ATE268944T1 - Diffundierung mit feldverstärkung und optischer aktivierung - Google Patents

Diffundierung mit feldverstärkung und optischer aktivierung

Info

Publication number
ATE268944T1
ATE268944T1 AT95935183T AT95935183T ATE268944T1 AT E268944 T1 ATE268944 T1 AT E268944T1 AT 95935183 T AT95935183 T AT 95935183T AT 95935183 T AT95935183 T AT 95935183T AT E268944 T1 ATE268944 T1 AT E268944T1
Authority
AT
Austria
Prior art keywords
semiconductor material
diffusion
field amplification
optical activation
creating
Prior art date
Application number
AT95935183T
Other languages
English (en)
Inventor
Galina Popovici
Mark A Prelas
Talm Sung
S Khasawinah
Original Assignee
Rhombic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhombic Corp filed Critical Rhombic Corp
Application granted granted Critical
Publication of ATE268944T1 publication Critical patent/ATE268944T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01—Manufacture or treatment
    • H10D48/031—Manufacture or treatment of three-or-more electrode devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01—Manufacture or treatment
    • H10D48/021—Manufacture or treatment of two-electrode devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
    • H10D62/8303—Diamond
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/185—Lithium-drift diffusion

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Semiconductor Lasers (AREA)
  • Glass Compositions (AREA)
AT95935183T 1994-09-27 1995-09-26 Diffundierung mit feldverstärkung und optischer aktivierung ATE268944T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/313,641 US5597762A (en) 1994-09-27 1994-09-27 Field-enhanced diffusion using optical activation
PCT/US1995/012432 WO1996010264A1 (en) 1994-09-27 1995-09-26 Field-enhanced diffusion using optical activation

Publications (1)

Publication Number Publication Date
ATE268944T1 true ATE268944T1 (de) 2004-06-15

Family

ID=23216514

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95935183T ATE268944T1 (de) 1994-09-27 1995-09-26 Diffundierung mit feldverstärkung und optischer aktivierung

Country Status (8)

