ATE150584T1 - Verfahren und vorrichtung zum herstellen von übergängen durch diffusion in substrate von solarzellen - Google Patents
Verfahren und vorrichtung zum herstellen von übergängen durch diffusion in substrate von solarzellenInfo
- Publication number
- ATE150584T1 ATE150584T1 AT91918988T AT91918988T ATE150584T1 AT E150584 T1 ATE150584 T1 AT E150584T1 AT 91918988 T AT91918988 T AT 91918988T AT 91918988 T AT91918988 T AT 91918988T AT E150584 T1 ATE150584 T1 AT E150584T1
- Authority
- AT
- Austria
- Prior art keywords
- substrates
- solar cells
- diffusion
- producing transitions
- dopant
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/137—Batch treatment of the devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
- H10P32/1408—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers
- H10P32/141—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers the applied layer comprising oxides only
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
- H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US60400090A | 1990-10-24 | 1990-10-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE150584T1 true ATE150584T1 (de) | 1997-04-15 |
Family
ID=24417781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT91918988T ATE150584T1 (de) | 1990-10-24 | 1991-09-20 | Verfahren und vorrichtung zum herstellen von übergängen durch diffusion in substrate von solarzellen |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP0506926B1 (de) |
| JP (1) | JP3021650B2 (de) |
| CN (1) | CN1028819C (de) |
| AT (1) | ATE150584T1 (de) |
| AU (2) | AU644025B2 (de) |
| CA (1) | CA2070380A1 (de) |
| DE (1) | DE69125268T2 (de) |
| IL (1) | IL99582A (de) |
| WO (1) | WO1992008245A1 (de) |
| ZA (1) | ZA917719B (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005025933B3 (de) * | 2005-06-06 | 2006-07-13 | Centrotherm Photovoltaics Gmbh + Co. Kg | Dotiergermisch für die Dotierung von Halbleitern |
| ITUD20050196A1 (it) * | 2005-11-17 | 2007-05-18 | Gisulfo Baccini | Apparecchiatura per la produzione di celle fotovoltaiche sottili in silicio e di circuiti elettronici in materiale rigido e flessibile |
| CN101220518B (zh) * | 2007-01-12 | 2010-04-07 | 中国电子科技集团公司第四十八研究所 | 一种用于高温扩散系统的尾气收集装置 |
| US20090239363A1 (en) * | 2008-03-24 | 2009-09-24 | Honeywell International, Inc. | Methods for forming doped regions in semiconductor substrates using non-contact printing processes and dopant-comprising inks for forming such doped regions using non-contact printing processes |
| US9559228B2 (en) * | 2011-09-30 | 2017-01-31 | Sunpower Corporation | Solar cell with doped groove regions separated by ridges |
| CN103361733B (zh) * | 2013-06-21 | 2016-03-23 | 中山大学 | 一种光外同轴超声波喷雾激光掺杂系统 |
| US10365420B2 (en) | 2013-08-01 | 2019-07-30 | Lg Chem, Ltd. | Method for manufacturing polarizing film using ultrasonic vibrator for atomizing coating solution |
| CN104505439A (zh) * | 2015-01-10 | 2015-04-08 | 复旦大学 | 一步完成扩散、表面钝化和减反射的太阳电池制备方法 |
| CN108110090B (zh) * | 2018-01-11 | 2020-03-06 | 江苏顺风光电科技有限公司 | 一种n型双面电池制备方法 |
| KR20230008848A (ko) * | 2020-05-09 | 2023-01-16 | 램 리써치 코포레이션 | 센서들 및 제어 알고리즘들을 통한 도금-향상을 위한 웨이퍼 습윤성 (wettability) 을 개선하기 위한 방법들 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU499679B2 (en) * | 1976-04-08 | 1979-04-26 | Photon Power Inc | Photovoltaic cell |
| US4273950A (en) * | 1979-05-29 | 1981-06-16 | Photowatt International, Inc. | Solar cell and fabrication thereof using microwaves |
| US4360393A (en) | 1980-12-18 | 1982-11-23 | Solarex Corporation | Vapor deposition of H3 PO4 and formation of thin phosphorus layer on silicon substrates |
| DE3631270A1 (de) * | 1986-09-13 | 1988-03-24 | Kopperschmidt Mueller & Co | Vorrichtung zur spruehbeschichtung von werkstuecken |
-
1991
- 1991-09-20 EP EP91918988A patent/EP0506926B1/de not_active Expired - Lifetime
- 1991-09-20 CA CA002070380A patent/CA2070380A1/en not_active Abandoned
- 1991-09-20 WO PCT/US1991/006843 patent/WO1992008245A1/en not_active Ceased
- 1991-09-20 DE DE69125268T patent/DE69125268T2/de not_active Expired - Lifetime
- 1991-09-20 AU AU87684/91A patent/AU644025B2/en not_active Expired
- 1991-09-20 JP JP03517259A patent/JP3021650B2/ja not_active Expired - Fee Related
- 1991-09-20 AT AT91918988T patent/ATE150584T1/de not_active IP Right Cessation
- 1991-09-26 ZA ZA917719A patent/ZA917719B/xx unknown
- 1991-09-26 IL IL9958291A patent/IL99582A/en not_active IP Right Cessation
- 1991-10-03 CN CN91110637A patent/CN1028819C/zh not_active Expired - Lifetime
-
1993
- 1993-11-04 AU AU50440/93A patent/AU654785B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CN1061492A (zh) | 1992-05-27 |
| EP0506926A4 (en) | 1994-11-02 |
| JPH05503395A (ja) | 1993-06-03 |
| AU5044093A (en) | 1994-01-20 |
| IL99582A (en) | 1994-06-24 |
| DE69125268T2 (de) | 1997-10-30 |
| CA2070380A1 (en) | 1992-04-25 |
| AU644025B2 (en) | 1993-12-02 |
| CN1028819C (zh) | 1995-06-07 |
| EP0506926B1 (de) | 1997-03-19 |
| AU654785B2 (en) | 1994-11-17 |
| DE69125268D1 (de) | 1997-04-24 |
| AU8768491A (en) | 1992-05-26 |
| ZA917719B (en) | 1992-02-26 |
| IL99582A0 (en) | 1992-08-18 |
| JP3021650B2 (ja) | 2000-03-15 |
| WO1992008245A1 (en) | 1992-05-14 |
| EP0506926A1 (de) | 1992-10-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |