PL377089A1 - Katoda do napylania próżniowego - Google Patents

Katoda do napylania próżniowego

Info

Publication number
PL377089A1
PL377089A1 PL377089A PL37708903A PL377089A1 PL 377089 A1 PL377089 A1 PL 377089A1 PL 377089 A PL377089 A PL 377089A PL 37708903 A PL37708903 A PL 37708903A PL 377089 A1 PL377089 A1 PL 377089A1
Authority
PL
Poland
Prior art keywords
vacuum sputtering
sputtering cathode
frame
membrane
disposed
Prior art date
Application number
PL377089A
Other languages
English (en)
Other versions
PL207112B1 (pl
Inventor
Michel Aulagner
Lionel Labalme
Original Assignee
Tecmachine
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tecmachine filed Critical Tecmachine
Publication of PL377089A1 publication Critical patent/PL377089A1/pl
Publication of PL207112B1 publication Critical patent/PL207112B1/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Coating By Spraying Or Casting (AREA)
PL377089A 2002-07-10 2003-07-08 Katoda do napylania próżniowego PL207112B1 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0208869A FR2842348B1 (fr) 2002-07-10 2002-07-10 Cathode pour pulverisation sous vide

Publications (2)

Publication Number Publication Date
PL377089A1 true PL377089A1 (pl) 2006-01-23
PL207112B1 PL207112B1 (pl) 2010-11-30

Family

ID=29763836

Family Applications (1)

Application Number Title Priority Date Filing Date
PL377089A PL207112B1 (pl) 2002-07-10 2003-07-08 Katoda do napylania próżniowego

Country Status (14)

Country Link
US (1) US7632383B2 (pl)
EP (1) EP1579471B1 (pl)
JP (1) JP5079212B2 (pl)
CN (1) CN100578724C (pl)
AT (1) ATE528785T1 (pl)
AU (1) AU2003273424A1 (pl)
CA (1) CA2492174C (pl)
ES (1) ES2371246T3 (pl)
FR (1) FR2842348B1 (pl)
MX (1) MXPA05000457A (pl)
PL (1) PL207112B1 (pl)
SI (1) SI1579471T1 (pl)
TW (1) TWI325446B (pl)
WO (1) WO2004008479A2 (pl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012006717A1 (de) * 2012-04-04 2013-10-10 Oerlikon Trading Ag, Trübbach An eine indirekte Kühlvorrichtung angepasstes Target
SE542687C2 (en) 2018-06-27 2020-06-23 Impact Coatings Ab Publ Arc source system for a cathode
CN116887501B (zh) * 2023-07-14 2026-06-19 中国电子科技集团公司第十二研究所 一种电子直线加速器

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4437966A (en) * 1982-09-30 1984-03-20 Gte Products Corporation Sputtering cathode apparatus
JP2731152B2 (ja) * 1987-11-17 1998-03-25 日立金属株式会社 冷却部材付きスパッタリング用ターゲット
CH672319A5 (en) * 1987-12-20 1989-11-15 Bogdan Zega Sputtering target cooling system - has metal membrane sepg. cooling liq. circuit from sputtering chamber
JPH02205669A (ja) * 1989-02-03 1990-08-15 Matsushita Electric Ind Co Ltd スパッタ装置
JPH02258974A (ja) * 1989-03-30 1990-10-19 Sumitomo Metal Ind Ltd スパッタリング装置のターゲット及び陰極部
DE4015388C2 (de) * 1990-05-14 1997-07-17 Leybold Ag Kathodenzerstäubungsvorrichtung
US5269894A (en) * 1991-05-08 1993-12-14 Balzers Aktiengesellschaft Method of mounting a target plate to be cooled into a vacuum process chamber, an arrangement of a target plate, a target plate and a vacuum chamber
US5147521A (en) 1991-05-20 1992-09-15 Tosoh Smd, Inc. Quick change sputter target assembly
JPH0525620A (ja) * 1991-07-18 1993-02-02 Hitachi Ltd スパツタリングターゲツト
DE4301516C2 (de) * 1993-01-21 2003-02-13 Applied Films Gmbh & Co Kg Targetkühlung mit Wanne
US5529673A (en) * 1995-02-17 1996-06-25 Sony Corporation Mechanically joined sputtering target and adapter therefor
JPH08246144A (ja) * 1995-03-10 1996-09-24 Japan Energy Corp スパッタリングターゲット用バッキングプレート組立部品
DE29512094U1 (de) * 1995-07-27 1996-02-01 Heron Sondermaschinen Und Steuerungen Ges.M.B.H., Lustenau Klemmvorrichtung für Schutzeinrichtungen an Maschinen u.dgl.
US5863397A (en) 1997-07-11 1999-01-26 Taiwan Semiconductor Manufacturing Co Ltd. Target mounting apparatus for vapor deposition system
JP4130263B2 (ja) * 1998-12-03 2008-08-06 三菱伸銅株式会社 スパッタリング装置および水冷カソード

Also Published As

Publication number Publication date
CA2492174C (fr) 2014-04-15
WO2004008479A2 (fr) 2004-01-22
EP1579471B1 (fr) 2011-10-12
AU2003273424A1 (en) 2004-02-02
US7632383B2 (en) 2009-12-15
JP5079212B2 (ja) 2012-11-21
EP1579471A2 (fr) 2005-09-28
ATE528785T1 (de) 2011-10-15
US20050155855A1 (en) 2005-07-21
FR2842348A1 (fr) 2004-01-16
CA2492174A1 (fr) 2004-01-22
PL207112B1 (pl) 2010-11-30
WO2004008479A3 (fr) 2005-12-15
FR2842348B1 (fr) 2004-09-10
CN1757091A (zh) 2006-04-05
TW200401837A (en) 2004-02-01
CN100578724C (zh) 2010-01-06
ES2371246T3 (es) 2011-12-28
JP2006512479A (ja) 2006-04-13
SI1579471T1 (sl) 2011-12-30
MXPA05000457A (es) 2005-07-22
TWI325446B (en) 2010-06-01

Similar Documents

Publication Publication Date Title
USD464938S1 (en) High performance cooling device
EP1385221A3 (en) Display device with anthracene and triazine derivtives
USD493397S1 (en) Instrument cluster
WO2004077869A3 (en) Hard handoff target generation in a multi-frequency cdma mobile network
USD473223S1 (en) Telecommunications equipment housing design
USD469532S1 (en) Bone plate
DE60231498D1 (de) Ätzkammer mit veränderbarem plasmavolumen
USD1002336S1 (en) Anode mounting plate
TW200629972A (en) Mask frame and method of fixing mask on the mask frame
WO2005006636A3 (en) Messenger-controlled applications in an instant messaging environment
ATE283678T1 (de) Operationstisch
USD494905S1 (en) Instrument cluster
PL1825491T3 (pl) Źródło jonów o zasadniczo płaskiej konstrukcji
AR040119A2 (es) Lente electroactiva
AU2002358407A1 (en) Cooling device for a chip and method for production thereof
USD522875S1 (en) Bottle
HK1061179A2 (en) Call admission control unit
TW200501217A (en) Transfer chamber for cluster system
AU2003210175A1 (en) Bipolar plate
USD494518S1 (en) Instrument cluster
SI1579471T1 (sl) Katoda za vakuumsko razprševanje
USD482770S1 (en) Adjustable pedestal fan
USD1017335S1 (en) Cooling vessel
ATE534317T1 (de) Möbel-kältegerät-kombination
USD470838S1 (en) Antenna and mount