BRPI0811197A2 - Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão - Google Patents
Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressãoInfo
- Publication number
- BRPI0811197A2 BRPI0811197A2 BRPI0811197-9A2A BRPI0811197A BRPI0811197A2 BR PI0811197 A2 BRPI0811197 A2 BR PI0811197A2 BR PI0811197 A BRPI0811197 A BR PI0811197A BR PI0811197 A2 BRPI0811197 A2 BR PI0811197A2
- Authority
- BR
- Brazil
- Prior art keywords
- print board
- sensibilizer
- mixtures
- preparing
- manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/01—Preparation of ethers
- C07C41/18—Preparation of ethers by reactions not forming ether-oxygen bonds
- C07C41/30—Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/215—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring having unsaturation outside the six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/235—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring and to a carbon atom of a ring other than a six-membered aromatic ring
- C07C43/243—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring and to a carbon atom of a ring other than a six-membered aromatic ring having unsaturation outside the six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
- C07C2601/08—Systems containing only non-condensed rings with a five-membered ring the ring being saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Materials For Photolithography (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
- Secondary Cells (AREA)
- Organic Insulating Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US94010607P | 2007-05-25 | 2007-05-25 | |
| US60/940,106 | 2007-05-25 | ||
| EP07108957 | 2007-05-25 | ||
| EP07108957.7 | 2007-05-25 | ||
| PCT/EP2008/055951 WO2008145528A1 (en) | 2007-05-25 | 2008-05-15 | A lithographic printing plate precursor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BRPI0811197A2 true BRPI0811197A2 (pt) | 2014-10-29 |
| BRPI0811197B1 BRPI0811197B1 (pt) | 2019-04-02 |
Family
ID=38626773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0811197-9A BRPI0811197B1 (pt) | 2007-05-25 | 2008-05-15 | Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8445176B2 (pt) |
| EP (1) | EP2153279B1 (pt) |
| CN (1) | CN101681106B (pt) |
| AT (1) | ATE493688T1 (pt) |
| BR (1) | BRPI0811197B1 (pt) |
| DE (1) | DE602008004246D1 (pt) |
| WO (1) | WO2008145528A1 (pt) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008145528A1 (en) | 2007-05-25 | 2008-12-04 | Agfa Graphics Nv | A lithographic printing plate precursor |
| EP2290447A1 (en) | 2009-08-25 | 2011-03-02 | Agfa Graphics N.V. | A set for developing a lithographic printing plate |
| EP2775351B1 (en) | 2013-03-07 | 2017-02-22 | Agfa Graphics NV | Apparatus and method for processing a lithographic printing plate |
| EP3392709A1 (en) | 2017-04-21 | 2018-10-24 | Agfa Nv | A lithographic printing plate precursor |
| CN113168096B (zh) | 2018-12-10 | 2024-05-24 | 易客发有限公司 | Uv或紫色敏化的平版印刷版的在机加工 |
| CN118046659B (zh) * | 2019-09-30 | 2026-04-17 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
| CN114531860B (zh) | 2019-09-30 | 2024-01-30 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| US20240100820A1 (en) | 2020-12-16 | 2024-03-28 | Agfa Offset Bv | Lithographic Printing Press Make-Ready Method |
| EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
Family Cites Families (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL296772A (pt) | 1962-03-21 | |||
| DE2064079C2 (de) | 1970-12-28 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
| DE2209128C3 (de) * | 1971-03-05 | 1981-10-22 | CIBA-GEIGY AG, 4002 Basel | Bis-Stilbenverbindungen, Verfahren zu deren Herstellung und deren Verwendung als optische Aufheller |