Country Link
US (1) US5597762A (de)
EP (1) EP0784865B1 (de)
JP (1) JPH10509559A (de)
KR (1) KR970706602A (de)
AT (1) ATE268944T1 (de)
CA (1) CA2201112A1 (de)
DE (1) DE69533136T2 (de)
WO (1) WO1996010264A1 (de)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5888113A (en) * 1997-03-27 1999-03-30 Universities Research Association, Inc. Process for making a cesiated diamond film field emitter and field emitter formed therefrom
US6355543B1 (en) * 1998-09-29 2002-03-12 Advanced Micro Devices, Inc. Laser annealing for forming shallow source/drain extension for MOS transistor
US6527854B1 (en) 1999-06-16 2003-03-04 Mark A. Prelas Method for contact diffusion of impurities into diamond and other crystalline structures and products
AT7491U1 (de) * 2004-07-15 2005-04-25 Plansee Ag Werkstoff für leitbahnen aus kupferlegierung
US7741147B2 (en) * 2006-12-22 2010-06-22 Palo Alto Research Center Incorporated Method of field-controlled diffusion and devices formed thereby
JP2008227142A (ja) * 2007-03-13 2008-09-25 Tohoku Univ 不純物のドーピング方法及びこれを用いた半導体装置の製造方法
US8962976B2 (en) * 2009-06-25 2015-02-24 Empire Technology Development Llc Doped diamond solar cell
US10088452B2 (en) 2016-01-12 2018-10-02 Lockheed Martin Corporation Method for detecting defects in conductive materials based on differences in magnetic field characteristics measured along the conductive materials
US9824597B2 (en) 2015-01-28 2017-11-21 Lockheed Martin Corporation Magnetic navigation methods and systems utilizing power grid and communication network
US9835693B2 (en) * 2016-01-21 2017-12-05 Lockheed Martin Corporation Higher magnetic sensitivity through fluorescence manipulation by phonon spectrum control
US9614589B1 (en) 2015-12-01 2017-04-04 Lockheed Martin Corporation Communication via a magnio
US9853837B2 (en) 2014-04-07 2017-12-26 Lockheed Martin Corporation High bit-rate magnetic communication
US9557391B2 (en) 2015-01-23 2017-01-31 Lockheed Martin Corporation Apparatus and method for high sensitivity magnetometry measurement and signal processing in a magnetic detection system
US9541610B2 (en) 2015-02-04 2017-01-10 Lockheed Martin Corporation Apparatus and method for recovery of three dimensional magnetic field from a magnetic detection system
US9910105B2 (en) 2014-03-20 2018-03-06 Lockheed Martin Corporation DNV magnetic field detector
US10241158B2 (en) 2015-02-04 2019-03-26 Lockheed Martin Corporation Apparatus and method for estimating absolute axes' orientations for a magnetic detection system
US9638821B2 (en) 2014-03-20 2017-05-02 Lockheed Martin Corporation Mapping and monitoring of hydraulic fractures using vector magnetometers
US9590601B2 (en) 2014-04-07 2017-03-07 Lockheed Martin Corporation Energy efficient controlled magnetic field generator circuit
US10520558B2 (en) 2016-01-21 2019-12-31 Lockheed Martin Corporation Diamond nitrogen vacancy sensor with nitrogen-vacancy center diamond located between dual RF sources
US9910104B2 (en) 2015-01-23 2018-03-06 Lockheed Martin Corporation DNV magnetic field detector
US10168393B2 (en) 2014-09-25 2019-01-01 Lockheed Martin Corporation Micro-vacancy center device
WO2016122965A1 (en) 2015-01-28 2016-08-04 Lockheed Martin Corporation In-situ power charging
EP3371614A1 (de) 2015-11-04 2018-09-12 Lockheed Martin Corporation Magnetbandpassfilter
WO2017087014A1 (en) 2015-11-20 2017-05-26 Lockheed Martin Corporation Apparatus and method for hypersensitivity detection of magnetic field
WO2017087013A1 (en) 2015-11-20 2017-05-26 Lockheed Martin Corporation Apparatus and method for closed loop processing for a magnetic detection system
WO2017127079A1 (en) 2016-01-21 2017-07-27 Lockheed Martin Corporation Ac vector magnetic anomaly detection with diamond nitrogen vacancies
EP3405603A4 (de) 2016-01-21 2019-10-16 Lockheed Martin Corporation Diamantstickstoffleerstellensensor mit schaltung auf diamant
AU2016388316A1 (en) 2016-01-21 2018-09-06 Lockheed Martin Corporation Diamond nitrogen vacancy sensor with common RF and magnetic fields generator
WO2017127097A1 (en) 2016-01-21 2017-07-27 Lockheed Martin Corporation Magnetometer with a light emitting diode
GB2562957A (en) 2016-01-21 2018-11-28 Lockheed Corp Magnetometer with light pipe
WO2017127098A1 (en) 2016-01-21 2017-07-27 Lockheed Martin Corporation Diamond nitrogen vacancy sensed ferro-fluid hydrophone
US10371765B2 (en) 2016-07-11 2019-08-06 Lockheed Martin Corporation Geolocation of magnetic sources using vector magnetometer sensors
US10228429B2 (en) 2017-03-24 2019-03-12 Lockheed Martin Corporation Apparatus and method for resonance magneto-optical defect center material pulsed mode referencing
US10677953B2 (en) 2016-05-31 2020-06-09 Lockheed Martin Corporation Magneto-optical detecting apparatus and methods
US20170343621A1 (en) 2016-05-31 2017-11-30 Lockheed Martin Corporation Magneto-optical defect center magnetometer
US10338163B2 (en) 2016-07-11 2019-07-02 Lockheed Martin Corporation Multi-frequency excitation schemes for high sensitivity magnetometry measurement with drift error compensation
US10527746B2 (en) 2016-05-31 2020-01-07 Lockheed Martin Corporation Array of UAVS with magnetometers
US10359479B2 (en) 2017-02-20 2019-07-23 Lockheed Martin Corporation Efficient thermal drift compensation in DNV vector magnetometry
US10281550B2 (en) 2016-11-14 2019-05-07 Lockheed Martin Corporation Spin relaxometry based molecular sequencing
US10408890B2 (en) 2017-03-24 2019-09-10 Lockheed Martin Corporation Pulsed RF methods for optimization of CW measurements
US10345396B2 (en) 2016-05-31 2019-07-09 Lockheed Martin Corporation Selected volume continuous illumination magnetometer
US10571530B2 (en) 2016-05-31 2020-02-25 Lockheed Martin Corporation Buoy array of magnetometers
US10317279B2 (en) 2016-05-31 2019-06-11 Lockheed Martin Corporation Optical filtration system for diamond material with nitrogen vacancy centers
US10345395B2 (en) 2016-12-12 2019-07-09 Lockheed Martin Corporation Vector magnetometry localization of subsurface liquids
US10330744B2 (en) 2017-03-24 2019-06-25 Lockheed Martin Corporation Magnetometer with a waveguide
US10145910B2 (en) 2017-03-24 2018-12-04 Lockheed Martin Corporation Photodetector circuit saturation mitigation for magneto-optical high intensity pulses
US10274550B2 (en) 2017-03-24 2019-04-30 Lockheed Martin Corporation High speed sequential cancellation for pulsed mode
US9983255B2 (en) * 2016-08-15 2018-05-29 The Boeing Company Apparatus for testing dielectric breakdown voltage
US10459041B2 (en) 2017-03-24 2019-10-29 Lockheed Martin Corporation Magnetic detection system with highly integrated diamond nitrogen vacancy sensor
US10338164B2 (en) 2017-03-24 2019-07-02 Lockheed Martin Corporation Vacancy center material with highly efficient RF excitation
US10371760B2 (en) 2017-03-24 2019-08-06 Lockheed Martin Corporation Standing-wave radio frequency exciter
US10379174B2 (en) 2017-03-24 2019-08-13 Lockheed Martin Corporation Bias magnet array for magnetometer
US10801982B2 (en) * 2017-06-29 2020-10-13 University of Pittsburgh—of the Commonwealth System of Higher Education Graphitic carbon nitride sensors
US10787892B2 (en) * 2018-09-19 2020-09-29 Jefferson Science Associates, Llc In situ SRF cavity processing using optical ionization of gases
US10816507B2 (en) * 2019-03-20 2020-10-27 Raytheon Technologies Corporation Apparatus and method and system for inspecting a component of a gas turbine engine

