A/en not_active Expired - Lifetime
- 1969-04-24 IL IL32069A patent/IL32069A0/xx unknown
- 1969-05-28 AT AT506169A patent/AT289501B/de not_active IP Right Cessation
- 1969-06-23 NO NO2602/69A patent/NO124319B/no unknown
- 1969-06-27 FR FR6921855A patent/FR2011775A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| LU58440A1 (de) | 1969-07-21 |
| IL32069A0 (en) | 1969-06-25 |
| DE1916818A1 (de) | 1970-03-12 |
| AT289501B (de) | 1971-04-26 |
| US3693583A (en) | 1972-09-26 |
| FR2011775A1 (de) | 1970-03-06 |
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