| US4231957A (en) * | 1977-11-04 | 1980-11-04 | Ciba-Geigy Corporation | Phosphonium compounds, a process for their preparation and a process for the preparation of asymmetrically substituted stilbene fluorescent brightening agents |
| DE2822190A1 (de) | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
| US4252887A (en) | 1979-08-14 | 1981-02-24 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators |
| EP0030917B2 (de) * | 1979-12-13 | 1991-03-20 | Ciba-Geigy Ag | Optische Aufheller aus Bis-styrylbenzolverbindungen, Verfahren zu deren Herstellung und deren Verwendung |
| US4459349A (en) | 1981-03-27 | 1984-07-10 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US4410621A (en) | 1981-04-03 | 1983-10-18 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan |
| JPS5956403A (ja) | 1982-09-27 | 1984-03-31 | Mitsubishi Chem Ind Ltd | 光重合性組成物 |
| DE3347576A1 (de) * | 1983-12-30 | 1985-07-11 | Bayer Ag, 5090 Leverkusen | 1,4-bis-(styryl)-benzole und deren verwendung als optische aufheller |
| US4622286A (en) | 1985-09-16 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer |
| DE3936793A1 (de) * | 1989-11-04 | 1991-05-08 | Bayer Ag | Weisstoenerhaltige papierstreichmassen |
| US5401607A (en) * | 1991-04-17 | 1995-03-28 | Polaroid Corporation | Processes and compositions for photogeneration of acid |
| DE69703378T2 (de) | 1996-12-26 | 2001-05-23 | Mitsubishi Chemical Corp., Tokio/Tokyo | Photoempfindliche lithographische Druckplatte |
| EP0985683A1 (en) | 1998-09-09 | 2000-03-15 | Fuji Photo Film Co., Ltd. | Photosensitive composition and method for manufacturing lithographic printing plate |
| DE69909734T2 (de) | 1999-02-02 | 2004-04-15 | Agfa-Gevaert | Verfahren zur Herstellung positiv arbeitender Druckplatten |
| JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物 |
| DE19915717A1 (de) | 1999-04-08 | 2000-10-12 | Agfa Gevaert Ag | Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht |
| US6335144B1 (en) | 1999-04-27 | 2002-01-01 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition for short wavelength semiconductor laser exposure |
| DE19933139A1 (de) | 1999-07-19 | 2001-01-25 | Agfa Gevaert Ag | Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial |
| JP2001033961A (ja) | 1999-07-23 | 2001-02-09 | Fuji Photo Film Co Ltd | 感光性組成物および平版印刷版の製版方法 |
| DE19944073A1 (de) | 1999-09-14 | 2001-03-15 | Agfa Gevaert Ag | Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht |
| JP4037015B2 (ja) | 1999-09-22 | 2008-01-23 | 富士フイルム株式会社 | 光重合性組成物、画像形成材料及び平版印刷版用版材 |
| JP3568431B2 (ja) * | 1999-09-29 | 2004-09-22 | 京セラミタ株式会社 | スチルベン誘導体、その製造方法およびそれを用いた電子写真感光体 |
| US6558873B1 (en) | 1999-10-05 | 2003-05-06 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
| US6797446B2 (en) * | 1999-12-31 | 2004-09-28 | Samsung Electronics Co., Ltd. | Electrophotographic photoreceptors |
| JP4230130B2 (ja) | 2001-07-04 | 2009-02-25 | 富士フイルム株式会社 | 感光性平版印刷版用現像液及び平版印刷版の製版方法 |
| ATE544095T1 (de) | 2001-08-29 | 2012-02-15 | Fujifilm Corp | Verfahren zur herstellung einer druckplatte |
| US20030186165A1 (en) * | 2002-03-28 | 2003-10-02 | Agfa-Gevaert | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm |
| EP1349006B1 (en) | 2002-03-28 | 2013-09-25 | Agfa Graphics N.V. | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm. |
| DE60224642T2 (de) | 2002-04-26 | 2009-01-15 | Agfa Graphics N.V. | Negativ-arbeitender thermischer Flachdruckplattenvorläufer, der einen Aluminiumträger mit einer glatten Oberfläche enthält |
| JP4469561B2 (ja) | 2003-05-09 | 2010-05-26 | 富士フイルム株式会社 | 感光性組成物 |
| JP4418714B2 (ja) | 2003-07-10 | 2010-02-24 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
| EP1500498B1 (en) | 2003-07-22 | 2010-12-15 | FUJIFILM Corporation | Lithographic printing plate precursour and lithographic printing method |
| EP1668417B1 (en) | 2003-09-22 | 2009-05-13 | Agfa Graphics N.V. | Photopolymerizable composition. |