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56165371A (en) * 1980-05-26 1981-12-18 Shunpei Yamazaki Semiconductor device
US5002899A (en) * 1988-09-30 1991-03-26 Massachusetts Institute Of Technology Electrical contacts on diamond
US5055424A (en) * 1989-06-29 1991-10-08 The United States Of America As Represented By The Secretary Of The Navy Method for fabricating ohmic contacts on semiconducting diamond
US5210431A (en) * 1989-07-06 1993-05-11 Sumitomo Electric Industries, Ltd. Ohmic connection electrodes for p-type semiconductor diamonds
JPH0358480A (ja) * 1989-07-26 1991-03-13 Sumitomo Electric Ind Ltd 半導体ダイヤモンドのオーミツク接続電極
JPH03105974A (ja) * 1989-09-19 1991-05-02 Kobe Steel Ltd 多結晶ダイヤ薄膜合成によるシヨツトキー・ダイオードの製作法
US5243199A (en) * 1990-01-19 1993-09-07 Sumitomo Electric Industries, Ltd. High frequency device
JPH05117089A (ja) * 1991-10-25 1993-05-14 Sumitomo Electric Ind Ltd ダイヤモンドのn型及びp型の形成方法
US5382809A (en) * 1992-09-14 1995-01-17 Sumitomo Electric Industries, Ltd. Semiconductor device including semiconductor diamond
US5382808A (en) * 1993-05-14 1995-01-17 Kobe Steel, Usa Inc. Metal boride ohmic contact on diamond and method for making same
DE4331937A1 (de) * 1993-09-16 1994-03-17 Ulrich Prof Dr Mohr Verfahren zur Eindiffusion von Dotanten in Halbleiterfestkörper

Also Published As

Publication number Publication date
WO1996010264A1 (en) 1996-04-04
DE69533136D1 (de) 2004-07-15
EP0784865A1 (de) 1997-07-23
US5597762A (en) 1997-01-28
DE69533136T2 (de) 2004-09-30
CA2201112A1 (en) 1996-04-04
KR970706602A (ko) 1997-11-03
EP0784865B1 (de) 2004-06-09
JPH10509559A (ja) 1998-09-14

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