ATA318985A - Halbleitereinrichtung mit vertikalen und lateralen npn- und pnp-transistoren auf einem gemeinsamen substrat - Google Patents

Halbleitereinrichtung mit vertikalen und lateralen npn- und pnp-transistoren auf einem gemeinsamen substrat

Info

Publication number
ATA318985A
ATA318985A AT0318985A AT318985A ATA318985A AT A318985 A ATA318985 A AT A318985A AT 0318985 A AT0318985 A AT 0318985A AT 318985 A AT318985 A AT 318985A AT A318985 A ATA318985 A AT A318985A
Authority
AT
Austria
Prior art keywords
vertical
semiconductor device
common substrate
pnp transistors
lateral npn
Prior art date
Application number
AT0318985A
Other languages
English (en)
Other versions
AT395272B (de
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of ATA318985A publication Critical patent/ATA318985A/de
Application granted granted Critical
Publication of AT395272B publication Critical patent/AT395272B/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0112Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
    • H10D84/0114Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs the components including vertical BJTs and lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/63Combinations of vertical and lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67Complementary BJTs
    • H10D84/673Vertical complementary BJTs
AT0318985A 1984-11-05 1985-11-05 Halbleitereinrichtung mit vertikalen und lateralen npn- und pnp-transistoren auf einem gemeinsamen substrat AT395272B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59232870A JPH0638476B2 (ja) 1984-11-05 1984-11-05 半導体装置

Publications (2)

Publication Number Publication Date
ATA318985A true ATA318985A (de) 1992-03-15
AT395272B AT395272B (de) 1992-11-10

Family

ID=16946115

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0318985A AT395272B (de) 1984-11-05 1985-11-05 Halbleitereinrichtung mit vertikalen und lateralen npn- und pnp-transistoren auf einem gemeinsamen substrat

Country Status (10)

Country Link
JP (1) JPH0638476B2 (de)
KR (1) KR940005447B1 (de)
CN (1) CN1004845B (de)
AT (1) AT395272B (de)
AU (1) AU572005B2 (de)
CA (1) CA1254671A (de)
DE (1) DE3539208C2 (de)
FR (1) FR2572850B1 (de)
GB (1) GB2167231B (de)
NL (1) NL194711C (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6768183B2 (en) * 2001-04-20 2004-07-27 Denso Corporation Semiconductor device having bipolar transistors

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1520515A (fr) * 1967-02-07 1968-04-12 Radiotechnique Coprim Rtc Circuits intégrés comportant des transistors de types opposés et leurs procédésde fabrication
JPS5710964A (en) * 1980-06-25 1982-01-20 Fujitsu Ltd Manufacture of semiconductor device
EP0093304B1 (de) * 1982-04-19 1986-01-15 Matsushita Electric Industrial Co., Ltd. Integrierte Halbleiterschaltung und Verfahren zur Herstellung derselben
JPS58212159A (ja) * 1982-06-02 1983-12-09 Matsushita Electric Ind Co Ltd 半導体集積回路装置の製造方法

Also Published As

Publication number Publication date
FR2572850B1 (fr) 1988-09-09
AU572005B2 (en) 1988-04-28
KR940005447B1 (ko) 1994-06-18
CN85108134A (zh) 1986-07-02
JPS61111575A (ja) 1986-05-29
JPH0638476B2 (ja) 1994-05-18
DE3539208C2 (de) 1998-04-09
AU4931585A (en) 1986-05-15
GB2167231A (en) 1986-05-21
NL194711C (nl) 2002-12-03
FR2572850A1 (fr) 1986-05-09
GB2167231B (en) 1988-03-02
GB8526749D0 (en) 1985-12-04
CN1004845B (zh) 1989-07-19
DE3539208A1 (de) 1986-05-15
NL8503033A (nl) 1986-06-02
AT395272B (de) 1992-11-10
KR860004472A (ko) 1986-06-23
CA1254671A (en) 1989-05-23
NL194711B (nl) 2002-08-01

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Legal Events

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ELJ Ceased due to non-payment of the annual fee
ELJ Ceased due to non-payment of the annual fee