SU471402A1 - Травильный раствор - Google Patents
Травильный растворInfo
- Publication number
- SU471402A1 SU471402A1 SU1887879A SU1887879A SU471402A1 SU 471402 A1 SU471402 A1 SU 471402A1 SU 1887879 A SU1887879 A SU 1887879A SU 1887879 A SU1887879 A SU 1887879A SU 471402 A1 SU471402 A1 SU 471402A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- etching
- concentrated
- pickling solution
- solution
- thin
- Prior art date
Links
- 238000005554 pickling Methods 0.000 title 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 8
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 4
- PVADDRMAFCOOPC-UHFFFAOYSA-N germanium monoxide Inorganic materials [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 229910001961 silver nitrate Inorganic materials 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
Description
1
Изобретение относитс к технологии, в частности к составам дл травлени тонкослойных покрытий из германи и моноокиси кремни , и может быть использовано при изготовлении оптических тонкослойных покрытий, а также в радиоэлектронике и полупроводниковой технике .
Известен травильный раствор, содержащий концептрированную фтористоводородную кислоту , азотную кислоту и воду.
Однако скорость травлени покрытий из германи и моноокиси кремни в этом растворе недостаточна .
Целью изобретени вл етс повып1ение скорости травлени .
Дл этого раствор дополнительно содержит азотнокислое серебро при следующем соотнощении компонентов, вес. %: азотна кислота (концентрированна )40 -60 фтористоводородна кислота (концентрированна )10 -20 азотнокислое серебро0,5- 1,2 вода 18,8-49,5. Травление в данном растворе осуществл ют при комнатной температуре с последующей промывкой обработанных деталей дистиллированной водой.
Травильный раствор позвол ет в течение 0,5 - 1 мин снимать тонкослойные покрыти из германи и моноокиси кремни как со всей поверхности подложки, так и с ее отдельных участков с использованием маски из фоторезиста , при этом сохран ютс оптическа поверхность стекл нных подложек и четкие границы заданного контура рисунка тонкослойного покрыти .
П р е д М е Изобретени
Травильный раствор, преимущественно дл тонкослойных покрытий из германи и моноокиси кремни , включающий концентрированную азотную кислоту, концентрированную фтористоводородную кислоту и воду, отличающийс тем, что, с целью повышени скорости травлени , он дополнительно содержит азотнокислое серебро при следующем соотнощении компонентов, вес. %: азотна кислота (концентрированна )40 -60 фтористоводородна кислота (концентрированна )10 -20 азотнокислое серебро0,5- 1,2 вода 18,8-49.5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU1887879A SU471402A1 (ru) | 1973-03-02 | 1973-03-02 | Травильный раствор |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU1887879A SU471402A1 (ru) | 1973-03-02 | 1973-03-02 | Травильный раствор |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU471402A1 true SU471402A1 (ru) | 1975-05-25 |
Family
ID=20543841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU1887879A SU471402A1 (ru) | 1973-03-02 | 1973-03-02 | Травильный раствор |
Country Status (1)
| Country | Link |
|---|---|
| SU (1) | SU471402A1 (ru) |
Cited By (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0281115A3 (en) * | 1987-03-04 | 1989-10-11 | Kabushiki Kaisha Toshiba | Etching solution for evaluating crystal faults |
| GB2464158A (en) * | 2008-10-10 | 2010-04-14 | Nexion Ltd | A method of fabricating structured particles composed of silicon or a silicon base material and their use in lithium rechargeable batteries |
| US8101298B2 (en) | 2006-01-23 | 2012-01-24 | Nexeon Ltd. | Method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8384058B2 (en) | 2002-11-05 | 2013-02-26 | Nexeon Ltd. | Structured silicon anode |
| US8585918B2 (en) | 2006-01-23 | 2013-11-19 | Nexeon Ltd. | Method of etching a silicon-based material |
| US8642211B2 (en) | 2007-07-17 | 2014-02-04 | Nexeon Limited | Electrode including silicon-comprising fibres and electrochemical cells including the same |
| US8772174B2 (en) | 2010-04-09 | 2014-07-08 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or silicon-based material and their use in lithium rechargeable batteries |
| US8870975B2 (en) | 2007-07-17 | 2014-10-28 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8932759B2 (en) | 2008-10-10 | 2015-01-13 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material |
| US8945774B2 (en) | 2010-06-07 | 2015-02-03 | Nexeon Ltd. | Additive for lithium ion rechageable battery cells |
| US8962183B2 (en) | 2009-05-07 | 2015-02-24 | Nexeon Limited | Method of making silicon anode material for rechargeable cells |
| US9012079B2 (en) | 2007-07-17 | 2015-04-21 | Nexeon Ltd | Electrode comprising structured silicon-based material |
| US9252426B2 (en) | 2007-05-11 | 2016-02-02 | Nexeon Limited | Silicon anode for a rechargeable battery |
| US9548489B2 (en) | 2012-01-30 | 2017-01-17 | Nexeon Ltd. | Composition of SI/C electro active material |
| US9608272B2 (en) | 2009-05-11 | 2017-03-28 | Nexeon Limited | Composition for a secondary battery cell |
| US9647263B2 (en) | 2010-09-03 | 2017-05-09 | Nexeon Limited | Electroactive material |
| US9853292B2 (en) | 2009-05-11 | 2017-12-26 | Nexeon Limited | Electrode composition for a secondary battery cell |
| US9871248B2 (en) | 2010-09-03 | 2018-01-16 | Nexeon Limited | Porous electroactive material |
| US10008716B2 (en) | 2012-11-02 | 2018-06-26 | Nexeon Limited | Device and method of forming a device |
| US10077506B2 (en) | 2011-06-24 | 2018-09-18 | Nexeon Limited | Structured particles |
| US10090513B2 (en) | 2012-06-01 | 2018-10-02 | Nexeon Limited | Method of forming silicon |
| US10103379B2 (en) | 2012-02-28 | 2018-10-16 | Nexeon Limited | Structured silicon particles |
| US10396355B2 (en) | 2014-04-09 | 2019-08-27 | Nexeon Ltd. | Negative electrode active material for secondary battery and method for manufacturing same |
| US10476072B2 (en) | 2014-12-12 | 2019-11-12 | Nexeon Limited | Electrodes for metal-ion batteries |
-
1973
- 1973-03-02 SU SU1887879A patent/SU471402A1/ru active
Cited By (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0281115A3 (en) * | 1987-03-04 | 1989-10-11 | Kabushiki Kaisha Toshiba | Etching solution for evaluating crystal faults |
| US8384058B2 (en) | 2002-11-05 | 2013-02-26 | Nexeon Ltd. | Structured silicon anode |
| US8101298B2 (en) | 2006-01-23 | 2012-01-24 | Nexeon Ltd. | Method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US9583762B2 (en) | 2006-01-23 | 2017-02-28 | Nexeon Limited | Method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8585918B2 (en) | 2006-01-23 | 2013-11-19 | Nexeon Ltd. | Method of etching a silicon-based material |
| US8597831B2 (en) | 2006-01-23 | 2013-12-03 | Nexeon Ltd. | Method of fabricating fibres composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US9871249B2 (en) | 2007-05-11 | 2018-01-16 | Nexeon Limited | Silicon anode for a rechargeable battery |
| US9252426B2 (en) | 2007-05-11 | 2016-02-02 | Nexeon Limited | Silicon anode for a rechargeable battery |
| US8940437B2 (en) | 2007-07-17 | 2015-01-27 | Nexeon Limited | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8870975B2 (en) | 2007-07-17 | 2014-10-28 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US9012079B2 (en) | 2007-07-17 | 2015-04-21 | Nexeon Ltd | Electrode comprising structured silicon-based material |
| US8642211B2 (en) | 2007-07-17 | 2014-02-04 | Nexeon Limited | Electrode including silicon-comprising fibres and electrochemical cells including the same |
| US9871244B2 (en) | 2007-07-17 | 2018-01-16 | Nexeon Limited | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| GB2464158B (en) * | 2008-10-10 | 2011-04-20 | Nexeon Ltd | A method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8932759B2 (en) | 2008-10-10 | 2015-01-13 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material |
| GB2464158A (en) * | 2008-10-10 | 2010-04-14 | Nexion Ltd | A method of fabricating structured particles composed of silicon or a silicon base material and their use in lithium rechargeable batteries |
| US9184438B2 (en) | 2008-10-10 | 2015-11-10 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or a silicon-based material and their use in lithium rechargeable batteries |
| US8962183B2 (en) | 2009-05-07 | 2015-02-24 | Nexeon Limited | Method of making silicon anode material for rechargeable cells |
| US9553304B2 (en) | 2009-05-07 | 2017-01-24 | Nexeon Limited | Method of making silicon anode material for rechargeable cells |
| US10050275B2 (en) | 2009-05-11 | 2018-08-14 | Nexeon Limited | Binder for lithium ion rechargeable battery cells |
| US9608272B2 (en) | 2009-05-11 | 2017-03-28 | Nexeon Limited | Composition for a secondary battery cell |
| US9853292B2 (en) | 2009-05-11 | 2017-12-26 | Nexeon Limited | Electrode composition for a secondary battery cell |
| US8772174B2 (en) | 2010-04-09 | 2014-07-08 | Nexeon Ltd. | Method of fabricating structured particles composed of silicon or silicon-based material and their use in lithium rechargeable batteries |
| US9368836B2 (en) | 2010-06-07 | 2016-06-14 | Nexeon Ltd. | Additive for lithium ion rechargeable battery cells |
| US8945774B2 (en) | 2010-06-07 | 2015-02-03 | Nexeon Ltd. | Additive for lithium ion rechageable battery cells |
| US9947920B2 (en) | 2010-09-03 | 2018-04-17 | Nexeon Limited | Electroactive material |
| US9871248B2 (en) | 2010-09-03 | 2018-01-16 | Nexeon Limited | Porous electroactive material |
| US9647263B2 (en) | 2010-09-03 | 2017-05-09 | Nexeon Limited | Electroactive material |
| US10077506B2 (en) | 2011-06-24 | 2018-09-18 | Nexeon Limited | Structured particles |
| US10822713B2 (en) | 2011-06-24 | 2020-11-03 | Nexeon Limited | Structured particles |
| US9548489B2 (en) | 2012-01-30 | 2017-01-17 | Nexeon Ltd. | Composition of SI/C electro active material |
| US10388948B2 (en) | 2012-01-30 | 2019-08-20 | Nexeon Limited | Composition of SI/C electro active material |
| US10103379B2 (en) | 2012-02-28 | 2018-10-16 | Nexeon Limited | Structured silicon particles |
| US10090513B2 (en) | 2012-06-01 | 2018-10-02 | Nexeon Limited | Method of forming silicon |
| US10008716B2 (en) | 2012-11-02 | 2018-06-26 | Nexeon Limited | Device and method of forming a device |
| US10396355B2 (en) | 2014-04-09 | 2019-08-27 | Nexeon Ltd. | Negative electrode active material for secondary battery and method for manufacturing same |
| US10476072B2 (en) | 2014-12-12 | 2019-11-12 | Nexeon Limited | Electrodes for metal-ion batteries |
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