| EP1668418A1 (en) | 2003-09-22 | 2006-06-14 | Agfa-Gevaert | Photopolymer printing plate precursor |
| JP4644458B2 (ja) | 2003-09-30 | 2011-03-02 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
| EP1521123B1 (en) | 2003-10-02 | 2013-08-07 | Agfa Graphics N.V. | Alkaline Developer for radiation sensitive compositions |
| EP1557262B1 (en) | 2004-01-23 | 2007-11-14 | FUJIFILM Corporation | Lithographic printing plate precursor and lithographic printing method |
| JP4439327B2 (ja) * | 2004-04-30 | 2010-03-24 | 富士フイルム株式会社 | 平版印刷版用原版 |
| PL1749240T3 (pl) | 2004-05-06 | 2012-09-28 | Agfa Nv | Prekursor fotopolimerowej płyty drukarskiej |
| WO2005111727A1 (en) | 2004-05-19 | 2005-11-24 | Agfa-Gevaert | Method of making a photopolymer printing plate |
| US20060001849A1 (en) | 2004-07-01 | 2006-01-05 | Ray Kevin B | Imaging a violet sensitive printing plate using multiple low power light sources |
| EP1621928B1 (en) | 2004-07-30 | 2008-12-17 | Agfa Graphics N.V. | Photopolymerizable composition. |
| DE602004011046T2 (de) * | 2004-07-30 | 2009-01-02 | Agfa Graphics N.V. | Divinylfluorene |
| US7749683B2 (en) | 2004-11-05 | 2010-07-06 | Agfa Graphics Nv | Photopolymerizable composition |
| EP1810081B1 (en) | 2004-11-05 | 2020-01-08 | Agfa Nv | Photopolymerizable composition |
| JP2006215241A (ja) | 2005-02-03 | 2006-08-17 | Konica Minolta Medical & Graphic Inc | 感光性平版印刷版材料及びそれを用いた製版方法 |
| EP1722275B1 (en) | 2005-05-10 | 2010-10-27 | Agfa Graphics N.V. | Method for processing lithographic printing plates |
| ATE480800T1 (de) | 2005-05-10 | 2010-09-15 | Agfa Graphics Nv | Alkalischer entwickler für strahlungsempfindliche zusammensetzungen |
| JP4792326B2 (ja) | 2005-07-25 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版の作製方法および平版印刷版原版 |
| ES2333442T3 (es) * | 2005-08-26 | 2010-02-22 | Agfa Graphics N.V. | Precursor de placa de impresion fotopolimerico. |
| WO2008145528A1 (en) | 2007-05-25 | 2008-12-04 | Agfa Graphics Nv | A lithographic printing plate precursor |
-
2008
- 2008-05-15 WO PCT/EP2008/055951 patent/WO2008145528A1/en not_active Ceased
- 2008-05-15 BR BRPI0811197-9A patent/BRPI0811197B1/pt not_active IP Right Cessation
- 2008-05-15 CN CN2008800174805A patent/CN101681106B/zh active Active
- 2008-05-15 US US12/602,042 patent/US8445176B2/en active Active
- 2008-05-15 AT AT08759621T patent/ATE493688T1/de not_active IP Right Cessation
- 2008-05-15 DE DE602008004246T patent/DE602008004246D1/de active Active
- 2008-05-15 EP EP08759621A patent/EP2153279B1/en not_active Not-in-force
Also Published As
| Publication number | Publication date |
|---|---|
| US20100190105A1 (en) | 2010-07-29 |
| DE602008004246D1 (de) | 2011-02-10 |
| US8445176B2 (en) | 2013-05-21 |
| CN101681106B (zh) | 2013-11-20 |
| EP2153279B1 (en) | 2010-12-29 |
| WO2008145528A1 (en) | 2008-12-04 |
| ATE493688T1 (de) | 2011-01-15 |
| CN101681106A (zh) | 2010-03-24 |
| BRPI0811197B1 (pt) | 2019-04-02 |
| EP2153279A1 (en) | 2010-02-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B25D | Requested change of name of applicant approved |
Owner name: AGFA NV (BE) |
|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B06I | Publication of requirement cancelled [chapter 6.9 patent gazette] |
Free format text: ANULADA A PUBLICACAO CODIGO 6.1 NA RPI NO 2492 DE 09/10/2018 POR TER SIDO INDEVIDA. |
|
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 02/04/2019, OBSERVADAS AS CONDICOES LEGAIS. (CO) 10 (DEZ) ANOS CONTADOS A PARTIR DE 02/04/2019, OBSERVADAS AS CONDICOES LEGAIS |
|
| B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time |
Free format text: REFERENTE A 14A ANUIDADE. |
|
| B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |
Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2670 DE 08-03-2022 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |