ATE150584T1 - Verfahren und vorrichtung zum herstellen von übergängen durch diffusion in substrate von solarzellen - Google Patents

Verfahren und vorrichtung zum herstellen von übergängen durch diffusion in substrate von solarzellen

Info

Publication number
ATE150584T1
ATE150584T1 AT91918988T AT91918988T ATE150584T1 AT E150584 T1 ATE150584 T1 AT E150584T1 AT 91918988 T AT91918988 T AT 91918988T AT 91918988 T AT91918988 T AT 91918988T AT E150584 T1 ATE150584 T1 AT E150584T1
Authority
AT
Austria
Prior art keywords
substrates
solar cells
diffusion
producing transitions
dopant
Prior art date
Application number
AT91918988T
Other languages
English (en)
Inventor
Mark D Rosenblum
Jack I Hanoka
Original Assignee
Ase Americas Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ase Americas Inc filed Critical Ase Americas Inc
Application granted granted Critical
Publication of ATE150584T1 publication Critical patent/ATE150584T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/137Batch treatment of the devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/14Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
    • H10P32/1408Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers
    • H10P32/141Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers the applied layer comprising oxides only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/171Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
AT91918988T 1990-10-24 1991-09-20 Verfahren und vorrichtung zum herstellen von übergängen durch diffusion in substrate von solarzellen ATE150584T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60400090A 1990-10-24 1990-10-24

Publications (1)

Publication Number Publication Date
ATE150584T1 true ATE150584T1 (de) 1997-04-15

Family

ID=24417781

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91918988T ATE150584T1 (de) 1990-10-24 1991-09-20 Verfahren und vorrichtung zum herstellen von übergängen durch diffusion in substrate von solarzellen

Country Status (10)

Country Link
EP (1) EP0506926B1 (de)
JP (1) JP3021650B2 (de)
CN (1) CN1028819C (de)
AT (1) ATE150584T1 (de)
AU (2) AU644025B2 (de)
CA (1) CA2070380A1 (de)
DE (1) DE69125268T2 (de)
IL (1) IL99582A (de)
WO (1) WO1992008245A1 (de)
ZA (1) ZA917719B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005025933B3 (de) * 2005-06-06 2006-07-13 Centrotherm Photovoltaics Gmbh + Co. Kg Dotiergermisch für die Dotierung von Halbleitern
ITUD20050196A1 (it) * 2005-11-17 2007-05-18 Gisulfo Baccini Apparecchiatura per la produzione di celle fotovoltaiche sottili in silicio e di circuiti elettronici in materiale rigido e flessibile
CN101220518B (zh) * 2007-01-12 2010-04-07 中国电子科技集团公司第四十八研究所 一种用于高温扩散系统的尾气收集装置
US20090239363A1 (en) * 2008-03-24 2009-09-24 Honeywell International, Inc. Methods for forming doped regions in semiconductor substrates using non-contact printing processes and dopant-comprising inks for forming such doped regions using non-contact printing processes
US9559228B2 (en) * 2011-09-30 2017-01-31 Sunpower Corporation Solar cell with doped groove regions separated by ridges
CN103361733B (zh) * 2013-06-21 2016-03-23 中山大学 一种光外同轴超声波喷雾激光掺杂系统
US10365420B2 (en) 2013-08-01 2019-07-30 Lg Chem, Ltd. Method for manufacturing polarizing film using ultrasonic vibrator for atomizing coating solution
CN104505439A (zh) * 2015-01-10 2015-04-08 复旦大学 一步完成扩散、表面钝化和减反射的太阳电池制备方法
CN108110090B (zh) * 2018-01-11 2020-03-06 江苏顺风光电科技有限公司 一种n型双面电池制备方法
KR20230008848A (ko) * 2020-05-09 2023-01-16 램 리써치 코포레이션 센서들 및 제어 알고리즘들을 통한 도금-향상을 위한 웨이퍼 습윤성 (wettability) 을 개선하기 위한 방법들

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU499679B2 (en) * 1976-04-08 1979-04-26 Photon Power Inc Photovoltaic cell
US4273950A (en) * 1979-05-29 1981-06-16 Photowatt International, Inc. Solar cell and fabrication thereof using microwaves
US4360393A (en) 1980-12-18 1982-11-23 Solarex Corporation Vapor deposition of H3 PO4 and formation of thin phosphorus layer on silicon substrates
DE3631270A1 (de) * 1986-09-13 1988-03-24 Kopperschmidt Mueller & Co Vorrichtung zur spruehbeschichtung von werkstuecken

Also Published As

Publication number Publication date
CN1061492A (zh) 1992-05-27
EP0506926A4 (en) 1994-11-02
JPH05503395A (ja) 1993-06-03
AU5044093A (en) 1994-01-20
IL99582A (en) 1994-06-24
DE69125268T2 (de) 1997-10-30
CA2070380A1 (en) 1992-04-25
AU644025B2 (en) 1993-12-02
CN1028819C (zh) 1995-06-07
EP0506926B1 (de) 1997-03-19
AU654785B2 (en) 1994-11-17
DE69125268D1 (de) 1997-04-24
AU8768491A (en) 1992-05-26
ZA917719B (en) 1992-02-26
IL99582A0 (en) 1992-08-18
JP3021650B2 (ja) 2000-03-15
WO1992008245A1 (en) 1992-05-14
EP0506926A1 (de) 1992-10-07

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Legal Events

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