CH616708A5 - Etching fluid for aluminium or aluminium alloys. - Google Patents

Etching fluid for aluminium or aluminium alloys. Download PDF

Info

Publication number
CH616708A5
CH616708A5 CH1127575A CH1127575A CH616708A5 CH 616708 A5 CH616708 A5 CH 616708A5 CH 1127575 A CH1127575 A CH 1127575A CH 1127575 A CH1127575 A CH 1127575A CH 616708 A5 CH616708 A5 CH 616708A5
Authority
CH
Switzerland
Prior art keywords
aluminum
etching
ferricyanide
liquid
hydroxide
Prior art date
Application number
CH1127575A
Other languages
German (de)
English (en)
Inventor
Gijsbertus Gerlach
John Joseph Kelly
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH616708A5 publication Critical patent/CH616708A5/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/66—Wet etching of conductive or resistive materials
    • H10P50/663—Wet etching of conductive or resistive materials by chemical means only
    • H10P50/667—Wet etching of conductive or resistive materials by chemical means only by liquid etching only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/36—Alkaline compositions for etching aluminium or alloys thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
CH1127575A 1974-09-03 1975-09-01 Etching fluid for aluminium or aluminium alloys. CH616708A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7411645A NL7411645A (nl) 1974-09-03 1974-09-03 Etsvloeistof voor aluminium.

Publications (1)

Publication Number Publication Date
CH616708A5 true CH616708A5 (en) 1980-04-15

Family

ID=19822017

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1127575A CH616708A5 (en) 1974-09-03 1975-09-01 Etching fluid for aluminium or aluminium alloys.

Country Status (11)

Country Link
JP (1) JPS5150834A (fr)
AT (1) AT336974B (fr)
BE (1) BE832966A (fr)
CA (1) CA1055823A (fr)
CH (1) CH616708A5 (fr)
DE (1) DE2537154A1 (fr)
FR (1) FR2283943A1 (fr)
GB (1) GB1499037A (fr)
IT (1) IT1042185B (fr)
NL (1) NL7411645A (fr)
SE (1) SE7509691L (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3047588A1 (de) * 1980-12-17 1982-07-22 Siemens AG, 1000 Berlin und 8000 München Aetzfluessigkeit fuer aufdampfschichten

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4425183A (en) * 1983-08-08 1984-01-10 Ncr Corporation Metal bevel process for multi-level metal semiconductor applications

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3047588A1 (de) * 1980-12-17 1982-07-22 Siemens AG, 1000 Berlin und 8000 München Aetzfluessigkeit fuer aufdampfschichten

Also Published As

Publication number Publication date
JPS5150834A (fr) 1976-05-04
NL7411645A (nl) 1976-03-05
FR2283943A1 (fr) 1976-04-02
AT336974B (de) 1977-06-10
DE2537154A1 (de) 1976-03-18
FR2283943B1 (fr) 1980-09-12
GB1499037A (en) 1978-01-25
ATA672375A (de) 1976-09-15
BE832966A (fr) 1976-03-01
CA1055823A (fr) 1979-06-05
IT1042185B (it) 1980-01-30
SE7509691L (sv) 1976-03-04

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PL Patent ceased
PL Patent ceased